Method of manufacturing image-forming apparatus
    1.
    发明授权
    Method of manufacturing image-forming apparatus 失效
    图像形成装置的制造方法

    公开(公告)号:US06781667B2

    公开(公告)日:2004-08-24

    申请号:US10078456

    申请日:2002-02-21

    IPC分类号: G02F113

    摘要: This invention provides an image-forming apparatus manufacturing method capable of simplifying the electron-emitting device forming process and manufacturing a low-cost image-forming apparatus exhibiting high display quality for a long term. A plurality of electrode pairs each formed from electrodes are formed on a first substrate. Polymer films for connecting the electrodes are arranged. Then, the polymer films are irradiated with a laser beam or particle beam to reduce the resistances at least partially and change the polymer films into conductive films containing carbon as a main component. A current is flowed between the electrodes to form gaps in parts of the conductive films. The first substrate, and the second substrate on which an image-forming member is arranged are joined via bonding in a reduced-pressure atmosphere, constituting an image-forming apparatus.

    摘要翻译: 本发明提供了能够简化电子发射器件形成工艺并制造长期显示出高显示质量的低成本成像设备的图像形成装置制造方法。 在第一基板上形成由电极形成的多个电极对。 布置用于连接电极的聚合物膜。 然后,用激光束或粒子束照射聚合物膜,以至少部分地降低电阻,并将聚合物膜改变为含有碳作为主要成分的导电膜。 电流在电极之间流动,以在导电膜的一部分中形成间隙。 第一基板和其上配置有图像形成部件的第二基板通过在构成图像形成装置的减压气氛中的接合而接合。

    Methods of manufacturing electron-emitting device, electron source, and image display apparatus
    3.
    发明申请
    Methods of manufacturing electron-emitting device, electron source, and image display apparatus 失效
    制造电子发射器件,电子源和图像显示装置的方法

    公开(公告)号:US20050164591A1

    公开(公告)日:2005-07-28

    申请号:US11082785

    申请日:2005-03-18

    CPC分类号: H01J9/027 H01J31/127

    摘要: In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.

    摘要翻译: 在降低表面传导电子发射器件中用于碳化的聚合物膜的电阻率的过程中,通过将能量束照射到聚合物膜上,当在单位时间内以单位面积给出的光束的能量强度为假定时 W满足公式W> = 2 xTx(rho< sub>。< sub< sub< sub< 其中T定义为在1×10 -4真空度下将聚合物膜加热1小时的温度℃, SUP> Pa以将聚合物膜的电阻率降低至0.1Ω·cm,C SUB是基材的比热J / kg.K, 衬底的比重为kg / m 3,λ为衬底的热导率W / mK,τ为10 -9 秒至10秒。

    Methods of manufacturing electron-emitting device, electron source, and image display apparatus
    4.
    发明授权
    Methods of manufacturing electron-emitting device, electron source, and image display apparatus 失效
    制造电子发射器件,电子源和图像显示装置的方法

    公开(公告)号:US07077716B2

    公开(公告)日:2006-07-18

    申请号:US11082785

    申请日:2005-03-18

    IPC分类号: H01J9/00

    CPC分类号: H01J9/027 H01J31/127

    摘要: In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.

    摘要翻译: 在降低表面传导电子发射器件中用于碳化的聚合物膜的电阻率的过程中,通过将能量束照射到聚合物膜上,当在单位时间内以单位面积给出的光束的能量强度为假定时 W满足公式W> = 2xTx(rho< sub>。< sub< sub>< 其中T定义为聚合物膜在1×10 -4真空度下加热1小时的温度℃ > Pa以将聚合物膜的电阻率降低至0.1Ω·cm,C SUB是基质的比热J / kg.K,特别是碱 衬底的重力kg / m 3,λ是衬底的热传导率W / mK,τ是在10°范围内的照射时间, -9秒至10秒。

    Methods of manufacturing electron-emitting device, electron source, and image display apparatus
    5.
    发明授权
    Methods of manufacturing electron-emitting device, electron source, and image display apparatus 失效
    制造电子发射器件,电子源和图像显示装置的方法

    公开(公告)号:US06896571B2

    公开(公告)日:2005-05-24

    申请号:US10372853

    申请日:2003-02-26

    CPC分类号: H01J9/027 H01J31/127

    摘要: In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.

    摘要翻译: 在降低表面传导电子发射器件中用于碳化的聚合物膜的电阻率的过程中,通过将能量束照射到聚合物膜上,当在单位时间内以单位面积给出的光束的能量强度为假定时 W满足公式W> = 2xTx(rho>>> ambda / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / 其中T定义为聚合物膜在1×10 -4真空度下加热1小时的温度℃ > Pa以将聚合物膜的电阻率降低至0.1Ω·cm,C SUB是基质的比热J / kg.K,特别是碱 衬底的重力kg / m 3,λ是衬底的热传导率W / mK,τ是在10°范围内的照射时间, -9秒至10秒。