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22 条记录 (耗时 0.022 秒)

    Novolac polymer planarization films with high temperature stability
    7.
    发明授权
    Novolac polymer planarization films with high temperature stability 失效
    酚醛清漆聚合物平面化膜具有高温稳定性

    公开(公告)号：US06723780B2

    公开(公告)日：2004-04-20

    申请号：US10299127

    申请日：2002-11-18

    申请人： Nigel Hacker ,  Todd Krajewski ,  Richard Spear

    发明人： Nigel Hacker ,  Todd Krajewski ,  Richard Spear

    IPC分类号： B32B2742

    CPC分类号： G03F7/094 ,  G03F7/0236 ,  Y10S428/901 ,  Y10T428/31688 ,  Y10T428/31942

    摘要： A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.

    摘要翻译： 在加热时不吸烟或烟雾的基板上形成平坦化膜的方法包括施加包含重量平均分子量在约1000和3000amu之间的聚合溶液，其已被分级分离以除去分子量分子 低于约350amu，将选自非氟化烃，氟化烃及其组合的表面活性剂和任选的有机溶剂加入到基材中，然后加热基材。

    Nanoporous materials and methods of formation thereof
    8.
    发明申请
    Nanoporous materials and methods of formation thereof 审中-公开
    纳米材料及其形成方法

    公开(公告)号：US20070100109A1

    公开(公告)日：2007-05-03

    申请号：US10520252

    申请日：2002-08-15

    申请人： Nigel Hacker ,  Scott Leffert ,  Lisa Figge ,  Richard Spear ,  William Bedwell ,  Teresa Ramos

    发明人： Nigel Hacker ,  Scott Leffert ,  Lisa Figge ,  Richard Spear ,  William Bedwell ,  Teresa Ramos

    IPC分类号： C08G77/12

    CPC分类号： H01L21/02126 ,  C08G77/12 ,  C08G77/20 ,  H01B3/46 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695

    摘要： Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores. It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomers and wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.

    摘要翻译： 本文描述的低电介质材料除了超极子纳米孔之外还包含多个孔或纳米孔。 进一步预期，本文所述的低电介质材料将具有小于约3的介电常数。介电材料来自聚合物组合物，其中聚合物组合物包含多个单体，并且其中至少一个单体包含自由基前体 结合到结构前体。 此外，提出了从聚合物组合物形成电介质材料的方法。 该图显示了甲基/叔丁基低有机含量/低有机硅氧烷聚合物的化学结构。

    Colloidal silica composite films for premetal dielectric applications
    10.
    发明授权
    Colloidal silica composite films for premetal dielectric applications 失效
    用于金属前介电应用的胶体二氧化硅复合膜

    公开(公告)号：US06967172B2

    公开(公告)日：2005-11-22

    申请号：US10680026

    申请日：2003-10-07

    申请人： Roger Leung ,  Denis Endisch ,  Songyuan Xie ,  Nigel Hacker ,  Yanpei Deng

    发明人： Roger Leung ,  Denis Endisch ,  Songyuan Xie ,  Nigel Hacker ,  Yanpei Deng

    IPC分类号： H01L21/316 ,  H01L21/302

    CPC分类号： H01L21/02282 ,  H01L21/02203 ,  H01L21/316 ,  H01L21/76837

    摘要： A colloidal suspension of nanoparticles composed of a dense material dispersed in a solvent is used in forming a gap-filling dielectric material with low thermal shrinkage. The dielectric material is particularly useful for pre-metal dielectric and shallow trench isolation applications. According to the methods of forming a dielectric material, the colloidal suspension is deposited on a substrate and dried to form a porous intermediate layer. The intermediate layer is modified by infiltration with a liquid phase matrix material, such as a spin-on polymer, followed by curing, by infiltration with a gas phase matrix material, followed by curing, or by curing alone, to provide a gap-filling, thermally stable, etch resistant dielectric material.

    摘要翻译： 使用由分散在溶剂中的致密材料构成的纳米颗粒的胶体悬浮液来形成具有低热收缩率的间隙填充介电材料。 电介质材料特别适用于预金属电介质和浅沟槽隔离应用。 根据形成电介质材料的方法，将胶体悬浮液沉积在基底上并干燥以形成多孔中间层。 通过用液相基质材料（例如旋涂聚合物）渗透，然后通过用气相基质材料渗透，随后固化，或通过单独固化来改性中间层，从而提供间隙填充 ，耐热稳定的，耐蚀刻的介电材料。