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124 条记录 (耗时 0.046 秒)

    Fuel cell
    3.
    发明申请
    Fuel cell 有权
    燃料电池

    公开(公告)号：US20050208364A1

    公开(公告)日：2005-09-22

    申请号：US11082479

    申请日：2005-03-16

    申请人： Takaki Nakagawa ,  Takahiro Yoshida ,  Hiroyuki Tanaka ,  Takashi Kosaka

    发明人： Takaki Nakagawa ,  Takahiro Yoshida ,  Hiroyuki Tanaka ,  Takashi Kosaka

    IPC分类号： H01M2/00 ,  H01M2/02 ,  H01M2/08 ,  H01M2/14 ,  H01M8/00 ,  H01M8/02 ,  H01M8/10

    CPC分类号： H01M8/0247 ,  H01M8/0206 ,  H01M8/0263 ,  H01M8/0267 ,  H01M8/0276 ,  H01M8/0297 ,  H01M8/241 ,  H01M8/2483

    摘要： A first seal member is formed integrally on both surfaces of a first metal plate. The first seal member is integrally formed on a cooling surface of the first metal plate, except a region corresponding to a reaction surface facing an electrode reaction surface, and except regions of inlet buffers and outlet buffers. The first seal member has an expansion. The position of an end surface of the expansion substantially matches the position of a wall surface of the outermost groove of a coolant flow field to prevent the flow of a coolant around the electrode reaction surface.

    摘要翻译： 第一密封构件一体地形成在第一金属板的两个表面上。 第一密封构件一体地形成在第一金属板的冷却表面上，除了对应于面向电极反应表面的反应表面的区域，以及除了入口缓冲器和出口缓冲器的区域之外。 第一个密封件有一个膨胀。 膨胀的端面的位置基本上与冷却剂流场的最外槽的壁表面的位置相匹配，以防止冷却剂在电极反应表面周围的流动。

    Fuel cell having buffer and seal for coolant
    4.
    发明授权
    Fuel cell having buffer and seal for coolant 有权
    燃料电池具有冷却液的缓冲和密封

    公开(公告)号：US08053125B2

    公开(公告)日：2011-11-08

    申请号：US11082479

    申请日：2005-03-16

    申请人： Takaki Nakagawa ,  Takahiro Yoshida ,  Hiroyuki Tanaka ,  Takashi Kosaka

    发明人： Takaki Nakagawa ,  Takahiro Yoshida ,  Hiroyuki Tanaka ,  Takashi Kosaka

    IPC分类号： H01M2/14 ,  H01M2/00 ,  H01M2/02 ,  H01M2/08 ,  H01M8/00 ,  H01M8/10

    CPC分类号： H01M8/0247 ,  H01M8/0206 ,  H01M8/0263 ,  H01M8/0267 ,  H01M8/0276 ,  H01M8/0297 ,  H01M8/241 ,  H01M8/2483

    摘要： A first seal member is formed integrally on both surfaces of a first metal plate. The first seal member is integrally formed on a cooling surface of the first metal plate, except a region corresponding to a reaction surface facing an electrode reaction surface, and except regions of inlet buffers and outlet buffers. The first seal member has an expansion. The position of an end surface of the expansion substantially matches the position of a wall surface of the outermost groove of a coolant flow field to prevent the flow of a coolant around the electrode reaction surface.

    摘要翻译： 第一密封构件一体地形成在第一金属板的两个表面上。 第一密封构件一体地形成在第一金属板的冷却表面上，除了对应于面向电极反应表面的反应表面的区域，以及除了入口缓冲器和出口缓冲器的区域之外。 第一个密封件有一个膨胀。 膨胀的端面的位置基本上与冷却剂流场的最外槽的壁表面的位置相匹配，以防止冷却剂在电极反应表面周围的流动。

    Liquid discharge head, liquid discharge device, and liquid discharge apparatus
    5.
    发明授权
    Liquid discharge head, liquid discharge device, and liquid discharge apparatus 有权

    公开(公告)号：US10981382B2

    公开(公告)日：2021-04-20

    申请号：US16601929

    申请日：2019-10-15

    申请人： Takahiro Yoshida

    发明人： Takahiro Yoshida

    IPC分类号： B41J2/14 ,  B41J2/18

    摘要： A liquid discharge head includes a plurality of nozzles from which a liquid is discharged, the plurality of nozzles arrayed in one direction, a plurality of pressure chambers communicating with the plurality of nozzles, respectively, the plurality of pressure chambers arrayed in the one direction, a common supply channel communicating with each of the plurality of pressure chambers, a common collection channel communicating with each of the plurality of pressure chambers, and a damper disposed outside an array of the plurality of pressure chambers in the one direction, and configured to form an inner surface of at least one of the common supply channel and the common collection channel.

    LIQUID EJECTION HEAD, LIQUID EJECTION UNIT, AND APPARATUS FOR EJECTING LIQUID
    8.
    发明申请
    LIQUID EJECTION HEAD, LIQUID EJECTION UNIT, AND APPARATUS FOR EJECTING LIQUID 有权
    液体喷射头，液体喷射装置及喷射装置

    公开(公告)号：US20160185113A1

    公开(公告)日：2016-06-30

    申请号：US14976757

    申请日：2015-12-21

    申请人： Takahiro Yoshida ,  Tomohiko Kohda ,  Takeshi Shimizu ,  Kanshi Abe ,  Ryo Kasahara ,  Takayuki Nakai ,  Shiomi Andou

    发明人： Takahiro Yoshida ,  Tomohiko Kohda ,  Takeshi Shimizu ,  Kanshi Abe ,  Ryo Kasahara ,  Takayuki Nakai ,  Shiomi Andou

    IPC分类号： B41J2/14

    CPC分类号： B41J2/1433 ,  B41J2/14201 ,  B41J2/14233 ,  B41J2002/14362 ,  B41J2002/14387 ,  B41J2002/14419 ,  B41J2202/12

    摘要： A liquid ejection head is provided. The liquid ejection head includes at least two nozzle lines configured to have a plurality of nozzles for ejecting liquid disposed in respective lines, a plurality of individual liquid chambers configured to be in communication with corresponding nozzles of the nozzle lines, and at least two circulation channels corresponding to the nozzle lines, configured to be in communication with the individual liquid chambers. The at least two circulation channels are in communication with each other through a bridging channel disposed in a direction intersecting with the nozzle line direction, and the bridging channel and the circulation channels are disposed at different positions in a thickness direction of a member which forms the bridging channel and the circulation channels.

    摘要翻译： 提供液体喷射头。 液体喷射头包括至少两个喷嘴线，其被配置为具有用于喷射设置在各个管线中的液体的多个喷嘴，多个单独的液体室，其被配置为与喷嘴管线的相应喷嘴连通，以及至少两个循环通道 对应于喷嘴线，其构造成与各个液体室连通。 所述至少两个循环通道通过沿与喷嘴线方向相交的方向设置的桥接通道彼此连通，并且所述桥接通道和所述循环通道设置在形成所述连接部件的部件的厚度方向上的不同位置 桥接通道和循环通道。

    Liquid ejection head and image forming apparatus including same
    9.
    发明授权
    Liquid ejection head and image forming apparatus including same 有权
    液体喷射头和包括它的成像设备

    公开(公告)号：US09259930B2

    公开(公告)日：2016-02-16

    申请号：US14174304

    申请日：2014-02-06

    申请人： Yuu Kimura ,  Takahiro Yoshida

    发明人： Yuu Kimura ,  Takahiro Yoshida

    IPC分类号： B41J2/17 ,  B41J2/175 ,  B41J2/14 ,  B41J2/16 ,  B41J2/055

    CPC分类号： B41J2/1433 ,  B41J2/055 ,  B41J2/14274 ,  B41J2/1612 ,  B41J2/1623 ,  B41J2/1626 ,  B41J2/1632 ,  B41J2/175 ,  B41J2/17513 ,  B41J2002/14419

    摘要： A liquid ejection head includes a nozzle plate, a channel plate, a common-liquid-chamber member, and a deformable damper area. The nozzle plate includes plural nozzles to eject droplets of liquid. The channel plate includes individual liquid chambers communicated with the nozzles. The common-liquid-chamber member includes a common liquid chamber to supply the liquid to the individual liquid chambers. The deformable damper area forms a wall face of the common liquid chamber. The channel plate has an end in a direction perpendicular to a nozzle array direction in which the nozzles are arrayed. The end is opposed to a portion of the damper area and has a relief at a side facing the damper area to permit deformation of the damper area.

    摘要翻译： 液体喷射头包括喷嘴板，通道板，共同液体室构件和可变形阻尼区域。 喷嘴板包括喷出液滴的多个喷嘴。 通道板包括与喷嘴连通的各个液体室。 公共 - 液体室构件包括用于将液体供应到各个液体室的公共液体室。 可变形阻尼区域形成公共液体室的壁面。 通道板在与排列喷嘴的喷嘴排列方向垂直的方向上具有端部。 该端部与阻尼器区域的一部分相对，并且在面向阻尼器区域的一侧具有浮雕，以允许阻尼器区域变形。

    Plating pretreatment solution and method for producing aluminum substrate for hard disk devices using same
    10.
    发明授权
    Plating pretreatment solution and method for producing aluminum substrate for hard disk devices using same 有权
    电镀预处理液及其制造方法

    公开(公告)号：US09127170B2

    公开(公告)日：2015-09-08

    申请号：US13981355

    申请日：2012-01-19

    申请人： Nobuaki Mukai ,  Takahiro Yoshida

    发明人： Nobuaki Mukai ,  Takahiro Yoshida

    IPC分类号： G11B5/84 ,  C09D1/00 ,  C23C18/18 ,  C23C18/32 ,  B05D3/10

    CPC分类号： C09D1/00 ,  B05D3/102 ,  C23C18/1831 ,  C23C18/32

    摘要： An object of the invention is to provide a plating pretreatment solution that can convert the surface of an aluminum substrate for hard disk devices into a surface suitable for electroless nickel plating, and a method for producing an aluminum substrate for hard disk devices using the same. The plating pretreatment solution of the present invention used for a plating pretreatment in production of an aluminum substrate for hard disk devices has an iron ion concentration of 0.1 g/l to 1.0 g/l and a nitric acid concentration of 2.0 wt % to 12.0 wt %. This plating pretreatment solution is used for a pretreatment of a plating step in which electroless nickel plating is applied to an aluminum substrate for hard disk devices. Accordingly, the surface of the aluminum substrate for hard disk devices is converted into a surface suitable for electroless Ni plating, and a smooth surface of a plated film is obtained by suppressing generation of waviness, nodules, and pits on the plated surface when electroless nickel plating is performed in the plating step.

    摘要翻译： 本发明的目的是提供一种电镀预处理溶液，其可以将用于硬盘装置的铝基板的表面转换成适用于无电解镀镍的表面，以及用于制造使用其的硬盘装置的铝基板的方法。 用于硬盘装置的铝基板的电镀预处理的本发明的电镀预处理液的铁离子浓度为0.1g / l〜1.0g / l，硝酸浓度为2.0〜12.0wt ％。 该电镀预处理溶液用于将硬化镍电镀用于硬盘装置的铝基板的电镀步骤的预处理。 因此，用于硬盘装置的铝基板的表面被转换成适合于化学镀镍的表面，并且当化学镀镍时，通过抑制电镀表面上的波纹，结块和凹坑的产生，获得镀膜的光滑表面 在电镀步骤中进行电镀。