公开(公告)号：US20090274963A1

公开(公告)日：2009-11-05

申请号：US12433682

申请日：2009-04-30

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G03F7/20 ,  G01B11/26 ,  G03B27/72

CPC classification number: G03B27/72 ,  G03F7/70591 ,  G03F7/70666

Abstract: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the slit, a light receiving element 53 mounted on the stage 60 and including at least two light receiving portions which receive the light transmitted through the slit, a storage unit which stores a relationship between an angle ε and a distance between a center position of the slit 54 and a position where a intensity of light that the light receiving element 53 receives is maximum, a calculation unit which obtains the angle ε, and a stage driving unit 80 which rotates the stage 60 so that the angle ε is equal to zero.

Abstract translation: 照射位于物体平面上的图案以在图像平面上形成空间像40的测量装置，并且经由图像平面上的狭缝54测量空间图像40的光强度分布，测量装置包括平台60移动 狭缝，安装在平台60上的光接收元件53，并且包括容纳透过狭缝的光的至少两个光接收部分;存储单元，该存储单元存储角度ε与中心位置之间的距离 狭缝54和光接收元件53接收的光的强度最大的位置，获得角度ε的计算单元和使平台60旋转以使得角度ε等于零的平台驱动单元80。

公开(公告)号：US20090009740A1

公开(公告)日：2009-01-08

申请号：US12167858

申请日：2008-07-03

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G01J1/42 ,  G03F7/20

CPC classification number: G03F1/84

Abstract: A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light for forming the light intensity distribution, and a light-shielding portion being configured to substantially shield the light; a first photoelectric conversion element configured to receive the light passing through the opening and output a light intensity signal; and a second photoelectric conversion element arranged at a position apart from the first photoelectric conversion element, and configured to receive the light transmitted through the light-shielding portion and output a light intensity signal. The mask, and the first and second photoelectric conversion elements are moved along the plane to be measured. The light intensity distribution in the plane to be measured is calculated on the basis of the light intensity signals respectively output from the first and second photoelectric conversion elements.

Abstract translation: 被配置为测量待测平面中的光强度分布的测量装置包括掩模，该掩模包括具有小于用于形成光强度分布的光的波长的尺寸的开口，以及遮光部，其被构造成基本上屏蔽 光; 第一光电转换元件，被配置为接收通过所述开口的光并输出光强度信号; 以及第二光电转换元件，其配置在与第一光电转换元件分离的位置，并且被配置为接收透过遮光部的光并输出光强度信号。 掩模和第一和第二光电转换元件沿待测平面移动。 基于分别从第一和第二光电转换元件输出的光强度信号计算要测量的平面中的光强度分布。

公开(公告)号：US09182289B2

公开(公告)日：2015-11-10

申请号：US13418073

申请日：2012-03-12

Applicant: Harrison Barrett ,  Luca Caucci ,  Lars Furenlid ,  Akinori Ohkubo

Inventor： Harrison Barrett ,  Luca Caucci ,  Lars Furenlid ,  Akinori Ohkubo

IPC: G01J1/20 ,  G01J9/00

CPC classification number: G01J9/00

Abstract: An apparatus for estimating a wavefront parameter includes a light source, a lenslet array, a detector for detecting light generated by the light source and passed through the lenslet array, a wavefront corrective element disposed between the lenslet array and the light source; and a data analyzer configured to estimate at least one wavefront parameter at a plane located on the light source side of the corrective element. The lenslet array and the sensor array are arranged to form a wavefront sensor, and the wavefront corrective element is configured to correct an aberration of the wavefront.

Abstract translation: 一种用于估计波前参数的装置包括光源，小透镜阵列，用于检测由光源产生并通过小透镜阵列的光的检测器，设置在小透镜阵列和光源之间的波前校正元件; 以及数据分析器，被配置为在位于所述校正元件的光源侧的平面处估计至少一个波前参数。 透镜阵列和传感器阵列被布置成形成波前传感器，并且波阵面校正元件被配置为校正波前的像差。

公开(公告)号：US20120296591A1

公开(公告)日：2012-11-22

申请号：US13112967

申请日：2011-05-20

Applicant: Akinori Ohkubo ,  Yasuyuki Unno

Inventor： Akinori Ohkubo ,  Yasuyuki Unno

IPC: G06F19/00

CPC classification number: G01M11/0257 ,  G01M11/02 ,  G01M11/0207 ,  G01M11/0221 ,  G01M11/0235

Abstract: An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.

Abstract translation: 一种用于测量通过测试光学器件传播的光的波前的装置，包括：光源; 来自光源的光穿过的小透镜阵列; 检测器阵列，被配置为获取通过所述小透镜阵列的光强度分布; 以及处理单元，其中所述处理单元使用所获取的光强度分布来执行数据处理，所述数据处理包括使用基于子束的传播模型或基于射线的传播模型的估计处理作为前向传播模型。

公开(公告)号：US08139215B2

公开(公告)日：2012-03-20

申请号：US12615140

申请日：2009-11-09

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G01J4/00

CPC classification number: G01J4/04

Abstract: In a measurement method for measuring polarization characteristics in which an image of a mask pattern is projected onto an image plane, a first and second slit having a width less than or equal to the wavelength of a light source are displaced on the image plane and light passing through the first and second slit is detected to obtain a first and second light intensity distribution with respect to the direction of displacement of the first and second slit. The positions at which the first light intensity distribution takes a maximum and a minimum value are determined. An index value is calculated using the respective light intensities in the second light intensity distribution at positions corresponding to the determined maximum and minimum positions. Polarization characteristics corresponding to the calculated index value are obtained by using information expressing the relationship between the index value and the polarization characteristics.

Abstract translation: 在将掩模图案的图像投影到图像平面上的偏振特性测量的测量方法中，具有小于或等于光源的波长的宽度的第一和第二狭缝在图像平面上被偏移，并且光 检测穿过第一和第二狭缝以获得关于第一和第二狭缝的位移方向的第一和第二光强分布。 确定第一光强度分布取最大值和最小值的位置。 使用与所确定的最大和最小位置对应的位置处的第二光强度分布中的各个光强度来计算指标值。 通过使用表示指标值与偏振特性之间的关系的信息，获得与计算出的指标值对应的极化特性。

公开(公告)号：US08085384B2

公开(公告)日：2011-12-27

申请号：US11742042

申请日：2007-04-30

Applicant: Akinori Ohkubo ,  Akiyoshi Suzuki

Inventor： Akinori Ohkubo ,  Akiyoshi Suzuki

IPC: G02B27/10 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC classification number: G03F7/70208 ,  G03F7/70141 ,  G03F7/70191

Abstract: An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.

Abstract translation: 将原稿的图案曝光到基板上的曝光装置包括：聚光器系统，被配置为将来自光源的光分离成多根，将多根光线在原稿的不同位置进行冷凝，并且使各个 所述多个光线相对于所述原稿在所述傅里叶变换平面处照亮所述原件比所述周边更暗;以及投影光学系统，其被配置为将所述原稿的图案投影到所述基板上。

公开(公告)号：US07911585B2

公开(公告)日：2011-03-22

申请号：US12167858

申请日：2008-07-03

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G03B27/74 ,  G03B27/42

CPC classification number: G03F1/84

Abstract: A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light for forming the light intensity distribution, and a light-shielding portion being configured to substantially shield the light; a first photoelectric conversion element configured to receive the light passing through the opening and output a light intensity signal; and a second photoelectric conversion element arranged at a position apart from the first photoelectric conversion element, and configured to receive the light transmitted through the light-shielding portion and output a light intensity signal. The mask, and the first and second photoelectric conversion elements are moved along the plane to be measured. The light intensity distribution in the plane to be measured is calculated on the basis of the light intensity signals respectively output from the first and second photoelectric conversion elements.

Abstract translation: 被配置为测量待测平面中的光强度分布的测量装置包括掩模，该掩模包括具有小于用于形成光强度分布的光的波长的尺寸的开口，以及遮光部，其被构造成基本上屏蔽 光; 第一光电转换元件，被配置为接收通过所述开口的光并输出光强度信号; 以及第二光电转换元件，其配置在与第一光电转换元件分离的位置，并且被配置为接收透过遮光部的光并输出光强度信号。 掩模和第一和第二光电转换元件沿待测平面移动。 基于分别从第一和第二光电转换元件输出的光强度信号计算要测量的平面中的光强度分布。

公开(公告)号：US20080291420A1

公开(公告)日：2008-11-27

申请号：US12118959

申请日：2008-05-12

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G03B27/72 ,  G01B11/00

CPC classification number: G03F7/70666

Abstract: An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.

Abstract translation: 提供一种图像测量方法，用于测量用投影光学系统投影的掩模的图案的图像。 该方法包括以下步骤：当衬底布置在投影光学系统的像平面处时，检测透过孔的光，衬底具有狭缝并且孔的宽度大于狭缝的宽度; 基于与检测中检测到的光有关的信号来调整狭缝的对准角度; 并且在投影光学系统的图像平面中移动狭缝的调整角度已被调整的狭缝中检测透过狭缝的光来测量图像。

公开(公告)号：US07414240B2

公开(公告)日：2008-08-19

申请号：US11255530

申请日：2005-10-20

Applicant: Akinori Ohkubo ,  Kenji Yamazoe ,  Hiroshi Osawa

Inventor： Akinori Ohkubo ,  Kenji Yamazoe ,  Hiroshi Osawa

IPC: H01S1/00 ,  H01S3/00 ,  H05H3/02

CPC classification number: G03F7/70916 ,  B08B7/0035 ,  B08B7/0042 ,  G03F7/70925

Abstract: A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights.

Abstract translation: 颗粒去除器包括：用于从不同方向将多个光照射到靶上并用于扫描靶上的光的照射单元和用于收集由于扫描光而携带的颗粒的收集器。

公开(公告)号：US07295327B2

公开(公告)日：2007-11-13

申请号：US11112826

申请日：2005-04-21

Applicant: Akinori Ohkubo

Inventor： Akinori Ohkubo

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G03F7/706

Abstract: A measuring apparatus for measuring optical performance of a test optics by using light includes a first member for generating a first ideal wave front, a second member for generating a second ideal wave front and a test wave front that reflects the optical performance of the test optics, and a detector for detecting an interference fringe between the test wave front and the second ideal wave front that passes the second member, wherein the first member and/or the second member include a first membrane having a first aperture for diffracting the light, and a second membrane having a second aperture for diffracting the light that has passed the first aperture, the second membrane being spaced from the first membrane so that the first and second apertures overlap each other.

Abstract translation: 用于通过使用光测量测试光学器件的光学性能的测量装置包括用于产生第一理想波前的第一构件，用于产生第二理想波前的第二构件和反映测试光学器件的光学性能的测试波阵面 以及检测器，用于检测穿过第二构件的测试波前和第二理想波前之间的干涉条纹，其中第一构件和/或第二构件包括具有用于衍射光的第一孔的第一膜，以及 具有用于衍射已经通过第一孔的光的第二孔的第二膜，第二膜与第一膜间隔开，使得第一和第二孔彼此重叠。