公开(公告)号：US08669542B2

公开(公告)日：2014-03-11

申请号：US12764517

申请日：2010-04-21

申请人： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

发明人： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

IPC分类号： G01J3/10

CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

摘要翻译： 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。

公开(公告)号：US20100288937A1

公开(公告)日：2010-11-18

申请号：US12764517

申请日：2010-04-21

申请人： Yukio WATANABE ,  Osamu Wakabayashi ,  Miwa Igarashi

发明人： Yukio WATANABE ,  Osamu Wakabayashi ,  Miwa Igarashi

IPC分类号： H05G2/00 ,  G01J1/42

CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

摘要翻译： 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。

公开(公告)号：US20130037693A1

公开(公告)日：2013-02-14

申请号：US13642494

申请日：2011-12-22

申请人： Masato Moriya ,  Miwa Igarashi ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Miwa Igarashi ,  Osamu Wakabayashi

IPC分类号： G02B27/16 ,  G01J1/04 ,  G21K5/00

CPC分类号： G02B27/16 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter.

摘要翻译： 与激光装置一起使用的光学系统可以包括聚焦光学系统，分束器和光学传感器。 聚焦光学系统具有一个或多个焦点，用于聚焦从激光装置输出的激光束。 分束器设置在聚焦光学系统和聚焦光学系统的一个或多个焦点之间。 光学传感器设置在由分束器分裂的激光束的光束路径上。

公开(公告)号：US20130105713A1

公开(公告)日：2013-05-02

申请号：US13809582

申请日：2012-03-23

申请人： Yukio Watanabe ,  Miwa Igarashi ,  Masato Moriya ,  Hiroaki Nakarai

发明人： Yukio Watanabe ,  Miwa Igarashi ,  Masato Moriya ,  Hiroaki Nakarai

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70033 ,  H05G2/003

摘要： An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

摘要翻译： 用于产生极紫外光的装置可以包括：具有开口的腔室，激光束通过该开口引入腔室; 安装所述室的参考构件; 目标供应单元，用于将由激光束照射的目标材料供应到室内的预定区域; 激光束聚焦光学系统，用于将激光束聚焦在室内的预定区域中，以将目标材料转换成等离子体; 以及用于收集从等离子体发射的极紫外光的收集器反射镜。

公开(公告)号：US09301379B2

公开(公告)日：2016-03-29

申请号：US13809582

申请日：2012-03-23

申请人： Yukio Watanabe ,  Miwa Igarashi ,  Masato Moriya ,  Hiroaki Nakarai

发明人： Yukio Watanabe ,  Miwa Igarashi ,  Masato Moriya ,  Hiroaki Nakarai

IPC分类号： G21K5/04 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/008 ,  G03F7/70033 ,  H05G2/003

摘要： An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

摘要翻译： 用于产生极紫外光的装置可以包括：具有开口的腔室，激光束通过该开口引入腔室; 安装所述室的参考构件; 目标供应单元，用于将由激光束照射的目标材料供应到室内的预定区域; 激光束聚焦光学系统，用于将激光束聚焦在室内的预定区域中，以将靶材料转化为等离子体; 以及用于收集从等离子体发射的极紫外光的收集器反射镜。

公开(公告)号：US5968713A

公开(公告)日：1999-10-19

申请号：US896833

申请日：1997-07-18

申请人： Koji Nozaki ,  Ei Yano ,  Keiji Watanabe ,  Takahisa Namiki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Satoshi Takechi ,  Akiko Kotachi ,  Makoto Takahashi

发明人： Koji Nozaki ,  Ei Yano ,  Keiji Watanabe ,  Takahisa Namiki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Satoshi Takechi ,  Akiko Kotachi ,  Makoto Takahashi

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble, film-forming compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing a protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition is particularly suitable for excimer laser lithography using an alkaline developer, and the formed resist patterns can exhibit a high sensitivity and excellent dry etch resistance without swelling.

公开(公告)号：US5906912A

公开(公告)日：1999-05-25

申请号：US834044

申请日：1997-04-11

申请人： Keiji Watanabe ,  Miwa Igarashi ,  Ei Yano ,  Keiko Yano ,  Takashi Maruyama ,  Eiichi Hoshino ,  Kotaro Shirabe ,  Masafumi Nakaishi

发明人： Keiji Watanabe ,  Miwa Igarashi ,  Ei Yano ,  Keiko Yano ,  Takashi Maruyama ,  Eiichi Hoshino ,  Kotaro Shirabe ,  Masafumi Nakaishi

IPC分类号： G03F7/038 ,  C23F1/00 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  G03F7/26 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/768 ,  G03C5/00

CPC分类号： G03F7/093 ,  G03F1/40 ,  H01L21/31138 ,  H01L21/76838

摘要： An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.

摘要翻译： 通过用包含100重量份的含有能够与交联剂交联的有机基团的可溶性导电聚合物的溶液涂布基材来形成导电图案，5至1,000重量份的交联剂 和100〜100,000重量份的溶剂; 实现所得涂膜的交联，得到薄膜电阻为1010Ω/□以下的固化导电膜; 在固化的导电层上形成上层的图案; 并将上层的图案转印到固化的导电层上。

公开(公告)号：US06605414B2

公开(公告)日：2003-08-12

申请号：US09439724

申请日：1999-11-12

申请人： Keiji Watanabe ,  Koji Nozaki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Ei Yano ,  Takahisa Namiki ,  Hiroshi Shirataki ,  Keita Ohtsuka ,  Michiaki Kanamine ,  Yuji Uehara

发明人： Keiji Watanabe ,  Koji Nozaki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Ei Yano ,  Takahisa Namiki ,  Hiroshi Shirataki ,  Keita Ohtsuka ,  Michiaki Kanamine ,  Yuji Uehara

IPC分类号： G03F730

CPC分类号： G11B5/3903 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3906 ,  G11B5/398 ,  Y10S438/911

摘要： A method for manufacturing a magnetoresistance head of the present invention comprises the steps of forming an organic film on a multilayered film constituting a magnetoresistance device, forming an upper film formed of resist or inorganic film on the organic film, patterning the organic film and the upper film, cutting into edges of the organic film patterns from edges of the upper film patterns inwardly to such an extent that particles of the thin film being formed on the upper film and the multilayered film do not contact to side portions of the organic film patterns.

摘要翻译： 本发明的磁电阻头的制造方法包括以下步骤：在构成磁阻器件的多层膜上形成有机膜，在有机膜上形成由抗蚀剂或无机膜形成的上层膜，使有机膜和上层 薄膜，从上部膜图案的边缘向内切割成有机膜图案的边缘，使得形成在上部膜和多层膜上的薄膜的颗粒不与有机膜图案的侧部接触。

公开(公告)号：US6052261A

公开(公告)日：2000-04-18

申请号：US669610

申请日：1996-06-24

申请人： Keiji Watanabe ,  Koji Nozaki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Ei Yano ,  Takahisa Namiki ,  Hiroshi Shirataki ,  Keita Ohtsuka ,  Michiaki Kanamine ,  Yuji Uehara

发明人： Keiji Watanabe ,  Koji Nozaki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Ei Yano ,  Takahisa Namiki ,  Hiroshi Shirataki ,  Keita Ohtsuka ,  Michiaki Kanamine ,  Yuji Uehara

IPC分类号： G11B5/31 ,  G11B5/39 ,  G11B5/127

CPC分类号： G11B5/3903 ,  G11B5/3906 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/398 ,  Y10S438/911

摘要： A method for manufacturing a magnetoresistance head of the present invention comprises the steps of forming an organic film on a multilayered film constituting a magnetoresistance device, forming an upper film formed of resist or inorganic film on the organic film, patterning the organic film and the upper film, cutting into edges of the organic film patterns from edges of the upper film patterns inwardly to such an extent that particles of the thin film being formed on the upper film and the multilayered film do not contact to side portions of the organic film patterns.

公开(公告)号：US06013416A

公开(公告)日：2000-01-11

申请号：US673739

申请日：1996-06-27

申请人： Koji Nozaki ,  Ei Yano ,  Keiji Watanabe ,  Takahisa Namiki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Satoshi Takechi ,  Akiko Kotachi ,  Makoto Takahashi

发明人： Koji Nozaki ,  Ei Yano ,  Keiji Watanabe ,  Takahisa Namiki ,  Miwa Igarashi ,  Yoko Kuramitsu ,  Satoshi Takechi ,  Akiko Kotachi ,  Makoto Takahashi

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble, film-forming compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing a protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition is particularly suitable for excimer laser lithography using an alkaline developer, and the formed resist patterns can exhibit a high sensitivity and excellent dry etch resistance without swelling.

摘要翻译： 碱可显影的化学放大抗蚀剂组合物，其包含具有包含受保护的碱溶性基团的结构单元的碱不溶性成膜化合物，其中所述受保护的碱溶性基团的保护部分在酸的作用下被切割 由与所述化合物组合使用的光致酸产生剂产生，从而从碱溶性基团释放保护部分并将所述化合物转化为碱溶性化合物，以及能够在曝光于图案化辐射时分解的光致酸产生剂 产生能够导致所述保护部分裂解的酸。 抗蚀剂组合物特别适合于使用碱性显影剂的准分子激光光刻，并且所形成的抗蚀剂图案可以表现出高灵敏度和优异的耐干蚀刻性而不膨胀。