公开(公告)号：US4325222A

公开(公告)日：1982-04-20

申请号：US103580

申请日：1979-12-14

申请人： Teruo Nakamura ,  Masami Otani

发明人： Teruo Nakamura ,  Masami Otani

IPC分类号： F04B49/00 ,  F04B49/10 ,  H02H5/04 ,  F25B27/00 ,  G05B5/00

CPC分类号： H02H5/047 ,  F04B49/10

摘要： A device responsive to an unusual temperature change in a refrigerant compressor using an electromagnetic clutch including a magnet coil as an actuating element of the clutch, comprising an overcurrent-responsive element such as a fuse connected in parallel with the magnet coil, a temperature-responsive switch operative to be open when the temperature in the compressor rises beyond a predetermined value, and a switching element such as a transistor which is non-conductive when the temperature-responsive switch is closed and which is made conductive to cause the fuse to melt when the temperature-responsive switch is made to open.

摘要翻译： 一种响应于使用包括作为离合器的致动元件的电磁线圈的电磁离合器的制冷剂压缩机中的异常温度变化的装置，包括过电流响应元件，例如与磁体线圈并联连接的熔丝，温度响应 当压缩机中的温度上升超过预定值时，开关操作成打开;以及诸如晶体管的开关元件，当温度响应开关闭合时导通，导通以使熔丝熔化， 使温度响应开关打开。

公开(公告)号：US20100151690A1

公开(公告)日：2010-06-17

申请号：US12334156

申请日：2008-12-12

申请人： Eric B. Britcher ,  Yevgeniy Rabinovich ,  Svetlana Sherman ,  Masami Otani

发明人： Eric B. Britcher ,  Yevgeniy Rabinovich ,  Svetlana Sherman ,  Masami Otani

IPC分类号： H01L21/30 ,  C23F1/00 ,  B05B15/02 ,  B05C5/00

CPC分类号： H01L21/6719 ,  G03F7/162 ,  H01L21/67051 ,  H01L21/68771 ,  Y10T29/41

摘要： An apparatus for dispensing fluid during semiconductor substrate processing operations comprises an enclosure having a first side and a second side. The enclosure comprises a first processing station and a second processing station. The second processing station is positioned adjacent to the first processing station. In addition, the substrate processing apparatus includes a first dispense arm configured to deliver a fluid to the first processing station wherein the first dispense arm is positioned between the first side and the first processing station and a second dispense arm configured to deliver the fluid to the second processing station wherein the second dispense arm is positioned between the second side and the second processing station. The substrate processing apparatus also comprises a first rinse arm configured to deliver a rinsing fluid to the first processing station and a second rinse arm configured to deliver the rinsing fluid to the second processing station.

摘要翻译： 在半导体衬底处理操作期间用于分配流体的设备包括具有第一侧和第二侧的外壳。 外壳包括第一处理站和第二处理站。 第二处理站位于第一处理站附近。 此外，基板处理装置包括：第一分配臂，被配置为将流体输送到第一处理站，其中第一分配臂位于第一侧和第一处理站之间，第二分配臂被配置为将流体输送到 第二处理站，其中第二分配臂位于第二侧和第二处理站之间。 衬底处理设备还包括构造成将冲洗流体输送到第一处理站的第一冲洗臂和被构造成将冲洗流体输送到第二处理站的第二冲洗臂。

公开(公告)号：US07231273B2

公开(公告)日：2007-06-12

申请号：US11005578

申请日：2004-12-06

申请人： Joichi Nishimura ,  Masami Otani

发明人： Joichi Nishimura ,  Masami Otani

IPC分类号： G06F19/00 ,  H01L21/00 ,  H01L21/68

CPC分类号： H01L21/67748 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68707 ,  Y10S414/135

摘要： A camera is fixed to a camera fixture extending forward and upward from a rear end of an arm mechanism. The camera picks up the direction of extension of the arm mechanism when the substrate is carried in and out. If a normal still image in a hot plate unit previously recorded and a still image picked up by the camera coincide with each other, a substrate transport robot TR carries in and out the substrate.

摘要翻译： 相机固定到从臂机构的后端向前和向上延伸的照相机固定装置。 当基板进出时，相机拾取臂机构的延伸方向。 如果先前记录的热板单元中的正常静止图像和由照相机拾取的静止图像彼此重合，则基板传送机器人TR进入和移出基板。

公开(公告)号：US20050123386A1

公开(公告)日：2005-06-09

申请号：US11005578

申请日：2004-12-06

申请人： Joichi Nishimura ,  Masami Otani

发明人： Joichi Nishimura ,  Masami Otani

IPC分类号： H01L21/677 ,  B65G49/07 ,  H01L21/00 ,  H01L21/68 ,  H01L21/687

CPC分类号： H01L21/67748 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68707 ,  Y10S414/135

摘要： A camera is fixed to a camera fixture extending forward and upward from a rear end of an arm mechanism. The camera picks up the direction of extension of the arm mechanism when the substrate is carried in and out. If a normal still image in a hot plate unit previously recorded and a still image picked up by the camera coincide with each other, a substrate transport robot TR carries in and out the substrate.

摘要翻译： 相机固定到从臂机构的后端向前和向上延伸的照相机固定装置。 当基板进出时，相机拾取臂机构的延伸方向。 如果先前记录的热板单元中的正常静止图像和由照相机拾取的静止图像彼此重合，则基板传送机器人TR进入和移出基板。

公开(公告)号：US4846623A

公开(公告)日：1989-07-11

申请号：US106584

申请日：1987-10-08

申请人： Masami Otani ,  Masami Nishida ,  Masahiro Himoto ,  Akio Tsuchiya

发明人： Masami Otani ,  Masami Nishida ,  Masahiro Himoto ,  Akio Tsuchiya

IPC分类号： B23Q7/00 ,  B23Q7/16 ,  B24B9/06 ,  B24B41/00 ,  B28D5/00 ,  E05B47/00 ,  H01L21/677

CPC分类号： H01L21/67778 ,  B23Q7/005 ,  B23Q7/16 ,  B24B41/005 ,  B24B9/065 ,  B28D5/0082 ,  E05B2047/0073 ,  Y10S414/135

摘要： A wafer transferring device for transferring a wafer to be treated from a wafer supply station of a wafer treating apparatus to a wafer holding member, where the wafer is treated, and from the holding member to a wafer discharge station. The device includes a transfer unit for separately supporting untreated and treated wafers at different heights relative to one another. A carrier unit moves horizontally and reciprocates between the supply and discharge stations and toward and away from the holding member integrally with the transfer unit and is adapted to move up and down the transfer unit.

摘要翻译： 一种晶片转印装置，用于将待处理的晶片从晶片处理装置的晶片供给站传送到晶片保持部件，其中晶片被处理，并从保持部件传送到晶片放电台。 该装置包括用于分别支撑相对于彼此的不同高度的未处理和处理的晶片的转印单元。 承载单元水平地移动，在供给站和排放站之间往复运动，并且与保持构件一体地移动和移开，并适于在传送单元上上下移动。

公开(公告)号：US4362376A

公开(公告)日：1982-12-07

申请号：US262398

申请日：1981-05-11

申请人： Masami Otani

发明人： Masami Otani

IPC分类号： G03D3/13 ,  G03D3/08

CPC分类号： G03D3/132

摘要： Two transfer routes for exposed films are provided in a film processor, in one of the two ordinary films which require treatments of developing, stopping, fixing and washing with being transferred, and in the other route wash-off films which require only a treatment of the washing with being transferred. The ordinary films are transferred through the former route with being treated several processes, and the other hand, the wash-off films are directly transferred into a washing tray through the latter route, skipping over treatments of developing, stopping and fixing.The by-pass mechanism for wash-off films can be swinged around a shaft, by which the maintenance for the film processor becomes easier. Processing for different kinds of films can be performed, depending on the kind of films to be processed, with a film processor.

摘要翻译： 两片曝光胶片的转印路径设置在两片普通薄膜之一的薄膜处理器中，需要处理显影，停止，定影和洗涤进行转印的处理，而在其它路线中，只需要处理 洗涤被转移。 普通薄膜通过前述方法转移，经过几个处理，另一方面，洗去的薄膜通过后面的路线直接转移到洗涤托盘中，跳过显影，停止和固定的处理。 冲洗薄膜的旁路机构可以围绕轴摆动，由此使胶片处理器的维护变得更容易。 根据待处理的膜的种类，可以利用胶片处理器对不同种类的胶片进行处理。