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Patent Agency Ranking
公开(公告)号：US20240361708A1
公开(公告)日：2024-10-31
申请号：US18766165
申请日：2024-07-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
CPC classification number: G03F7/70925 , G02B17/0663 , G03F7/70033 , G03F7/70491 , G03F7/70808 , G03F7/70916 , H05G2/008
Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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公开(公告)号：US20230065403A1
公开(公告)日：2023-03-02
申请号：US17462563
申请日：2021-08-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20230284366A1
公开(公告)日：2023-09-07
申请号：US18298927
申请日：2023-04-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
CPC classification number: H05G2/008 , H05G2/006 , G03F7/7055 , G03F7/7085 , G03F7/70033
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20230273534A1
公开(公告)日：2023-08-31
申请号：US18311795
申请日：2023-05-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
CPC classification number: G03F7/70925 , G03F7/70033 , G02B17/0663 , G03F7/70491 , H05G2/008 , G03F7/70808
Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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公开(公告)号：US20230060899A1
公开(公告)日：2023-03-02
申请号：US17461744
申请日：2021-08-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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