公开(公告)号：US20050245717A1

公开(公告)日：2005-11-03

申请号：US11178544

申请日：2005-07-11

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel Hacker ,  Richard Spear

IPC分类号： G03F7/004 ,  C03C17/00 ,  C03C17/30 ,  C07F7/18 ,  C08K5/00 ,  C09D7/12 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03C1/492 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

公开(公告)号：US06365765B1

公开(公告)日：2002-04-02

申请号：US09698883

申请日：2000-10-27

申请人： Teresa Baldwin ,  Nigel Hacker ,  Joseph Kennedy ,  Richard Spear

发明人： Teresa Baldwin ,  Nigel Hacker ,  Joseph Kennedy ,  Richard Spear

IPC分类号： C07F718

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.

摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在诸如248nm和193nm的波长周围的波长范围上是强吸收的，可以用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。

公开(公告)号：US06969753B2

公开(公告)日：2005-11-29

申请号：US10300357

申请日：2002-11-19

申请人： Teresa Baldwin ,  Joseph Kennedy ,  Nigel Hacker ,  Richard Spear

发明人： Teresa Baldwin ,  Joseph Kennedy ,  Nigel Hacker ,  Richard Spear

IPC分类号： G03F7/004 ,  C03C17/00 ,  C03C17/30 ,  C07F7/18 ,  C08K5/00 ,  C09D7/12 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03C1/492 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  C08G77/12

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。

公开(公告)号：US06824879B2

公开(公告)日：2004-11-30

申请号：US10001143

申请日：2001-11-15

申请人： Teresa Baldwin ,  Joseph Kennedy ,  Nigel Hacker ,  Richard Spear

发明人： Teresa Baldwin ,  Joseph Kennedy ,  Nigel Hacker ,  Richard Spear

IPC分类号： C08G7718

CPC分类号： G02B5/23 ,  C03C17/008 ,  C03C17/30 ,  C08G77/04 ,  C08G77/12 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/091 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

摘要翻译： 用于紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的至少一种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm，193nm和157nm的波长周围的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。

公开(公告)号：US07678462B2

公开(公告)日：2010-03-16

申请号：US11178544

申请日：2005-07-11

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

IPC分类号： B32B9/04

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。

公开(公告)号：US06956097B2

公开(公告)日：2005-10-18

申请号：US10076846

申请日：2002-02-14

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

IPC分类号： G03F7/004 ,  C03C17/00 ,  C03C17/30 ,  C07F7/18 ,  C08K5/00 ,  C09D7/12 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03C1/492 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  C08G77/12

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/0752 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

公开(公告)号：US07012125B2

公开(公告)日：2006-03-14

申请号：US10012649

申请日：2001-11-05

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

IPC分类号： C08G77/18

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.

公开(公告)号：US06506497B1

公开(公告)日：2003-01-14

申请号：US09491166

申请日：2000-01-26

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

IPC分类号： B32B904

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

公开(公告)号：US06268457B1

公开(公告)日：2001-07-31

申请号：US09330248

申请日：1999-06-10

申请人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

发明人： Joseph Kennedy ,  Teresa Baldwin ,  Nigel P. Hacker ,  Richard Spear

IPC分类号： C08G7702

CPC分类号： G03F7/091 ,  C03C17/008 ,  C03C17/30 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths less than 260 nm such as 248 nm and 193 nm, that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.

摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在波长小于260nm的波长范围内是强烈吸收的，例如248nm和193nm，可用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。

公开(公告)号：US20050058929A1

公开(公告)日：2005-03-17

申请号：US10495688

申请日：2004-11-17

申请人： Joseph Kennedy ,  Teresa Baldwin-Hendricks

发明人： Joseph Kennedy ,  Teresa Baldwin-Hendricks

IPC分类号： G03F7/11 ,  C08G77/00 ,  C08G77/04 ,  C09D1/00 ,  C09D5/32 ,  C09D7/12 ,  C09D183/04 ,  C09K3/00 ,  G03C1/492 ,  G03F7/09 ,  H01L21/027 ,  B32B9/04

CPC分类号： G03F7/091 ,  C08G77/04 ,  C09D5/006 ,  C09D183/04 ,  Y10T428/31663

摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.