公开(公告)号：US06768537B2

公开(公告)日：2004-07-27

申请号：US10417120

申请日：2003-04-17

申请人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

发明人： Takeshi Suzuki ,  Hideki Komatsuda ,  Yasuhiro Omura

IPC分类号： G03B2748

CPC分类号： G03F7/70941 ,  G03B27/48

摘要： A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

摘要翻译： 一种投影光学系统，用于在短于200nm的波长区域中使用曝光光将第一平面中的图案的图像形成到第二平面上。 当放置在第一平面中并且具有暗图案和围绕暗图案的光图案的投影图案被投影到第二平面上时，在第二平面中形成暗图案的投影图像的区域中的平均照度为 8或更小，其中在第二平面中暗图案周围的光图案的图像的照度设置为100。

公开(公告)号：US06661499B2

公开(公告)日：2003-12-09

申请号：US10226347

申请日：2002-08-23

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2772

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

公开(公告)号：US06466303B1

公开(公告)日：2002-10-15

申请号：US09330442

申请日：1999-06-11

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

摘要翻译： 一种投影曝光装置（10），用于将存在于诸如光罩（R）的第一物体上的图案的图像形成在诸如晶片（W）的第二物体上。 该装置包括沿着三个光轴（AZ1，AX，AZ2），能够以部分偏振光照射掩模版的照明光学系统，以及布置在掩模版附近并与照明光学系统相对的反射折射投射光学系统（40-70） 。 反折射投影光学系统包括一个或多个基本上为球面的反射镜（48），多个折射构件（42,48,72,74）和一个或多个平面镜（60,66）。 平面镜被设计和布置为允许在晶片上形成用部分偏振光照射的标线图案的基本非偏振图像。

公开(公告)号：US09195069B2

公开(公告)日：2015-11-24

申请号：US11783561

申请日：2007-04-10

申请人： Hirohisa Tanaka ,  Hideki Komatsuda

发明人： Hirohisa Tanaka ,  Hideki Komatsuda

IPC分类号： G03B27/54 ,  G03B27/44 ,  G03B27/72 ,  G03B27/32 ,  G02B27/09 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G02B27/0905 ,  G02B27/0961 ,  G02B27/0972 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283

摘要： An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.

摘要翻译： 照明光学装置具有：分束构件，其将入射光束分成第一光束和第二光束，以形成第一照明区域和第二照明区域;第一导光光学系统，其将第一光束引导到 第一照明区域和将第二光束引导到第二照明区域的第二导光光学系统与第一照明区域分离。

公开(公告)号：US20090040493A1

公开(公告)日：2009-02-12

申请号：US12170236

申请日：2008-07-09

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/54

CPC分类号： G03F7/702

摘要： An illumination optical apparatus includes a light source, which supplies illumination light including a wavelength of 5 nm to 50 nm, and an illumination optical system, which guides the illumination light to an illuminated surface. The illumination optical system includes an aperture angle restriction member and a condenser optical system, which is arranged in an optical path between the aperture restriction member and the illuminated surface to guide light beam from the aperture angle restriction member to the illuminated surface. A rotation axis of an arcuate-shape of an illumination region formed on the illuminated surface is located outside an opening of the aperture angle restriction member. The condenser optical system includes a plurality of reflection surfaces. Among the plurality of reflection surfaces, the reflection surface closest to the illuminated surface along the optical path includes a concave shape. When, for example, applied to an EUVL exposure apparatus, the illumination optical apparatus illuminates a reflective mask, serving as the illumination plane, without a plane mirror in the optical path between the illumination optical system and the mask.

摘要翻译： 照明光学装置包括提供包括5nm至50nm的波长的照明光的光源和将照明光引导到照明表面的照明光学系统。 照明光学系统包括孔径限制构件和聚光镜系统，其设置在孔径限制构件和被照射表面之间的光路中，以将来自孔径角度限制构件的光束引导到被照射的表面。 形成在被照射面上的照明区域的弧形的旋转轴位于孔径角限制部件的开口的外侧。 聚光镜系统包括多个反射面。 在多个反射面中，沿着光路最靠近被照射面的反射面包括凹形。 例如，当EUVL曝光装置被应用时，照明光学装置在照明光学系统和掩模之间的光路中照射作为照明平面的反射掩模，而没有平面镜。

公开(公告)号：US07483122B2

公开(公告)日：2009-01-27

申请号：US11984192

申请日：2007-11-14

申请人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

发明人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/7025 ,  G02B17/0657 ,  G03F7/70233

摘要： A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.

摘要翻译： 投影光学系统是其中视野区域和成像区域与光轴间隔开的反射系统，其中到达图像平面上的每个点的光的数值孔径与图像高度无关，并且 一个方向 提供用于限定投影光学系统的数值孔径的孔径光阑，并且孔径光阑设置有预定形状的开口部分，其中到达预定区域内的各点的光的数值孔径在预定的范围内基本均匀 即相对于彼此垂直的两个方向的尺寸彼此不同的形状。 限定孔径部分的预定形状，以补偿由于设置在孔径光阑和不能满足的光阑的图像之间的部分光学系统而在预定区域内到达各点的光的数值孔径的不均匀性的影响 期望的投射关系。

公开(公告)号：US20070242249A1

公开(公告)日：2007-10-18

申请号：US11712957

申请日：2007-03-02

申请人： Yuichi Shibazaki ,  Hideki Komatsuda

发明人： Yuichi Shibazaki ,  Hideki Komatsuda

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70466

摘要： The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions respectively, and which performs the exposure with high throughput. Upon transferring a pattern of a reticle onto a wafer by the scanning exposure method, first and second pattern areas are formed in advance on the reticle to be adjacent in the scanning direction, and when the first and second pattern areas simultaneously pass across a field of a projection optical system, the first pattern area is illuminated in a first illumination condition by using a first illumination slit of which width in the scanning direction is gradually narrowed, and the second pattern area is illuminated in a second illumination condition by using a second illumination slit of which width in the scanning direction is gradually widened, to thereby expose the wafer.

摘要翻译： 本发明提供了一种曝光方法，其分别在最佳照明条件下照亮其整个表面上的每个图案，进行双重曝光，并以高生产量进行曝光。 在通过扫描曝光方法将掩模版图案转印到晶片上之后，预先在掩模版上形成第一和第二图案区域，以在扫描方向上相邻，并且当第一和第二图案区域同时穿过 投影光学系统，通过使用其中扫描方向宽度逐渐变窄的第一照明狭缝，在第一照明条件下照亮第一图案区域，并且通过使用第二照明在第二照明条件下照亮第二图案区域 在扫描方向上的宽度的狭缝逐渐变宽，从而使晶片露出。

公开(公告)号：US07023523B2

公开(公告)日：2006-04-04

申请号：US11177141

申请日：2005-07-07

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/42

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70283 ,  G03F7/70358

摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.

摘要翻译： 曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。 系统将掩模图案精确地传送到感光基片上。 该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。 投影光学系统在感光基板（W）上形成掩模图案的图像。 掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。 照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。 掩模和场停止之间的间隔满足规定的条件关系。

公开(公告)号：US20050264789A1

公开(公告)日：2005-12-01

申请号：US11177141

申请日：2005-07-07

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70283 ,  G03F7/70358

摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.

摘要翻译： 曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。 系统将掩模图案精确地传送到感光基片上。 该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。 投影光学系统在感光基板（W）上形成掩模图案的图像。 掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。 照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。 掩模和场停止之间的间隔满足规定的条件关系。

公开(公告)号：US06665051B2

公开(公告)日：2003-12-16

申请号：US10208033

申请日：2002-07-31

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70233 ,  G03F7/70358

摘要： An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path between the radiation source unit and the optical integrator, a detector arranged in an optical path of the exposure apparatus body unit, and a controller which is connected to the detector and which controls an inclination of the mirror based on an output from the detector. In addition, the radiation source unit and the exposure apparatus body unit are installed independently.