公开(公告)号：US20080073583A1

公开(公告)日：2008-03-27

申请号：US11675689

申请日：2007-02-16

申请人： Thomas JASINSKI ,  Helmut BANZHOF ,  Jurgen FROSIEN

发明人： Thomas JASINSKI ,  Helmut BANZHOF ,  Jurgen FROSIEN

IPC分类号： H01J37/08

CPC分类号： H01J37/304 ,  H01J2237/1532 ,  H01J2237/31755

摘要： An ion beam apparatus is provided, the ion beam apparatus comprising a movable ion source, a condenser lens, an aperture, and a scanning unit disposed between the condenser lens and the aperture, said scanning unit being adapted to scan an ion beam across the aperture. Furthermore, a method for aligning components of an ion beam apparatus is provided, comprising the steps of: producing an ion beam by means of an ion source, producing a first image of a beam cross section of the ion beam at a first voltage of a condenser lens, producing a second image of the beam cross section of the ion beam at a second voltage of the condenser lens, and positioning the ion source so that the centers of the first and second images coincide.

摘要翻译： 提供离子束装置，离子束装置包括可移动离子源，聚光透镜，孔径和设置在聚光透镜和孔之间的扫描单元，所述扫描单元适于扫过离子束穿过孔 。 此外，提供了一种用于对准离子束装置的部件的方法，包括以下步骤：通过离子源产生离子束，产生离子束的束截面的第一图像，其中第一电压为 聚光透镜，在聚光透镜的第二电压下产生离子束的束横截面的第二图像，并且定位离子源使得第一和第二图像的中心重合。

公开(公告)号：US20110253893A1

公开(公告)日：2011-10-20

申请号：US13089059

申请日：2011-04-18

申请人： Helmut BANZHOF

发明人： Helmut BANZHOF

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2809 ,  H01J2237/2814

摘要： A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.

摘要翻译： 提供带电粒子束装置，包括：带电粒子束源，适于在轴上产生带电粒子束; 光学像差校正装置和物镜装置，其限定校正后的光束孔径角度，以减小衍射; 和带电粒子束倾斜装置; 其中所述光学像差校正装置和所述物镜装置适于为所述带电粒子束提供小于校正的光束孔径角的光束孔径角; 并且其中所述带电粒子束倾斜装置适于提供等于或小于所述校正光束孔径角的光束倾斜角度。 此外，提供了一种操作带电粒子束装置的方法。

公开(公告)号：US20100200748A1

公开(公告)日：2010-08-12

申请号：US12701463

申请日：2010-02-05

申请人： Pavel ADAMEC ,  Helmut BANZHOF ,  Ivo LISKA

发明人： Pavel ADAMEC ,  Helmut BANZHOF ,  Ivo LISKA

IPC分类号： G01N23/22

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2446

摘要： It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

摘要翻译： 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

公开(公告)号：US20090146074A1

公开(公告)日：2009-06-11

申请号：US12277818

申请日：2008-11-25

申请人： Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

发明人： Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

IPC分类号： H01J3/14

CPC分类号： H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

摘要翻译： 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。