-
1.发明授权
公开(公告)号：US5447823A
公开(公告)日：1995-09-05
申请号：US70664
申请日：1993-06-02
IPC分类号： C07C323/36 , C07D277/82 , C09B29/00 , C09B29/033 , C09B45/00 , C09B69/02 , G11B7/246 , G11B7/2467 , G11B7/249 , G11B7/2492 , G11B7/253 , G11B7/2534 , G11B7/254 , G11B7/2542 , G11B7/258 , G11B7/2595 , G11B7/24
CPC分类号： C07C323/36 , C07D277/82 , C09B29/0025 , C09B29/0088 , C09B45/00 , C09B69/02 , G11B7/2467 , G11B7/249 , G11B7/2492 , G11B7/2534 , G11B7/2542 , G11B7/2595 , Y10S430/146
摘要： An azo metal chelate compound of an azo compound of the formula (I) with a metal: ##STR1## wherein A is a residue forming a heterocyclic ring together with the carbon atom and the nitrogen atom to which it is bonded, X is a residue forming an aromatic group together with the two carbon atoms to which it is bonded, R.sup.1 is an alkyl group which may be substituted, an aryl group which may be substituted, an alkenyl group which may be substituted, or a cycloalkyl group which may be substituted, Y is a hydrogen atom or a cation, and n is an integer of from 1 to 3.
摘要翻译： 式（I）的偶氮化合物与金属的偶氮金属螯合化合物：其中A是与其键合的碳原子和氮原子一起形成杂环的残基X 是与其键合的两个碳原子一起形成芳族基团的残基，R 1可以被取代的烷基，可被取代的芳基，可被取代的链烯基或环烷基， 可以被取代，Y是氢原子或阳离子，n是1-3的整数。
-
公开(公告)号：US5532342A
公开(公告)日：1996-07-02
申请号：US422948
申请日：1995-04-17
IPC分类号： C07C323/36 , C07D277/82 , C09B29/00 , C09B29/033 , C09B45/00 , C09B69/02 , G11B7/246 , G11B7/2467 , G11B7/249 , G11B7/2492 , G11B7/253 , G11B7/2534 , G11B7/254 , G11B7/2542 , G11B7/258 , G11B7/2595 , C09B29/042 , C09B29/045 , C09B29/09 , B41M5/26
CPC分类号： C07C323/36 , C07D277/82 , C09B29/0025 , C09B29/0088 , C09B45/00 , C09B69/02 , G11B7/2467 , G11B7/249 , G11B7/2492 , G11B7/2534 , G11B7/2542 , G11B7/2595 , Y10S430/146
摘要： An azo metal chelate compound of an azo compound of the formula (I) with a metal: ##STR1## wherein A is a residue forming a heterocyclic ring together with the carbon atom and the nitrogen atom to which it is bonded, X is a residue forming an aromatic group together with the two carbon atoms to which it is bonded, R.sup.1 is an alkyl group which may be substituted, an aryl group which may be substituted, an alkenyl group which may be substituted, or a cycloalkyl group which may be substituted, Y is a hydrogen atom or a cation, and n is an integer of from 1 to 3.
摘要翻译： 式（I）的偶氮化合物与金属的偶氮金属螯合化合物：其中A是与其键合的碳原子和氮原子一起形成杂环的残基X 是与其键合的两个碳原子一起形成芳族基团的残基，R 1可以被取代的烷基，可被取代的芳基，可被取代的链烯基或环烷基， 可以被取代，Y是氢原子或阳离子，n是1〜3的整数。
-
3.发明授权
公开(公告)号：US4933257A
公开(公告)日：1990-06-12
申请号：US408956
申请日：1989-09-18
申请人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama , Tooru Koyama , Takashi Okabe , Tomoharu Mametani
发明人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama , Tooru Koyama , Takashi Okabe , Tomoharu Mametani
IPC分类号： G03C1/00 , G03F7/004 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226 , G03F7/004
摘要： Disclosed herein is an antistatic photo-resist containing an antistatic agent. Since antistatic photo-resist according to the present invention is hardly charged, it can be suitably used as a mask in implanting ions into semiconductor substrate.
摘要翻译： 本文公开了含有抗静电剂的抗静电光致抗蚀剂。 由于根据本发明的抗静电光刻胶几乎不充电，因此可以适当地用作将离子注入到半导体衬底中的掩模。
-
4.发明授权Negative photosensitive composition and method for forming patterns using the composition 失效负光敏组合物和使用该组合物形成图案的方法
公开(公告)号：US5529885A
公开(公告)日：1996-06-25
申请号：US253776
申请日：1994-06-03
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/38 , Y10S430/128
摘要： Disclosed are a negative photosensitive composition comprising an alkali-soluble resin, a photo acid generating system, and a crosslinking agent for the alkali-soluble resin which acts on the resin under acidic conditions, in which the crosslinking agent is a highly-alkylated alkoxymethylmelamine resin having a monomer content of from 5 to 40% by weight, and a method for forming a negative photo-resist pattern using the composition. The resist composition is stable during storage and gives good pattern profiles having high aspect ratios even though the resist film is made thick.
摘要翻译： 公开了一种负型感光性组合物，其包含在酸性条件下作用于树脂的碱溶性树脂，光酸产生体系和用于碱溶性树脂的交联剂，其中交联剂是高度烷基化的烷氧基甲基蜜胺树脂 单体含量为5〜40重量％，以及使用该组合物形成负光致抗蚀剂图案的方法。 抗蚀剂组合物在保存期间是稳定的，并且即使抗蚀剂膜变厚，也能获得具有高纵横比的良好图案轮廓。
-
5.发明授权Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene 失效含有选自腙，乙基咔唑和双（二甲基氨基）苯的抗静电剂的正型邻 - 醌二叠氮光致抗蚀剂
公开(公告)号：US5168030A
公开(公告)日：1992-12-01
申请号：US742513
申请日：1991-08-05
申请人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama , Tooru Koyama , Takashi Okabe , Tomoharu Mametani
发明人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama , Tooru Koyama , Takashi Okabe , Tomoharu Mametani
CPC分类号： G03F7/0226 , G03F7/004
摘要： Disclosed herein is an antistatic photo-resist containing an antistatic agent. Since antistatic photo-resist according to the present invention is hardly charged, it can be suitably used as a mask in implanting ions into semiconductor substrate.
摘要翻译： 本文公开了含有抗静电剂的抗静电光致抗蚀剂。 由于根据本发明的抗静电光刻胶几乎不充电，因此可以适当地用作将离子注入到半导体衬底中的掩模。
-
公开(公告)号：US6048653A
公开(公告)日：2000-04-11
申请号：US10108
申请日：1998-01-21
CPC分类号： G03F7/033 , G02B5/223 , G03F7/0007 , G03F7/031
摘要： The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.
摘要翻译： 本发明提供一种滤色器用聚合性组合物，其含有在侧链含有脂环式（甲基）丙烯酰基的（甲基）丙烯酸酯共聚物，具有至少一个烯键式不饱和双键的化合物，光聚合引发剂和着色剂， 通过将组合物涂布在玻璃基板上，然后曝光和显影而获得的滤色器; 以及一种生产滤色器的方法，其包括将组合物涂覆在玻璃基板上，然后曝光和显影。 本发明的聚合性组合物的高灵敏度，耐化学性优异。 因此，根据本发明，可以制造高质量的滤色器，而不需要诸如氧气屏蔽膜的保护层。
-
7.发明授权Photopolymerizable composition for a color filter, color filter and liquid display device 失效用于滤色器，滤色器和液体显示装置的可光聚合组合物
公开(公告)号：US5800952A
公开(公告)日：1998-09-01
申请号：US731994
申请日：1996-10-23
申请人： Toshiyuki Urano , Ryuichiro Takasaki , Jiro Kamimura , Shingo Ikeda , Noriko Endo , Yuzuru Chika , Tameichi Ochiai
发明人： Toshiyuki Urano , Ryuichiro Takasaki , Jiro Kamimura , Shingo Ikeda , Noriko Endo , Yuzuru Chika , Tameichi Ochiai
CPC分类号： G03F7/027 , G03F7/0007
摘要： A photopolymerizable composition for a color filter, which comprises a photopolymerization initiator system, a compound having at least one ethylenically unsaturated double bond, a colorant, and a phosphoric (meth)acrylate compound and/or an organic carboxylic anhydride having a molecular weight of at most 800, wherein the content of the colorant is from 20 to 90 wt % based on the total solid content.
摘要翻译： 用于滤色器的可光聚合组合物，其包含光聚合引发剂体系，具有至少一个烯键式不饱和双键的化合物，着色剂和磷酸（甲基）丙烯酸酯化合物和/或分子量为 最大800，其中着色剂的含量基于总固体含量为20至90重量％。
-
8.发明授权
公开(公告)号：US5286600A
公开(公告)日：1994-02-15
申请号：US926693
申请日：1992-08-10
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/128 , Y10S430/146
摘要： A negative photosensitive composition comprising (a-1) a compound having at least two organic groups of the following formula (I):--OCH.sub.2 OR.sup.1 (I)wherein R.sup.1 is an alkyl group, in its molecule and an alkali-soluble resin, or (a-2) an alkali-soluble resin having at least two organic groups of the above formula (I) in its molecule, and (b) a photo-acid-generating material.
摘要翻译： 一种负型光敏组合物，其包含（a-1）具有至少两个下式（I）的有机基团的化合物：其分子中的R 1为烷基和碱溶性树脂的-OCH 2 OR 1（I）或（ a-2）在其分子中具有至少两个上述式（I）的有机基团的碱溶性树脂和（b）光产酸材料。
-
9.发明授权Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde 失效由间甲酚，对甲酚和2,5-二甲苯酚与甲醛的混合物缩合的具有1,2-萘醌二叠氮化物和酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US4719167A
公开(公告)日：1988-01-12
申请号：US825902
申请日：1986-02-04
申请人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama
发明人： Konoe Miura , Tameichi Ochiai , Yasuhiro Kameyama
CPC分类号： G03F7/0236
摘要： Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
摘要翻译： 本文公开了一种正性光致抗蚀剂组合物，其包含（a）1,2-萘醌二叠氮化物感光材料的光敏剂，其包含2,3,4,4'-四羟基二苯甲酮的酯，其中平均不少于两个羟基 2,3,4,4'-四羟基二苯甲酮已经通过1,2-萘醌二叠氮化物-5-磺酸酯化，和（b）通过将间甲酚，对甲酚和2,5-二甲苯酚的混合物缩合获得的酚醛清漆树脂 与甲醛。
-
10.发明授权Positive photosensitive composition of cocondensed .beta.-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide 失效共缩写的β-萘酚和间甲酚与醛与1,2-萘醌-1-二嗪的磺酰三异氰酸酯的正性感光组合物
公开(公告)号：US4650741A
公开(公告)日：1987-03-17
申请号：US788882
申请日：1985-10-18
CPC分类号： G03F7/0236
摘要： Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.
摘要翻译： 本文公开了包含1,2-萘醌二叠氮化合物和包含含有作为缩合组分β-萘酚或α-萘酚和对甲酚的酚醛清漆树脂的粘合剂树脂的正性光敏组合物。
-
-
-
-
-
-
-
-
-
搜索结果
14 条记录 (耗时 0.022 秒)
