RF plasma supply device
    1.
    发明授权
    RF plasma supply device 有权
    射频等离子体供应装置

    公开(公告)号:US07745955B2

    公开(公告)日:2010-06-29

    申请号:US11549773

    申请日:2006-10-16

    IPC分类号: H02J1/10

    摘要: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

    摘要翻译: 通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出,将至少两个RF功率信号耦合到耦合的RF功率中,并将耦合的RF功率分配在 要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。 通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出,即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率,耦合的 RF功率构成均衡功率,并且对于低于预定义的下限功率限制的等离子体功率,耦合RF功率的重要部分构成均衡功率。

    RF Plasma Supply Device
    2.
    发明申请
    RF Plasma Supply Device 有权
    射频等离子体供应装置

    公开(公告)号:US20070145900A1

    公开(公告)日:2007-06-28

    申请号:US11549773

    申请日:2006-10-16

    IPC分类号: H01J7/24 C23F1/00 C23C16/00

    摘要: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

    摘要翻译: 通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出,将至少两个RF功率信号耦合到耦合的RF功率中,并将耦合的RF功率分配在 要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。 通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出,即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率,耦合的 RF功率构成均衡功率,并且对于低于预定义的下限功率限制的等离子体功率,耦合RF功率的重要部分构成均衡功率。

    Measuring Power
    3.
    发明申请
    Measuring Power 失效
    测量功率

    公开(公告)号:US20100026415A1

    公开(公告)日:2010-02-04

    申请号:US12537557

    申请日:2009-08-07

    IPC分类号: H01P5/18

    CPC分类号: H01P5/18 G01R27/28

    摘要: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ejφCf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ejφCr, an isolation in the forward direction determined from the equation If=If·ejφIf, and an isolation in the reverse direction determined from the equation Ir=Ir·ejφIr, wherein at least one condition is met from among the group consisting of: (1) the absolute value of Δφ=φCr+φCf−(φIr+φIf) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

    摘要翻译: 本发明的一个方面包括定向耦合器,其具有从方程Cf = Cf.ejphiCf确定的正向耦合因子,从方程Cr = Cr.ejphiCr确定的相反方向的耦合因子,向前方向的隔离 从方程If = If.ejphiIf确定,并且从方程Ir = Ir.ejphiIr确定的相反方向的隔离,其中满足以下组中的至少一个条件:(1)Deltaphi = phiCr + phiCf-(phiIr + phiIf)小于或等于20°,K = C f C r * I r I f(2)小于或等于1.6,(3)Cf = Cr,If = Ir。

    Measuring power
    4.
    发明授权
    Measuring power 失效
    测量功率

    公开(公告)号:US08203398B2

    公开(公告)日:2012-06-19

    申请号:US12537557

    申请日:2009-08-07

    IPC分类号: H01P5/18 H01P3/08

    CPC分类号: H01P5/18 G01R27/28

    摘要: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ejφCf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ejφCr, an isolation in the forward direction determined from the equation If=If·ejφIf, and an isolation in the reverse direction determined from the equation Ir=Ir·ejφIr, wherein at least one condition is met from among the group consisting of: (1) the absolute value of Δφ=φCr+φCf−(φIr+φIf) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

    摘要翻译: 本发明的一个方面包括定向耦合器,其具有从方程Cf = Cf·ej&phgr; Cf确定的正向耦合因子,从方程Cr = Cr·ej&phgr; Cr确定的相反方向的耦合因子,隔离 在从方程If = If·ej&phgr; If和从方程Ir = Ir·ej&phgr; Ir确定的反向隔离中确定的正向,其中满足以下组中的至少一个条件:( 1)绝对值&Dgr;&phgr; =&phgr; Cr +&phgr; Cf - (&phgr; Ir +&phgr; If)小于或等于20°,K = C f C r * I r I f(2 )小于或等于1.6,(3)Cf = Cr,If = Ir。

    MEASUREMENT SIGNAL PROCESSING
    5.
    发明申请
    MEASUREMENT SIGNAL PROCESSING 有权
    测量信号处理

    公开(公告)号:US20090140722A1

    公开(公告)日:2009-06-04

    申请号:US12276616

    申请日:2008-11-24

    IPC分类号: G01R19/00

    摘要: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h′, h′1, h′2) is further determined as a second measurement value, in particular, by means of the time difference (Δt) between the zero passages of the auxiliary signals (h, h′, h′1, h′2).

    摘要翻译: 为了确定源自交流电源的测量信号的幅度,并且更简单地确定测量信号之间的相移(ø),测量信号在测量信号操作装置中被处理,以形成各自具有恒定的交流振幅的辅助信号,并且 以获得第一测量值(v,a,rssi,rssi1,rssi2),特别是从应用于测量信号(m,m1,m2)的放大因子(v)获得。 两个辅助信号(h,h',h'1,h'2)之间的相移进一步被确定为第二测量值,特别是通过辅助信号的零通道之间的时间差(Deltat) (h,h',h'1,h'2)。

    PLASMA POWER SUPPLY CONTROL SYSTEM AND METHOD
    6.
    发明申请
    PLASMA POWER SUPPLY CONTROL SYSTEM AND METHOD 审中-公开
    等离子体电源控制系统及方法

    公开(公告)号:US20080150361A1

    公开(公告)日:2008-06-26

    申请号:US11951977

    申请日:2007-12-06

    IPC分类号: H02J3/14

    摘要: A plasma power supply controller jointly monitors a plurality of plasma power supply devices of one or more electrical loads. The controller includes at least one signal input, at least one signal output connected to at least one first logic switching device configured to actuate a first power interrupter of at least one of the plasma power supply devices, and a safety switching device. The at least one signal input is configured to receive indication signals of at least one indication device. The safety switching device is configured to detect a state or a state change of at least one of the indication devices and to interrupt the current supply of at least one of the plasma power supply devices using the first logic switching device upon a detection of a predetermined state or upon a detection of a state change of at least one of the indication devices.

    摘要翻译: 等离子体电源控制器联合监视一个或多个电负载的多个等离子体供电装置。 所述控制器包括至少一个信号输入,至少一个信号输出连接到被配置为致动所述等离子体电源装置中的至少一个的第一断电器的至少一个第一逻辑开关装置以及安全开关装置。 所述至少一个信号输入被配置为接收至少一个指示装置的指示信号。 安全切换装置被配置为检测至少一个指示装置的状态或状态改变,并且在检测到预定的时间时,使用第一逻辑开关装置中断至少一个等离子体供电装置的电流供应 或者在检测到至少一个指示装置的状态改变时。

    Measuring electrical current flowing through a conductor
    7.
    发明授权
    Measuring electrical current flowing through a conductor 有权
    测量流过导体的电流

    公开(公告)号:US07321227B2

    公开(公告)日:2008-01-22

    申请号:US11279443

    申请日:2006-04-12

    IPC分类号: G01R11/32

    摘要: A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.

    摘要翻译: 一种电流测量装置,其特别是以无接触的方式在载流导体中使用具有线圈导体和连接到线圈导体的电路的线圈装置来测量电流,所述线圈装置至少部分地被包围 由线圈屏蔽。 线圈屏蔽和电路彼此独立地连接到地电位。 从而提高了测量精度。

    Measuring Current
    8.
    发明申请
    Measuring Current 有权
    测量电流

    公开(公告)号:US20060232265A1

    公开(公告)日:2006-10-19

    申请号:US11279443

    申请日:2006-04-12

    IPC分类号: G01R11/32

    摘要: A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.

    摘要翻译: 一种电流测量装置,其特别是以无接触的方式在载流导体中使用具有线圈导体和连接到线圈导体的电路的线圈装置来测量电流,所述线圈装置至少部分地被包围 由线圈屏蔽。 线圈屏蔽和电路彼此独立地连接到地电位。 从而提高了测量精度。

    Plasma process power delivery system and method with event-controlled data storage
    9.
    发明授权
    Plasma process power delivery system and method with event-controlled data storage 有权
    等离子体过程电力输送系统和方法与事件控制的数据存储

    公开(公告)号:US08190969B2

    公开(公告)日:2012-05-29

    申请号:US11750573

    申请日:2007-05-18

    IPC分类号: G01R31/28

    CPC分类号: H01J37/32935

    摘要: A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.

    摘要翻译: 等离子体处理功率传递系统包括等离子体处理功率传递系统内的一个或多个事件确定装置,与一个或多个事件确定装置通信的控制器,第一存储器,第二存储器,数据传输连接和 等离子体过程监控系统。 数据传输连接在第一存储器和第二存储器之间,并且被配置为响应于由一个或多个事件确定的预定义事件的发生而在第一存储器和第二存储器之间传送与等离子体处理功率传递系统有关的数据 - 确定设备。 等离子体过程监控系统与第二存储器通信,并且分析与使用存储在第二存储器中的数据触发第二存储器中的存储的事件相关联的情况。

    Supplying RF power to a plasma process
    10.
    发明授权
    Supplying RF power to a plasma process 有权
    向等离子体工艺提供射频功率

    公开(公告)号:US07981306B2

    公开(公告)日:2011-07-19

    申请号:US11464000

    申请日:2006-08-11

    IPC分类号: B44C1/22 H01L21/302

    摘要: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

    摘要翻译: 产生至少两个向等离子体处理提供RF功率的RF功率发生器的驱动信号,其中在RF发生器驱动器中产生驱动一个RF功率发生器的至少两个驱动信号。 每个驱动信号由发电机驱动器的相应功能发生器(例如数字正弦发生器)产生。