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公开(公告)号：US20230367225A1
公开(公告)日：2023-11-16
申请号：US18361254
申请日：2023-07-28
发明人： Tai-Yu CHEN , Sagar Deepak KHIVSARA , Kuo-An LIU , Chieh HSIEH , Shang-Chieh CHIEN , Gwan-Sin CHANG , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Chung-Wei WU , Zhiqiang WU
IPC分类号： G03F7/00
CPC分类号： G03F7/70033 , G03F7/70166 , G03F7/705 , G03F7/70916 , G03F7/70933
摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US20220350257A1
公开(公告)日：2022-11-03
申请号：US17867318
申请日：2022-07-18
发明人： Tai-Yu CHEN , Sagar Deepak KHIVSARA , Kuo-An LIU , Chieh HSIEH , Shang-Chieh CHIEN , Gwan-Sin CHANG , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Chung-Wei WU , Zhiqiang WU
IPC分类号： G03F7/20
摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US20230065403A1
公开(公告)日：2023-03-02
申请号：US17462563
申请日：2021-08-31
发明人： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
摘要： A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20230284366A1
公开(公告)日：2023-09-07
申请号：US18298927
申请日：2023-04-11
发明人： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
CPC分类号： H05G2/008 , H05G2/006 , G03F7/7055 , G03F7/7085 , G03F7/70033
摘要： A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20210349396A1
公开(公告)日：2021-11-11
申请号：US17193827
申请日：2021-03-05
发明人： Tai-Yu CHEN , Sagar Deepak KHIVSARA , Kuo-An LIU , Chieh HSIEH , Shang-Chieh CHIEN , Gwan-Sin CHANG , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Chung-Wei WU , Zhiqiang WU
IPC分类号： G03F7/20
摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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