公开(公告)号：US20070298265A1

公开(公告)日：2007-12-27

申请号：US11839839

申请日：2007-08-16

申请人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： B32B17/06 ,  B32B15/04

CPC分类号： H05K9/0096 ,  B32B17/10018

摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance. An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.

摘要翻译： 为了提供导电性和可见光透明性优异的导电性层叠体，等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性，宽透射/反射带和高可见光的等离子体显示用保护板 透光率。 包含基板11的导电层压板10和具有三层结构的导电膜12具有第一氧化物层12a，金属层12b和第二氧化物层12c，其从基板11侧依次层叠，或具有 重复上述三层结构的3×n层结构（其中n为至少为2的整数），其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”，金属层12b 是含有银的层，第二氧化物层12c含有氧化锌和氧化铝的混合物等。

公开(公告)号：US07740946B2

公开(公告)日：2010-06-22

申请号：US11839839

申请日：2007-08-16

申请人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Masato Kawasaki ,  Makoto Hiramoto ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： B32B9/00

CPC分类号： H05K9/0096 ,  B32B17/10018

摘要： To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance.An electroconductive laminate 10 comprising a substrate 11, and an electroconductive film 12 having a three-layer structure having a first oxide layer 12a, a metal layer 12b and a second oxide layer 12c laminated sequentially from the substrate 11 side, or having a 3×n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layer 12a contains “zinc oxide” and “titanium oxide or niobium oxide”, the metal layer 12b is a layer containing silver, and the second oxide layer 12c contains a mixture of zinc oxide and aluminum oxide, or the like.

摘要翻译： 为了提供导电性和可见光透明性优异的导电性层叠体，等离子体显示用电磁波屏蔽膜和具有优异的电磁波屏蔽性，宽透射/反射带和高可见光的等离子体显示用保护板 透光率。 包含基板11的导电性层叠体10和具有三层结构的导电性膜12，具有从基板11侧依次层叠的第一氧化物层12a，金属层12b和第二氧化物层12c，或者具有3× 重复上述三层结构的n层结构（其中n为至少为2的整数），其中第一氧化物层12a包含“氧化锌”和“氧化钛或氧化铌”，金属层12b是层 并且第二氧化物层12c含有氧化锌和氧化铝的混合物等。

公开(公告)号：US20070224432A1

公开(公告)日：2007-09-27

申请号：US11755555

申请日：2007-05-30

申请人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： B32B15/04

CPC分类号： H05K9/0096 ,  H01J2211/446

摘要： To provide an electroconductive laminate having a broad transmission/reflection band and having excellent electrical conductivity (electromagnetic wave shielding properties), visible light transparency and near infrared shielding properties, and an electromagnetic wave shielding film for a plasma display and a protective plate for a plasma display. An electroconductive laminate 10 comprising a substrate 11 and an electroconductive film 12 formed on the substrate 11, wherein the electroconductive film 12 has a multilayer structure having an oxide layer 12a and a metal layer 12b alternately laminated from the substrate 11 side in a total layer number of (2n+1) (wherein n is an integer of at least 1), the oxide layer 12a contains zinc oxide and a high refractive index metal oxide having a refractive index of at least 2.3 as the main components, and the metal layer 12b contains silver or a silver alloy as the main component; and a protective plate for a plasma display comprising a support, an electroconductive laminate 10 provided on the support, and an electrode electrically in contact with an electroconductive film of the electroconductive laminate 10.

摘要翻译： 为了提供具有宽的透射/反射带并且具有优异的导电性（电磁波屏蔽性），可见光透明度和近红外屏蔽性能的导电层压板，以及用于等离子体显示器的电磁波屏蔽膜和用于等离子体的保护板 显示。 一种导电性层叠体10，其包含基板11和形成在基板11上的导电膜12，其中，导电膜12具有多层结构，该多层结构具有从基板11侧交替层叠的氧化物层12a和金属层12b （2n + 1）（其中n是至少为1的整数）的层数，氧化物层12a包含氧化锌和折射率为至少2.3的高折射率金属氧化物作为主要成分，并且 金属层12b包含银或银合金作为主要成分; 以及用于等离子体显示器的保护板，其包括支撑体，设置在支撑体上的导电层压体10以及与导电性层叠体10的导电膜电接触的电极。

公开(公告)号：US08040062B2

公开(公告)日：2011-10-18

申请号：US11755555

申请日：2007-05-30

申请人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

发明人： Tamotsu Morimoto ,  Hideaki Miyazawa ,  Masahiro Fusen ,  Koichi Kanda ,  Susumu Nakagama

IPC分类号： H01J17/49 ,  H01J9/00

CPC分类号： H05K9/0096 ,  H01J2211/446

摘要： Provided is an electroconductive laminate having a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having an oxide layer and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of at least 1); the oxide layer predominantly contains zinc oxide and titanium oxide having a refractive index of at least 2.3; the oxide layer has an atomic ratio of titanium to a total amount of titanium and zinc of 15-50 atomic %; and the metal layer predominantly contains silver or a silver alloy. Also provided is a process for producing the electroconductive laminate.

摘要翻译： 提供了一种导电层压体，其具有在基板上形成的基板和导电膜，其中导电膜具有多层结构，其具有从基板侧以总层数（2n + 1）交替层叠的氧化物层和金属层， （其中n为至少1的整数）; 氧化物层主要含有氧化锌和折射率至少为2.3的氧化钛; 氧化物层具有钛与钛和锌的总量为15-50原子％的原子比; 并且金属层主要含有银或银合金。 还提供了用于生产导电层压体的方法。

公开(公告)号：US20080118762A1

公开(公告)日：2008-05-22

申请号：US11970097

申请日：2008-01-07

申请人： Tamotsu Morimoto ,  Masaaki Konishi ,  Masato Kawasaki ,  Takuji Oyama

发明人： Tamotsu Morimoto ,  Masaaki Konishi ,  Masato Kawasaki ,  Takuji Oyama

IPC分类号： B32B15/04 ,  B32B19/00

CPC分类号： H01J11/44 ,  H01J2211/446 ,  H05K9/0096 ,  Y10T428/31678

摘要： To provide an electromagnetic wave shielding film for a PDP having a low luminous reflectance even without providing a protective film, and a protective plate for a PDP having a low luminous reflectance using the electromagnetic wave shielding film for a PDP.An electromagnetic wave shielding film 10, which comprises a substrate 11 and an electroconductive film 12, wherein the electroconductive film 12 has a multilayer structure in which (n+1) (wherein n is an integer of from 3 to 5) inorganic layers 12a having a refractive index of from 1.55 to 2.5 and n metal layers 12b are alternately laminated from the substrate 11 side; each inorganic layer 12a is a layer containing at least one member selected from a metal oxide, a metal nitride and a metal oxynitride; each metal layer 12b is a layer made of pure silver or a silver alloy; and the second to n-th metal layers from the substrate are thicker than the first metal layer from the substrate, is used.

摘要翻译： 为了提供即使不提供保护膜也具有低反射率的PDP的电磁波屏蔽膜，以及使用PDP电磁波屏蔽膜的具有低反射率的PDP的保护板。 一种电磁波屏蔽膜10，其包括基板11和导电膜12，其中导电膜12具有其中（n + 1）（其中n为3至5的整数）的无机层12a的多层结构 折射率为1.55〜2.5，n个金属层12b从基板11侧交替层叠; 每个无机层12a是含有选自金属氧化物，金属氮化物和金属氮氧化物中的至少一种的层; 每个金属层12b是由纯银或银合金制成的层; 并且使用来自基板的第二至第n金属层比来自基板的第一金属层厚。

公开(公告)号：US20080057264A1

公开(公告)日：2008-03-06

申请号：US11845146

申请日：2007-08-27

申请人： Tamotsu Morimoto ,  Masato Kawasaki ,  Masahiro Fusen ,  Tohru Yanagisawa

发明人： Tamotsu Morimoto ,  Masato Kawasaki ,  Masahiro Fusen ,  Tohru Yanagisawa

IPC分类号： B32B7/00

CPC分类号： H05K9/0096 ,  B32B27/02 ,  H01J11/10 ,  H01J11/44 ,  H01J2211/446 ,  H05K9/0088 ,  Y10T428/24

摘要： To provide an electromagnetic wave shielding laminate having a high visible light transmittance and having a low resistance and a high moisture resistance available at a low cost, and a display device using it. An electromagnetic wave shielding laminate 1 comprising a transparent substrate 2 and an electromagnetic wave shielding film 100 formed on the substrate, wherein the electromagnetic wave shielding film 100 has, sequentially from the substrate 2 side, a first high refractive index layer 31 made of a metal oxide having a refractive index of at least 2.0, a first oxide layer 32 containing zinc oxide and titanium oxide as the main components, an electroconductive layer 33 containing silver as the main component and a second high refractive index layer 35 made of a metal oxide having a refractive index of at least 2.0.

摘要翻译： 为了提供具有高可见光透射率并具有低电阻和高耐湿性的电磁波屏蔽层压板，以及使用它的显示装置。 一种电磁波屏蔽层叠体1，其包括透明基板2和形成在基板上的电磁波屏蔽膜100，其中电磁波屏蔽膜100从基板2侧依次具有由金属制成的第一高折射率层31 具有至少2.0的折射率的氧化物，含有氧化锌和氧化钛作为主要成分的第一氧化物层32，以银为主要成分的导电层33和由金属氧化物制成的第二高折射率层35， 折射率至少为2.0。

公开(公告)号：US07771850B2

公开(公告)日：2010-08-10

申请号：US12202953

申请日：2008-09-02

申请人： Tohru Yanagisawa ,  Tamotsu Morimoto

发明人： Tohru Yanagisawa ,  Tamotsu Morimoto

IPC分类号： B32B19/04

CPC分类号： H05K9/0096 ,  H01J2211/446

摘要： An electromagnetic wave shielding laminate comprising a transparent substrate and an electromagnetic wave shielding film formed thereon, characterized in that the electromagnetic wave shielding film has, sequentially from the substrate side, a first high refractive index layer made of a material having a refractive index of at least 2.0, a first oxide layer containing zinc oxide as the main component, an electroconductive layer containing silver as the main component, and a second high refractive index layer made of a material having a refractive index of at least 2.0.

摘要翻译： 一种电磁波屏蔽层叠体，其特征在于，具有透明基板和形成在其上的电磁波屏蔽膜，其特征在于，所述电磁波屏蔽膜从基板侧依次具有由折射率为a的材料构成的第一高折射率层 至少2.0，以氧化锌为主要成分的第一氧化物层，以银为主要成分的导电层和由折射率至少为2.0的材料制成的第二高折射率层。

公开(公告)号：US20100014163A1

公开(公告)日：2010-01-21

申请号：US12493262

申请日：2009-06-29

申请人： Tamotsu Morimoto ,  Michihisa Tomida

发明人： Tamotsu Morimoto ,  Michihisa Tomida

IPC分类号： G02B1/11 ,  B32B7/02

CPC分类号： G02B1/115 ,  G02B1/116 ,  Y10T428/24942

摘要： There are provided an antireflector having a simple layer structure, a high visible light transmittance, a low visible light reflectance and an excellent anti-fingerprint property, and a display device having an excellent viewability.An antireflector 1 including a substrate 10 and an antireflection film 20; the antireflection film 20 having a first high refractive index layer 22, a metal layer 24, a second high refractive index layer 26 and a low refractive index layer 28 disposed therein sequentially from a substrate side facing the substrate 1; the first high refractive index layer containing at least one member selected from the group consisting of tin, gallium and cerium in the form of an oxide, and indium in the form of an oxide; the metal layer containing silver and palladium and having a palladium content of from 3 to 20 mass % relative to the total amount of the metal layer (100 mass %); the second high refractive index layer containing at least one member selected from the group consisting of tin, gallium and cerium in the form of an oxide and indium in the form of an oxide. A display device including the antireflector 1 disposed on an observer' side of a display panel.

摘要翻译： 提供了具有简单的层结构，高可见光透射率，低可见光反射率和优异的抗指纹性的抗反射器，以及具有优异的可视性的显示装置。 包括基板10和抗反射膜20的抗反射器1; 具有从面向衬底1的衬底侧依次设置的第一高折射率层22，金属层24，第二高折射率层26和低折射率层28的抗反射膜20; 所述第一高折射率层含有选自氧化物形式的锡，镓和铈中的至少一种，氧化物形式的铟; 含有银和钯的金属层，相对于金属层的总量为100质量％，钯含量为3〜20质量％。 所述第二高折射率层含有选自氧化物形式的锡，镓和铈和氧化物形式的铟中的至少一种。 一种显示装置，包括设置在显示面板的观察者侧的防反射体1。

公开(公告)号：US06812151B1

公开(公告)日：2004-11-02

申请号：US09233073

申请日：1999-01-19

申请人： Kenichi Nanbu ,  Tamotsu Morimoto

发明人： Kenichi Nanbu ,  Tamotsu Morimoto

IPC分类号： H01L21302

CPC分类号： H01J37/321 ,  H01L21/3065

摘要： An etching method is carried out by an etching system comprising a gas supply port for supplying an etching gas, a plasma producing vessel defining a plasma producing chamber in which the etching gas is converted into a plasma to produce radicals, a reaction vessel connected to the plasma producing vessel and defining a reaction chamber of a diameter greater than that of the plasma producing chamber, a support table placed in the reaction chamber to support an object to be processed to be etched by the radicals flowing down thereto from the plasma producing chamber, and a vacuum exhaust system for evacuating the reaction chamber. The etching gas is supplied through the etching gas supply port at an etching gas supply rate of 8.4 sccm or above per a substantial volume of one liter of the reaction chamber.

摘要翻译： 通过蚀刻系统进行蚀刻方法，该蚀刻系统包括用于供给蚀刻气体的气体供给口，限定等离子体生成室的等离子体生成容器，其中蚀刻气体被转换成等离子体以产生自由基，反应容器连接到 等离子体产生容器并且限定直径大于等离子体产生室直径的反应室;支撑台，放置在反应室中，以支撑待处理对象被从等离子体产生室向下流动的自由基蚀刻， 以及用于抽空反应室的真空排气系统。 通过蚀刻气体供给口以相对于1升反应室的体积为8.4sccm以上的蚀刻气体供给量供给蚀刻气体。

公开(公告)号：US5567152A

公开(公告)日：1996-10-22

申请号：US420075

申请日：1995-04-11

申请人： Tamotsu Morimoto

发明人： Tamotsu Morimoto

IPC分类号： H01L21/22 ,  C23C16/48 ,  C30B25/10 ,  C30B31/12 ,  H01L21/00 ,  H01L21/205 ,  H01L21/31 ,  H01L21/324 ,  F27D3/12

CPC分类号： H01L21/67109 ,  C23C16/481 ,  C30B25/10 ,  C30B31/12

摘要： A heat processing apparatus for subjecting heat processing to a wafer by heating includes a reaction tube for containing the wafers, a heating element provided around the reaction tube, for heating an inside of the reaction tube, a plurality of heat radiating members provided concentrically around the heating element with an airtight space between the heating element and an innermost one of the heat radiating members and airtight spaces between the heat radiating members, and a pressure-reducing device for reducing the pressure of these airtight spaces. In this heat processing apparatus, the pressures of the airtight spaces are reduced by the pressure-reducing means at least when the temperature of the inside of the reaction tube is increased.

摘要翻译： 用于通过加热对晶片进行热处理的热处理装置包括：用于容纳晶片的反应管，设置在反应管周围的加热元件，用于加热反应管的内部;多个散热构件，其围绕 加热元件与加热元件之间的气密空间和散热构件中的最内侧之间以及散热构件之间的气密空间，以及用于降低这些气密空间的压力的减压装置。 在该热处理装置中，至少在反应管内部的温度升高时，通过减压装置降低气密空间的压力。