Light augmented treatment method
    5.
    发明授权

    公开(公告)号:US11771765B2

    公开(公告)日:2023-10-03

    申请号:US16913191

    申请日:2020-06-26

    摘要: The present invention is directed to a method of treating skin and scalp comprising applying on the scalp or skin a composition comprising a scalp care active selected from the group consisting of 2-Pyridinol-N-oxide, a pyrithione or a polyvalent metal salt of pyrithione, one or more iron chelator having an A log P value of greater than or equal to 0.4 and mixtures therein; exposing the scalp and skin to electromagnetic radiation having wavelength from about 350 nm to about 500 nm and power from about about 0.1 mWatts/cm2 to about 1000 mWatts/cm2 and for a time period from about 2 seconds to about 5 minutes; wherein the antimicrobial treatment results in reduction of fungal growth as measured by the Fungal Growth Sensitivity Test of at least 50% compared to the dark sample.