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公开(公告)号:US06365765B1
公开(公告)日:2002-04-02
申请号:US09698883
申请日:2000-10-27
申请人: Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
发明人: Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
IPC分类号: C07F718
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在诸如248nm和193nm的波长周围的波长范围上是强吸收的,可以用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。
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公开(公告)号:US20050245717A1
公开(公告)日:2005-11-03
申请号:US11178544
申请日:2005-07-11
申请人: Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
IPC分类号: G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号:US06969753B2
公开(公告)日:2005-11-29
申请号:US10300357
申请日:2002-11-19
申请人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号: G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm,248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号:US06824879B2
公开(公告)日:2004-11-30
申请号:US10001143
申请日:2001-11-15
申请人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人: Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号: C08G7718
CPC分类号: G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的至少一种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm,248nm,193nm和157nm的波长周围的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号:US07012125B2
公开(公告)日:2006-03-14
申请号:US10012649
申请日:2001-11-05
申请人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号: C08G77/18
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号:US06956097B2
公开(公告)日:2005-10-18
申请号:US10076846
申请日:2002-02-14
申请人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号: G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号:US07678462B2
公开(公告)日:2010-03-16
申请号:US11178544
申请日:2005-07-11
申请人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号: B32B9/04
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm,248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号:US06506497B1
公开(公告)日:2003-01-14
申请号:US09491166
申请日:2000-01-26
申请人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号: B32B904
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号:US06268457B1
公开(公告)日:2001-07-31
申请号:US09330248
申请日:1999-06-10
申请人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人: Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号: C08G7702
CPC分类号: G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths less than 260 nm such as 248 nm and 193 nm, that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
摘要翻译: 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在波长小于260nm的波长范围内是强烈吸收的,例如248nm和193nm,可用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。
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公开(公告)号:US06517951B2
公开(公告)日:2003-02-11
申请号:US09735746
申请日:2000-12-12
申请人: Nigel Hacker , Todd Krajewski , Richard Spear
发明人: Nigel Hacker , Todd Krajewski , Richard Spear
IPC分类号: B32B2742
CPC分类号: G03F7/094 , G03F7/0236 , Y10S428/901 , Y10T428/31688 , Y10T428/31942
摘要: A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
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