Coating apparatus and coating method

    公开(公告)号:US09836844B2

    公开(公告)日:2017-12-05

    申请号:US14663814

    申请日:2015-03-20

    摘要: Disclosed is a coating apparatus. A first imaging unit captures an image of the substrate disposed on the stage. A second imaging unit captures an image of the substrate disposed on the stage with a narrower viewing angle and higher resolution than the first imaging unit. The control unit performs a pre-alignment processing of capturing an image of a circular pre-alignment mark formed on the substrate using the first imaging unit and performing positioning of the substrate by controlling the moving mechanism and the rotating mechanism based on the captured image and, after the pre-alignment processing, performs a fine-alignment processing of capturing an image of a circular fine-alignment mark formed on the substrate using the second imaging unit and performing positioning of the substrate by controlling the moving mechanism and the rotating mechanism based on the captured image.

    COATING APPARATUS AND COATING METHOD
    4.
    发明申请
    COATING APPARATUS AND COATING METHOD 有权
    涂装和涂装方法

    公开(公告)号:US20150281654A1

    公开(公告)日:2015-10-01

    申请号:US14663814

    申请日:2015-03-20

    IPC分类号: H04N7/18 G06T7/00 G01B11/06

    摘要: Disclosed is a coating apparatus. A first imaging unit captures an image of the substrate disposed on the stage. A second imaging unit captures an image of the substrate disposed on the stage with a narrower viewing angle and higher resolution than the first imaging unit. The control unit performs a pre-alignment processing of capturing an image of a circular pre-alignment mark formed on the substrate using the first imaging unit and performing positioning of the substrate by controlling the moving mechanism and the rotating mechanism based on the captured image and, after the pre-alignment processing, performs a fine-alignment processing of capturing an image of a circular fine-alignment mark formed on the substrate using the second imaging unit and performing positioning of the substrate by controlling the moving mechanism and the rotating mechanism based on the captured image.

    摘要翻译: 公开了一种涂布装置。 第一成像单元捕获设置在台上的基板的图像。 第二成像单元以比第一成像单元更窄的视角和更高的分辨率捕获设置在平台上的基板的图像。 控制单元使用第一成像单元执行拍摄形成在基板上的圆形预对准标记的图像的预对准处理,并且通过基于捕获图像控制移动机构和旋转机构来执行基板的定位,以及 在预对准处理之后,使用第二成像单元进行拍摄形成在基板上的圆形微细对准标记的图像的精细对准处理,并且通过基于移动机构和旋转机构的控制来进行基板的定位 在捕获的图像上。