公开(公告)号：US20120307216A1

公开(公告)日：2012-12-06

申请号：US13488111

申请日：2012-06-04

申请人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Johan Gertrudis Cornelis KUNNEN ,  Sander Catharina Reinier DERKS

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Johan Gertrudis Cornelis KUNNEN ,  Sander Catharina Reinier DERKS

IPC分类号： G03B27/52 ,  G01N25/18

CPC分类号： G03F7/70875 ,  G01K13/00 ,  G03F7/707

摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。

公开(公告)号：US20130094005A1

公开(公告)日：2013-04-18

申请号：US13586689

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis KUNNEN ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis KUNNEN ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Hendrikus Johannes Marinus Van Abeelen ,  Armand Rosa Jozef Dassen ,  Sander Catharina Reinier Derks

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20130038854A1

公开(公告)日：2013-02-14

申请号：US13569926

申请日：2012-08-08

申请人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/60

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.

摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.

公开(公告)号：US20110222032A1

公开(公告)日：2011-09-15

申请号：US13046211

申请日：2011-03-11

申请人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

发明人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/7085

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

摘要翻译： 公开了一种光刻设备，其包括被配置为在基板支撑区域上支撑基板的基板台和与基板支撑区域相邻的表面上的加热器和/或温度传感器。