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公开(公告)号：US20110310365A1
公开(公告)日：2011-12-22
申请号：US13051649
申请日：2011-03-18
IPC分类号： G03B27/52
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。
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公开(公告)号：US20100051832A1
公开(公告)日：2010-03-04
申请号：US12543582
申请日：2009-08-19
IPC分类号： G21K5/04
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。
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公开(公告)号：US20120267343A1
公开(公告)日：2012-10-25
申请号：US13543510
申请日：2012-07-06
CPC分类号： H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
摘要： A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
摘要翻译： 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
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4.发明申请公开(公告)号：US20130075625A1
公开(公告)日：2013-03-28
申请号：US13553621
申请日：2012-07-19
摘要： A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member.
摘要翻译： 目标供给单元包括：输出目标材料的喷嘴;以及形成有第一开口的第一导电构件，其位于与通过喷嘴输出目标材料的方向相对的喷嘴。 第一导电构件被定位成使得第一开口在重力方向上位于喷嘴下方。 目标供应单元包括在目标材料和第一导电构件之间施加电压的电压发生器。
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公开(公告)号：US20100193711A1
公开(公告)日：2010-08-05
申请号：US12685835
申请日：2010-01-12
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/02
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。
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公开(公告)号：US20100288937A1
公开(公告)日：2010-11-18
申请号：US12764517
申请日：2010-04-21
申请人： Yukio WATANABE , Osamu Wakabayashi , Miwa Igarashi
发明人： Yukio WATANABE , Osamu Wakabayashi , Miwa Igarashi
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , G21K1/04 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.
摘要翻译： 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。
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公开(公告)号：US20120119118A1
公开(公告)日：2012-05-17
申请号：US13359315
申请日：2012-01-26
申请人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
发明人： Yukio WATANABE , Osamu Wakabayashi , Junichi Fujimoto , Toshihiro Nishisaka , Hiroshi Someya , Hideo Hoshino
IPC分类号： G21K5/00
CPC分类号： G03F7/70975 , G03F7/70033
摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。
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公开(公告)号：US20110123184A1
公开(公告)日：2011-05-26
申请号：US12952306
申请日：2010-11-23
申请人： Jonathan MATHER , Andrew KAY , David James MONTGOMERY , James Rowland SUCKLING , Emma Jayne WALTON , Yasunori KANAZAWA , Yukio WATANABE , Hirofumi ODA , Taro SUGITA
发明人： Jonathan MATHER , Andrew KAY , David James MONTGOMERY , James Rowland SUCKLING , Emma Jayne WALTON , Yasunori KANAZAWA , Yukio WATANABE , Hirofumi ODA , Taro SUGITA
CPC分类号： G03B15/05 , G02B6/001 , G02B6/0036 , G02B6/0051 , G02B6/0053 , G02B6/0065 , G02B6/0068 , G02B6/0073 , G03B2215/0567 , G03B2215/0571 , G03B2215/0582 , G03B2215/0592 , H04M19/048 , H04N5/2256
摘要： A camera flash comprises a light guide arranged to extract light at least through one surface; and one or more light sources arranged, in use, to emit light into the lightguide. Each light source is an LED or a laser diode. The camera flash is connectable, in use, to drive circuitry, the drive circuitry being for driving the light source(s) to emit a pulse of light. The waveguide spreads out the light from the light source(s), so that a flash of light from the camera flash does not present a safety risk, while minimising loss of the light from the light source(s). The camera flash can thus provide a high overall optical output, spread over an extended area (as defined by the waveguide). The lightguide may for example be disposed around a camera module of a mobile telephone camera.
摘要翻译： 相机闪光灯包括布置成至少通过一个表面提取光的光导; 并且在使用中布置一个或多个光源以将光发射到光导中。 每个光源是LED或激光二极管。 相机闪光灯在使用中可连接到驱动电路，驱动电路用于驱动光源发射出一脉冲的光。 波导从光源传播光线，使得来自相机闪光的闪光灯不会出现安全风险，同时最小化来自光源的光的损失。 因此，相机闪光灯可以提供高的总体光输出，扩展在扩展区域（由波导限定）。 光导可以例如设置在移动电话摄像机的相机模块周围。
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9.发明申请CONTACT HISTORY RECORDING SYSTEM, CONTACT HISTORY RECORDING METHOD AND IMAGE PROCESSING APPARATUS 审中-公开联系历史记录系统，联系历史记录方法和图像处理装置公开(公告)号：US20110085709A1
公开(公告)日：2011-04-14
申请号：US12898823
申请日：2010-10-06
IPC分类号： G06K9/00
CPC分类号： G03G21/1657 , G06F2221/2101 , G06F2221/2117 , G06F2221/2129 , G06F2221/2151
摘要： A contact history recording system for recording a contact history for each of target portions in an apparatus in cases of being contacted by a person, including: a plurality of transmitters, each installed at each of the target portions; and a receiver which communicates with the plurality of transmitters, wherein each transmitter includes: a memory section which previously stores individual identification information of a target portion where a transmitter is installed; and transmitting section which transmits the individual identification information stored in the memory section in cases where the target portion where the transmitter is installed is contacted by a person, and wherein the receiver includes: a receiving section which receives the individual identification information transmitted from the transmitter; and a control section which inputs the individual identification information received by the receiving section to a recording section to record the inputted individual identification information.
摘要翻译： 一种接触历史记录系统，用于在由人接触的情况下记录设备中每个目标部分的联系历史，包括：多个发射机，每个发射机安装在每个目标部分; 以及与所述多个发射机通信的接收机，其中每个发射机包括：存储器部分，其预先存储安装发射机的目标部分的各个识别信息; 以及发送部，其在发送装置的目标部分与个人接触的情况下发送存储在存储器部分中的各个识别信息，并且其中，所述接收机包括：接收部，其接收从发送器发送的各个识别信息 ; 以及控制部分，其将由接收部分接收的各个识别信息输入到记录部分，以记录输入的个体识别信息。
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