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1.发明授权Spectral detection method and device, and defect inspection method and apparatus using the same 有权光谱检测方法和装置，以及使用其的缺陷检查方法和装置公开(公告)号：US08279431B2
公开(公告)日：2012-10-02
申请号：US12626963
申请日：2009-11-30
IPC分类号： G01N21/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译： 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。 然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。
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公开(公告)号：US08411928B2
公开(公告)日：2013-04-02
申请号：US12482126
申请日：2009-06-10
IPC分类号： G06K9/00
CPC分类号： G11B5/746 , G01B11/24 , G01N21/8851 , G01N21/956 , G11B5/855
摘要： An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
摘要翻译： 使用设计信息指定检查区域，以通过散射法进行测量的区域划分。 所获得的检测数据通过图案分类为周期性区域和非周期性区域。 通过光学传感器检测光谱特性以提取特征。 将提取的特征与存储在每个区域的特征图数据库中的特征进行比较，以评估图案化介质的状态。
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公开(公告)号：US20100085855A1
公开(公告)日：2010-04-08
申请号：US12482125
申请日：2009-06-10
IPC分类号： G11B27/36
CPC分类号： G11B20/1883 , G11B2020/1826 , G11B2220/20 , G11B2220/2516
摘要： A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process.
摘要翻译： 在纳米压印过程中产生的缺陷通过散射法进行检查。 散射方法是通过半反射镜和物镜通过第一照明器照亮具有多个波长的光的介质的表面，并使介质上反射的光通过物镜入射到光谱仪上 和半反射镜。 第二个照明器相对于介质的表面从倾斜的方向照射介质表面上的异物或划痕。 光从异物或划痕散射并由第一和第二检测器检测。 第一检测器被放置在与介质表面限定第一仰角的方向上。 第二检测器被放置在与介质表面限定第二仰角的方向上。 当通过散射测定方法获得的缺陷的坐标与异物或划痕的坐标匹配时，检查装置确定在纳米压印过程中不产生缺陷。 当匹配为负时，检查装置确定在纳米压印过程中产生缺陷。
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公开(公告)号：US07969567B2
公开(公告)日：2011-06-28
申请号：US12482125
申请日：2009-06-10
IPC分类号： G01N21/00
CPC分类号： G11B20/1883 , G11B2020/1826 , G11B2220/20 , G11B2220/2516
摘要： A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process.
摘要翻译： 在纳米压印过程中产生的缺陷通过散射法进行检查。 散射方法是通过半反射镜和物镜通过第一照明器照亮具有多个波长的光的介质的表面，并使介质上反射的光通过物镜入射到光谱仪上 和半反射镜。 第二个照明器相对于介质的表面从倾斜的方向照射介质表面上的异物或划痕。 光从异物或划痕散射并由第一和第二检测器检测。 第一检测器被放置在与介质表面限定第一仰角的方向上。 第二检测器被放置在与介质表面限定第二仰角的方向上。 当通过散射测定方法获得的缺陷的坐标与异物或划痕的坐标匹配时，检查装置确定在纳米压印过程中不产生缺陷。 当匹配为负时，检查装置确定在纳米压印过程中产生缺陷。
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公开(公告)号：US20100098320A1
公开(公告)日：2010-04-22
申请号：US12482126
申请日：2009-06-10
IPC分类号： G06K9/00
CPC分类号： G11B5/746 , G01B11/24 , G01N21/8851 , G01N21/956 , G11B5/855
摘要： An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
摘要翻译： 使用设计信息指定检查区域，以通过散射法进行测量的区域划分。 所获得的检测数据通过图案分类为周期性区域和非周期性区域。 通过光学传感器检测光谱特性以提取特征。 将提取的特征与存储在每个区域的特征图数据库中的特征进行比较，以评估图案化介质的状态。
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公开(公告)号：US20100124370A1
公开(公告)日：2010-05-20
申请号：US12620713
申请日：2009-11-18
申请人： Keiya SAITO , Hideaki Sasazawa , Takenori Hirose
发明人： Keiya SAITO , Hideaki Sasazawa , Takenori Hirose
IPC分类号： G06K9/00
CPC分类号： G06K9/4661 , G06T7/0004 , G06T2207/10152
摘要： This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform of reflecting light detected from the sample, and detecting an edge roughness of the pattern based on the spectral waveform of the reflecting light detected from the sample, and a second step of irradiating a laser beam to the sample from an oblique direction, and detecting the edge roughness of the pattern based on scattered light detected from the sample.
摘要翻译： 本发明涉及一种图案形状检查方法及其装置，用于进行从垂直方向向样品照射包含远紫外光的宽带照明光的第一步骤，基于反射光的光谱波形检查图案的形状 根据从样品检测的反射光的光谱波形检测图案的边缘粗糙度，以及从倾斜方向照射激光束到样品的第二步骤，并且检测边缘粗糙度 基于从样品检测到的散射光的图案。
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公开(公告)号：US08260029B2
公开(公告)日：2012-09-04
申请号：US12620713
申请日：2009-11-18
申请人： Keiya Saito , Hideaki Sasazawa , Takenori Hirose
发明人： Keiya Saito , Hideaki Sasazawa , Takenori Hirose
IPC分类号： G06K9/00
CPC分类号： G06K9/4661 , G06T7/0004 , G06T2207/10152
摘要： This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform of reflecting light detected from the sample, and detecting an edge roughness of the pattern based on the spectral waveform of the reflecting light detected from the sample, and a second step of irradiating a laser beam to the sample from an oblique direction, and detecting the edge roughness of the pattern based on scattered light detected from the sample.
摘要翻译： 本发明涉及一种图案形状检查方法及其装置，用于进行从垂直方向向样品照射包含远紫外光的宽带照明光的第一步骤，基于反射光的光谱波形检查图案的形状 根据从样品检测的反射光的光谱波形检测图案的边缘粗糙度，以及从倾斜方向照射激光束到样品的第二步骤，并且检测边缘粗糙度 基于从样品检测到的散射光的图案。
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公开(公告)号：US20120287426A1
公开(公告)日：2012-11-15
申请号：US13520217
申请日：2011-01-27
CPC分类号： G11B5/855 , G01B11/0641 , G01N21/95607
摘要： In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected light from the patterns including the multilayers.
摘要翻译： 在用于硬盘的图案化介质的光学检查中，提供了用于检查图案的图案检查装置，而不会影响底层膜的膜厚度和膜质量的变化，该装置包括用于通过以下方式检测多层膜的光学特性的光学特性检测装置 在由所述分光检测装置分散和检测的反射光中，对来自所述基板上的非图案化区域的反射光进行处理，并处理与来自所述图案的反射光相对应的检测信号和检测来自所述图案的反射光的检测信号，所述反射光包括 多层 以及用于检查形成在多层上的图案的图案检查装置，通过在通过光学特性检测装置检测到光学特性时观察，查看来自多层的反射光的光学特性的信息，以及关于光学特性的处理信息 来自包括多层的图案的反射光。
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公开(公告)号：US08040772B2
公开(公告)日：2011-10-18
申请号：US12425438
申请日：2009-04-17
申请人： Keiya Saito , Takenori Hirose , Hideaki Sasazawa
发明人： Keiya Saito , Takenori Hirose , Hideaki Sasazawa
CPC分类号： G11B27/36 , B82Y10/00 , G01N21/9506 , G01N21/95607 , G01N2021/945 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , G11B5/865 , G11B2220/2516
摘要： An apparatus for inspecting a pattern shape of a magnetic record medium or its stamper includes: a moving mechanism, on which an object to be inspected where a pattern is formed is placed and which moves the object to be inspected in a radial direction while rotating the object; an irradiating optical system that applies illuminating light of a wide band including far ultraviolet light to the object to be inspected moved in the radial direction while rotating the object by the moving mechanism in a polarized state suitable for the object to be inspected from an oblique direction; a detecting optical system that detects zero-order reflected light generated from the object to be inspected irradiated by the irradiating optical system; and a shape inspection unit that inspects a pattern shape formed on the object to be inspected based on a spectral reflectance waveform obtained by dispersing the detected zero-order reflected light, thereby inspecting the pattern shape at a high speed and with high sensitivity.
摘要翻译： 用于检查磁记录介质或其压模的图案形状的装置包括：移动机构，其上形成有图案的待检查对象，并且沿径向移动被检查物体，同时旋转 目的; 照射光学系统，其将从包括远紫外线的宽带的照明光向受检对象移动，同时通过移动机构以倾斜方向适于被检查对象的偏振状态旋转物体 ; 检测光学系统，其检测由所述照射光学系统照射的待检查物体产生的零级反射光; 以及形状检查单元，其基于通过分散检测到的零级反射光而获得的光谱反射率波形来检查形成在待检查对象上的图案形状，从而以高速和高灵敏度检查图案形状。
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10.发明申请METHOD FOR DEFECT DETERMINATION IN FINE CONCAVE-CONVEX PATTERN AND METHOD FOR DEFECT DETERMINATION ON PATTERNED MEDIUM 失效用于在精细凹凸图案中进行缺陷确定的方法和用于在图形化介质上进行缺陷确定的方法公开(公告)号：US20110001962A1
公开(公告)日：2011-01-06
申请号：US12789188
申请日：2010-05-27
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/9501 , G01N21/95607 , G01N21/95692 , G11B5/82 , G11B5/855 , H01L22/10
摘要： In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type.
摘要翻译： 在检查精细凹凸图案中的缺陷时，检测检查对象的检测区域的光谱波形，关于由检测区域属于检查对象的图案类型确定的区域区域的区域确定 选择对应于确定的区域部分并根据缺陷类型变化的特征计算方程和确定指标值，执行根据所选特征计算方程的光谱波形数据的特征计算，并且计算特征值 并且将所选择的确定指标值进行比较，以根据缺陷类型执行确定处理。
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