公开(公告)号：US07595144B2

公开(公告)日：2009-09-29

申请号：US11666080

申请日：2005-10-25

申请人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

发明人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

IPC分类号： G03F7/11

CPC分类号： G03F7/091 ,  C08G59/1433 ,  C08G59/1483 ,  C08G59/26 ,  C08G59/28 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

摘要翻译： 提供了一种用于光刻的抗反射涂层形成组合物，其包含高分子化合物，交联化合物，交联催化剂，磺酸盐化合物和溶剂。 由组合物获得的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，与光致抗蚀剂相比具有更高的干蚀刻速率，可以在下部形成没有底脚的光致抗蚀剂图案，并且可以使用 在光刻工艺中使用诸如ArF准分子激光束和F2准分子激光束等。

公开(公告)号：US20080003524A1

公开(公告)日：2008-01-03

申请号：US11666080

申请日：2005-10-25

申请人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

发明人： Takahiro Kishioka ,  Tadashi Hatanaka ,  Shigeo Kimura

IPC分类号： G03F7/11 ,  C08G59/14 ,  H01L21/027

CPC分类号： G03F7/091 ,  C08G59/1433 ,  C08G59/1483 ,  C08G59/26 ,  C08G59/28 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

摘要翻译： 提供了一种用于光刻的抗反射涂层形成组合物，其包含高分子化合物，交联化合物，交联催化剂，磺酸盐化合物和溶剂。 由组合物得到的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，与光致抗蚀剂相比具有更高的干蚀刻速率，可以形成在下部没有基脚的光致抗蚀剂图案，并且可以用于 通过使用诸如ArF准分子激光束和F2准分子激光束等光的光刻工艺

公开(公告)号：US08501393B2

公开(公告)日：2013-08-06

申请号：US11596391

申请日：2005-05-11

申请人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

发明人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

IPC分类号： G03F7/11 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC分类号： G03F7/0392 ,  G03F7/091 ,  G03F7/095 ,  G03F7/11 ,  G03F7/168

摘要： There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.

摘要翻译： 提供了一种用于制造半导体器件的光刻中的抗反射涂层形成组合物和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层，以及通过使用 抗反射涂层形成组合物。 抗反射涂层形成组合物包含具有至少两个乙烯基醚基团的化合物，具有至少两个酚羟基或羧基的碱溶性化合物，光致酸产生剂和溶剂。

公开(公告)号：US20080138744A1

公开(公告)日：2008-06-12

申请号：US11596391

申请日：2005-05-11

申请人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

发明人： Tadashi Hatanaka ,  Shigeo Kimura ,  Tomoyuki Enomoto

IPC分类号： G03F7/26 ,  G03F7/00

CPC分类号： G03F7/0392 ,  G03F7/091 ,  G03F7/095 ,  G03F7/11 ,  G03F7/168

摘要： There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.

摘要翻译： 提供了一种用于制造半导体器件的光刻中的抗反射涂层形成组合物和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层，以及通过使用 抗反射涂层形成组合物。 抗反射涂层形成组合物包含具有至少两个乙烯基醚基团的化合物，具有至少两个酚羟基或羧基的碱溶性化合物，光致酸产生剂和溶剂。

公开(公告)号：US20070004228A1

公开(公告)日：2007-01-04

申请号：US10569471

申请日：2004-08-27

申请人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

发明人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

IPC分类号： H01L21/31

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.

摘要翻译： 提供了用于光刻和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层的抗反射涂层形成组合物，以及通过使用抗反射涂层形成法形成光刻胶图案的方法 组成。 具体地，该组合物包含由四羧酸二酐化合物制得的聚酰胺酸和具有至少一个羧基的二胺化合物，具有至少两个环氧基的化合物和溶剂。

公开(公告)号：US07598182B2

公开(公告)日：2009-10-06

申请号：US10569471

申请日：2004-08-27

申请人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

发明人： Tadashi Hatanaka ,  Tomoyuki Enomoto ,  Shigeo Kimura

IPC分类号： G03C1/00

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： There is provided an anti-reflective coating forming composition for use in a lithography and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. Concretely, the composition comprises a polyamic acid produced from a tetracarboxylic dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups, and a solvent.

摘要翻译： 提供了用于光刻和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层的抗反射涂层形成组合物，以及通过使用抗反射涂层形成法形成光刻胶图案的方法 组成。 具体地，该组合物包含由四羧酸二酐化合物制得的聚酰胺酸和具有至少一个羧基的二胺化合物，具有至少两个环氧基的化合物和溶剂。

公开(公告)号：US09733519B2

公开(公告)日：2017-08-15

申请号：US13377331

申请日：2010-06-21

申请人： Tadashi Hatanaka ,  Isao Adachi

发明人： Tadashi Hatanaka ,  Isao Adachi

IPC分类号： G02F1/13363 ,  C08L33/06 ,  G02F1/1335 ,  C08F220/30

CPC分类号： G02F1/13363 ,  B32B2457/202 ,  C08F2220/302 ,  C08L33/066 ,  G02F2001/133519 ,  G02F2001/133633 ,  G02F2202/025 ,  Y10T428/1005 ,  C08F220/20

摘要： A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent.

公开(公告)号：US20070020559A1

公开(公告)日：2007-01-25

申请号：US11491156

申请日：2006-07-24

申请人： Tadashi Hatanaka

发明人： Tadashi Hatanaka

IPC分类号： G03C1/00

CPC分类号： G03F7/168 ,  G03F7/027 ,  G03F7/0392 ,  G03F7/2004 ,  Y10S430/128

摘要： A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 to 30,000; component (B): a compound having two or more vinyl ether groups per molecule; component (C): a compound having two or more blocked isocyanate groups per molecule; component (D): a photoacid generator; and component (E): a solvent. A production process of the positive-type photosensitive resin composition comprising mixing the above-mentioned components and maintaining the mixture at a temperature higher than room temperature. A cured film manufactured by using the positive-type photosensitive resin composition. The composition has a high sensitivity and little film reduction of unexposed part, maintains a high transmittance even after baking at a high temperature or resist stripping treatment, and cause no reduction of film thickness. Therefore, the composition provides a cured film suited as a film material for several displays.

摘要翻译： 一种正型感光性树脂组合物，其特征在于，含有成分（A）：具有与组分（B）的化合物进行热交联反应的官能团的碱溶性树脂，用于膜固化的官能团，其与 组分（C），数均分子量为2,000至30,000; 组分（B）：每分子具有两个或多个乙烯基醚基团的化合物; 组分（C）：每分子具有两个或多个封端异氰酸酯基团的化合物; 组分（D）：光酸产生剂; 和组分（E）：溶剂。 正型感光性树脂组合物的制造方法包括混合上述组分并将混合物保持在高于室温的温度。 使用正型感光性树脂组合物制造的固化膜。 该组合物具有高的敏感性和较少的未曝光部分的膜的还原，即使在高温下烘烤或抗蚀剂剥离处理也保持高透射率，并且不会降低膜厚度。 因此，组合物提供适合作为几种显示器的膜材料的固化膜。

公开(公告)号：US09193861B2

公开(公告)日：2015-11-24

申请号：US13639529

申请日：2011-04-05

申请人： Tadashi Hatanaka ,  Mitsumasa Kondo

发明人： Tadashi Hatanaka ,  Mitsumasa Kondo

IPC分类号： C09K19/00 ,  C08L61/28 ,  G02F1/13363 ,  G02F1/1337 ,  G02F1/1335

CPC分类号： C08L61/28 ,  G02F1/13363 ,  G02F1/133711 ,  G02F1/133788 ,  G02F2001/133519 ,  Y10T428/1005

摘要： There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties and containing a component (A) that is a compound having a photo-aligning group and a hydroxy group, a component (B) that is a melamine formaldehyde resin, and a component (C) that is a crosslinker.

摘要翻译： 提供了在形成固化膜之后表现出高耐溶剂性的材料，相对于聚合性液晶具有优异的光取向性，耐热性良好，透明度高，而且可溶于二醇系溶剂 ，酮类溶剂或乳液酯类溶剂，其可用于在形成固化膜期间制造滤色器的外涂层。 用于形成具有光取向性的热固性膜的组合物，并且含有作为具有光取向基和羟基的化合物的组分（A），作为三聚氰胺甲醛树脂的组分（B）和组分（C ）是交联剂。

公开(公告)号：US07001705B2

公开(公告)日：2006-02-21

申请号：US10510704

申请日：2003-04-18

申请人： Tadashi Hatanaka ,  Takayasu Nihira

发明人： Tadashi Hatanaka ,  Takayasu Nihira

IPC分类号： G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0007 ,  G03F7/0226

摘要： The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.

摘要翻译： 本发明提供一种能够以通常浓度的四甲基氢氧化铵水溶液显影，具有高灵敏度和优异分辨率的正型感光性树脂组合物，耐热性，平坦化性，透明性，低吸水性等优异。 此外，本发明提供一种通过使用该组合物任意形成具有半圆形或梯形截面的图案的方法。 本发明的正型感光性树脂组合物包含碱溶性树脂，1,2-醌二叠氮化合物，具有至少两个环氧基的交联化合物和表面活性剂，碱溶性树脂是包含羧酸的共聚物 基团的丙烯酸类单体，含羟基的丙烯酸类单体和N-取代的马来酰亚胺作为必需成分。 通过改变后烘烤条件，组合物可任意形成具有半圆形或梯形截面的图案。