公开(公告)号：US20120307216A1

公开(公告)日：2012-12-06

申请号：US13488111

申请日：2012-06-04

申请人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Johan Gertrudis Cornelis KUNNEN ,  Sander Catharina Reinier DERKS

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Johan Gertrudis Cornelis KUNNEN ,  Sander Catharina Reinier DERKS

IPC分类号： G03B27/52 ,  G01N25/18

CPC分类号： G03F7/70875 ,  G01K13/00 ,  G03F7/707

摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。

公开(公告)号：US20120013865A1

公开(公告)日：2012-01-19

申请号：US13183220

申请日：2011-07-14

申请人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendricus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendricus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC分类号： G03B27/52

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。

公开(公告)号：US20110222032A1

公开(公告)日：2011-09-15

申请号：US13046211

申请日：2011-03-11

申请人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

发明人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/7085

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

摘要翻译： 公开了一种光刻设备，其包括被配置为在基板支撑区域上支撑基板的基板台和与基板支撑区域相邻的表面上的加热器和/或温度传感器。

公开(公告)号：US20190041761A1

公开(公告)日：2019-02-07

申请号：US16155091

申请日：2018-10-09

申请人： Günes NAKIBOGLU ,  Jan Steven Christiaan WESTERLAKEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Maria del Carmen MERCADO CARMONA ,  Thibault Simon Mathieu LAURENT

发明人： Günes NAKIBOGLU ,  Jan Steven Christiaan WESTERLAKEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Maria del Carmen MERCADO CARMONA ,  Thibault Simon Mathieu LAURENT

IPC分类号： G03F7/20 ,  G03F9/00

摘要： A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.