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19 条记录 (耗时 0.02 秒)

    Method for supply of constant-concentration ozonated water
    1.
    发明申请
    Method for supply of constant-concentration ozonated water 有权
    供应恒浓度臭氧水的方法

    公开(公告)号：US20050115909A1

    公开(公告)日：2005-06-02

    申请号：US10975510

    申请日：2004-10-28

    申请人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Youichi Shimoi

    发明人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Youichi Shimoi

    IPC分类号： B08B7/00 ,  C01B13/10 ,  C02F1/00 ,  C02F1/78 ,  G05D7/00 ,  G05D11/08 ,  H01L21/304

    CPC分类号： C01B13/10 ,  C02F1/008 ,  C02F1/78 ,  C02F2209/23

    摘要： An apparatus is provided which allows the ozonated water concentration to be retained and avoids being affected by the fluctuation of the amount of the ozonated water to be used. A method for the supply of a constant-concentration ozonated water, employs a unit for producing ozonated water and a system for using the ozonated water at a place separated therefrom, and interposing an ozonated water circulating line between the ozonated water producing unit and the place for using the ozonated water, causing the interior of the circulating line to circulate the ozonated water so that the flow rate may be constantly fixed at the outlet of the ozonated water producing unit, monitoring the ozone concentration of the ozonated water in the neighborhood of the outlet, adjusting the amount of an ozone gas supplied to the ozonated water producing unit and/or the concentration of the ozone gas based on the results of the monitoring, further monitoring the amount of the ozonated water used at the place for using the ozonated water, and controlling the amount of the ozonated water to be produced based on the results of this monitoring. The ozonated water can be used without being discarded even where the use of the ozonated water at the place of use is suspended temporarily. The constant-concentration ozonated water can be produced and supplied and the ozone can be utilized effectively.

    摘要翻译： 提供了允许臭氧水浓度保持并避免受到要使用的臭氧水量的波动的影响的装置。 一种用于提供恒浓度臭氧水的方法，采用生产臭氧水的单元和在与其分离的地方使用臭氧水的系统，并且在臭氧水生产单元和位置之间插入臭氧水循环管线 为了使用臭氧水，使循环管线的内部循环臭氧水，使得流量可以恒定地固定在臭氧水生产单元的出口处，监测臭氧水附近的臭氧水的臭氧浓度 出口，根据监测结果调整供应给臭氧水生产单元的臭氧气体的量和/或臭氧浓度，进一步监测在使用臭氧水的地方使用的臭氧水的量 ，并根据该监测结果控制待生产的臭氧水量。 臭氧水可以使用而不被丢弃，即使在使用地点使用臭氧水临时暂停使用。 可以生产和供应恒定浓度的臭氧水，可以有效利用臭氧。

    Method for supply of constant-concentration ozonated water
    2.
    发明授权
    Method for supply of constant-concentration ozonated water 有权
    供应恒浓度臭氧水的方法

    公开(公告)号：US07276168B2

    公开(公告)日：2007-10-02

    申请号：US10975510

    申请日：2004-10-28

    申请人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Youichi Shimoi

    发明人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Youichi Shimoi

    IPC分类号： C02F1/78

    CPC分类号： C01B13/10 ,  C02F1/008 ,  C02F1/78 ,  C02F2209/23

    摘要： A method for the supply of a constant-concentration ozonated water, employs a unit for producing ozonated water and a system for using the ozonated water at a place separated therefrom, interposing an ozonated water circulating line between the ozonated water producing unit and the place for using the ozonated water, causing the interior of the circulating line to circulate the ozonated water so that the flow rate may be constantly fixed at the outlet of the ozonated water producing unit, monitoring the ozone concentration of the ozonated water in the neighborhood of the outlet, adjusting the amount of an ozone gas supplied to the ozonated water producing unit based on the results of the monitoring, further monitoring the amount of the ozonated water used at the place for using the ozonated water, and controlling the amount of the ozonated water to be produced based on the results of this monitoring.

    摘要翻译： 供给恒定浓度的臭氧化水的方法，采用臭氧化水的制造单元和在与之分离的地方使用臭氧化水的系统，在臭氧化水生产单元和位置之间插入臭氧水循环管线 使用臭氧水，使循环管线的内部循环臭氧水，使得流量可以恒定地固定在臭氧水生产单元的出口处，监测出口附近臭氧水的臭氧浓度 根据监测结果调整向臭氧水生产单元供给的臭氧气体的量，进一步监测使用臭氧水的地方使用的臭氧化水的量，并将臭氧水的量控制在 根据监测结果生产。

    Method for forwarding ozonated water
    3.
    发明申请
    Method for forwarding ozonated water 审中-公开
    转发臭氧水的方法

    公开(公告)号：US20050109711A1

    公开(公告)日：2005-05-26

    申请号：US10975617

    申请日：2004-10-28

    申请人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Toshio Tayadate

    发明人： Teruo Haibara ,  Kenichi Uemura ,  Takio Adachi ,  Toshio Tayadate

    IPC分类号： B08B3/08 ,  A61L2/18 ,  C01B13/10 ,  C02F1/00 ,  C02F1/467 ,  C02F1/78 ,  G05D11/00

    CPC分类号： C01B13/10 ,  A61L2/183 ,  A61L2202/15 ,  C02F1/78 ,  C02F2103/04

    摘要： A method is provided forwarding ozonated water efficiently with the loss of ozone lowered. The method for forwarding ozonated water is from an ozonated water producing device to a use point separated from the device. This enables the use point to be supplied with ozonated water having a concentration adjusted as aimed at, by adding a diluting water to a raw material ozonated water in the neighborhood of the ozonated water producing device under a condition inhibiting exposure to an ambient air, adjusting the amount of the diluting water to be added thereby giving the ozonated water a target concentration at the use point, and subsequently guiding the ozonated water through a pipe to the use point.

    摘要翻译： 提供了一种有效地转移臭氧水的方法，降低了臭氧的损失。 用于转移臭氧水的方法是从臭氧水生产装置到与装置分离的使用点。 这使得使用点能够提供浓度调节的臭氧水，其目的是通过在禁止暴露于环境空气的条件下向臭氧水生成装置附近的原料臭氧水添加稀释水，调节 添加的稀释水的量，从而使臭氧水在使用时为目标浓度，随后将臭氧水通过管道引导至使用点。

    Cleaning method of semiconductor wafer
    6.
    发明申请
    Cleaning method of semiconductor wafer 审中-公开
    半导体晶圆的清洗方法

    公开(公告)号：US20100139711A1

    公开(公告)日：2010-06-10

    申请号：US12592706

    申请日：2009-12-01

    申请人： Teruo Haibara

    发明人： Teruo Haibara

    IPC分类号： B08B3/00

    CPC分类号： H01L21/0209 ,  B08B3/003 ,  B08B3/102 ,  B08B3/12 ,  H01L21/02052

    摘要： A wax removal method uniformly removes wax adhering to a wafer surface and reduces the problems of re-adhesion of particles and filter clogging of a cleaning bath during cleaning. The method uses cleaning liquid which contains microbubbles.

    摘要翻译： 蜡去除方法均匀地除去附着在晶片表面上的蜡，并且减少了清洁期间颗粒的再附着和过滤堵塞清洁浴的问题。 该方法使用含有微泡的清洗液。

    CLEANING METHOD
    8.
    发明申请
    CLEANING METHOD 审中-公开
    清洁方法

    公开(公告)号：US20130192627A1

    公开(公告)日：2013-08-01

    申请号：US13616746

    申请日：2012-09-14

    申请人： Etsuko Kubo ,  Teruo Haibara ,  Yoshihiro Mori ,  Masashi Uchibe

    发明人： Etsuko Kubo ,  Teruo Haibara ,  Yoshihiro Mori ,  Masashi Uchibe

    IPC分类号： B08B3/12

    CPC分类号： B08B3/12

    摘要： A cleaning method for cleaning an object includes preparing a cleaning liquid. A dissolved nitrogen concentration in the cleaning liquid is adjusted based on a size of a foreign substance to be removed from the object with a highest removal efficiency. The object is dipped in the cleaning liquid while irradiating the cleaning liquid with ultrasonic waves.

    摘要翻译： 用于清洁物体的清洁方法包括制备清洁液体。 基于要从物体除去的异物的尺寸以最高的去除效率调节清洗液中的溶解氮浓度。 在用超声波照射清洗液的同时将物体浸入清洗液中。

    Micro Bubble Generating Device and Silicon Wafer Cleaning Apparatus
    9.
    发明申请
    Micro Bubble Generating Device and Silicon Wafer Cleaning Apparatus 有权
    微泡发生装置和硅晶片清洗装置

    公开(公告)号：US20100163084A1

    公开(公告)日：2010-07-01

    申请号：US12633914

    申请日：2009-12-09

    申请人： Teruo Haibara

    发明人： Teruo Haibara

    IPC分类号： B08B3/12

    CPC分类号： H01L21/67051 ,  H01L21/67057

    摘要： A micro-bubble generating device is provided with a micro-bubble generating mechanism and a leading conduit provided with a widening section and a tube part, the widening section and the tube part in communication with each other in the leading conduit. The widening section has a hollow shape which has an axis Z as a central axis, and has base surfaces and a peripheral surface, and communicates with a nozzle of the micro-bubble-generating mechanism via one base surface of the widening section, and communicates with the tube part via the other base surface. The cross section orthogonal to a flow axis Z of the micro-bubbles of the widening section is larger than the cross section orthogonal to the flow axis Z of the tube part.

    摘要翻译： 微气泡产生装置设置有微气泡产生机构和引导导管，该导管设置有在引导导管中相互连通的加宽部分和管部分，加宽部分和管部分。 该加宽部具有轴线Z为中心轴的中空形状，具有基面和周面，通过加宽部的一个基面与微气泡发生机构的喷嘴连通， 与管部分经由另一个基面。 与加宽部的微小气泡的流动轴线Z正交的截面大于与管部的流动轴线Z正交的截面。

    Cleaning apparatus, measurement method and calibration method
    10.
    发明授权
    Cleaning apparatus, measurement method and calibration method 有权
    清洁装置，测量方法和校准方法

    公开(公告)号：US08575571B2

    公开(公告)日：2013-11-05

    申请号：US13618624

    申请日：2012-09-14

    申请人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    发明人： Teruo Haibara ,  Yoshihiro Mori ,  Etsuko Kubo ,  Masashi Uchibe

    IPC分类号： G01J1/58

    CPC分类号： G01N21/274 ,  G01N21/70 ,  G01N21/71 ,  G01N29/2418 ,  G01N2021/8416

    摘要： A calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid includes varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak. The liquid is illuminated with ultrasonic waves while varying the concentration of the gas in the liquid and a measured value is measured, using the measurement device, as a concentration of the gas in the liquid when the intensity of the luminescence shows a peak. The measurement device is calibrated based on the measured value and the reference concentration.

    摘要翻译： 用于校准用于测量溶解在液体中的气体的浓度的测量装置的校准方法包括改变溶解在液体中的气体的浓度，并且预先确定作为参考浓度的发光强度的气体的浓度 当用超声波照射液体时产生峰值。 在改变液体中的气体浓度的同时，用超声波照射液体，并且当发光强度显示峰值时，使用测量装置测量液体中气体的浓度的测量值。 测量装置根据测量值和参考浓度进行校准。