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公开(公告)号:US20220099726A1
公开(公告)日:2022-03-31
申请号:US17039627
申请日:2020-09-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ann LAI , Ruo-Rung HUANG , Kun-Lung CHEN , Chun-Yi YANG , Chan-Hong CHERN
IPC: G01R31/26 , H03K17/687 , H03K3/017 , G01R31/27
Abstract: An apparatus and method for testing gallium nitride field effect transistors (GaN FETs) are disclosed herein. In some embodiments, the apparatus includes: a high side GaN FET, a low side GaN FET, a high side driver coupled to a gate of the high side GaN FET, a low side driver coupled to a gate of the low side GaN FET, and a driver circuit coupled to the high side and low side drivers and configured to generate drive signals capable of driving the high and low side GaN FETs, wherein the high and low side GaN FETs and transistors, within the high and low side drivers and the driver circuit, are patterned on a same semiconductor device layer during a front-end-of-line (FEOL) process.
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公开(公告)号:US20180164246A1
公开(公告)日:2018-06-14
申请号:US15378794
申请日:2016-12-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tung-Tsun CHEN , Jui-Cheng HUANG , Kun-Lung CHEN , Cheng-Hsiang HSIEH
IPC: G01N27/414
CPC classification number: G01N27/4145 , H01L27/1203
Abstract: An on-chip heater in a concentric rings configuration having non-uniform spacing between heating elements provides improved radial temperature uniformity and low power consumption compared to circular or square heating elements. On-chip heaters are suitable for integration and use with on-chip sensors that require tight temperature control.
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公开(公告)号:US20230384259A1
公开(公告)日:2023-11-30
申请号:US18232719
申请日:2023-08-10
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tung-Tsun Chen , Jui-Cheng HUANG , Kun-Lung CHEN , Cheng-Hsiang HSIEH
IPC: G01N27/414 , H01L27/12
CPC classification number: G01N27/4145 , H01L27/1203 , H05B2203/013
Abstract: An on-chip heater in a concentric rings configuration having non-uniform spacing between heating elements provides improved radial temperature uniformity and low power consumption compared to circular or square heating elements. On-chip heaters are suitable for integration and use with on-chip sensors that require tight temperature control.
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公开(公告)号:US20250060404A1
公开(公告)日:2025-02-20
申请号:US18936841
申请日:2024-11-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ann LAI , Ruo-Rung HUANG , Kun-Lung CHEN , Chun-Yi YANG , Chan-Hong CHERN
IPC: G01R31/26 , G01R31/27 , H03K3/017 , H03K17/687
Abstract: An apparatus and method for testing gallium nitride field effect transistors (GaN FETs) are disclosed herein. In some embodiments, the apparatus includes: a high side GaN FET, a low side GaN FET, a high side driver coupled to a gate of the high side GaN FET, a low side driver coupled to a gate of the low side GaN FET, and a driver circuit coupled to the high side and low side drivers and configured to generate drive signals capable of driving the high and low side GaN FETs, wherein the high and low side GaN FETs and transistors, within the high and low side drivers and the driver circuit, are patterned on a same semiconductor device layer during a front-end-of-line (FEOL) process.
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公开(公告)号:US20230280391A1
公开(公告)日:2023-09-07
申请号:US18196380
申请日:2023-05-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ann LAI , Ruo-Rung HUANG , Kun-Lung CHEN , Chun-Yi YANG , Chan-Hong CHERN
IPC: G01R31/26 , H03K17/687 , G01R31/27 , H03K3/017
CPC classification number: G01R31/2621 , H03K17/6871 , G01R31/27 , H03K3/017 , H03K2217/0072 , H03K2217/0063
Abstract: An apparatus and method for testing gallium nitride field effect transistors (GaN FETs) are disclosed herein. In some embodiments, the apparatus includes: a high side GaN FET, a low side GaN FET, a high side driver coupled to a gate of the high side GaN FET, a low side driver coupled to a gate of the low side GaN FET, and a driver circuit coupled to the high side and low side drivers and configured to generate drive signals capable of driving the high and low side GaN FETs, wherein the high and low side GaN FETs and transistors, within the high and low side drivers and the driver circuit, are patterned on a same semiconductor device layer during a front-end-of-line (FEOL) process.
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