公开(公告)号：US20240105422A1

公开(公告)日：2024-03-28

申请号：US18475502

申请日：2023-09-27

Applicant: Tokyo Electron Limited

Inventor： Masato OZAWA ,  Chanseong AHN ,  Masaki TSUNODA

IPC: H01J37/32

CPC classification number: H01J37/3211

Abstract: A plasma processing apparatus includes: a processing container; a stage arranged inside the processing container to place a substrate to be processed on the stage; a plasma excitation antenna arranged above the processing container; a coil holder for holding the plasma excitation antenna; and a radio-frequency power supply for supplying radio-frequency power to the plasma excitation antenna. The coil holder includes a plurality of beam-like members arranged radially to protrude outward from a center of the coil holder, and a clamp-like member attached to each of the plurality of beam-like members and suspended downward from each of the plurality of beam-like members. The clamp-like member has an upper end supported by each beam-like member with a screw member and is configured to move in a pendulum manner, and a gripper configured to grip and hold the plasma excitation antenna is formed in a lower end of the clamp-like member.

公开(公告)号：US20220336238A1

公开(公告)日：2022-10-20

申请号：US17754446

申请日：2020-08-06

Applicant: Tokyo Electron Limited

Inventor： Shosuke ENDO ,  Yohei MIDORIKAWA ,  Yohei NAKAGOMI ,  Yoshihiro KOBAYASHI ,  Yasuo NAKATANI ,  Susumu SAITO ,  Chanseong AHN ,  Yuta TAKAHASHI ,  Takahiro KIJIMA

IPC: H01L21/67 ,  H01L21/66 ,  H01L21/324 ,  H01L21/687

Abstract: A heating/cooling device includes: a chamber; a plurality of substrate holders provided inside the chamber to support substrates; a plurality of LED light sources provided outside the chamber to irradiate the substrates held on the substrate holders with LED light having a wavelength that heats the substrates; a plurality of transmission windows provided between the plurality of substrate holders and the plurality of LED light sources to transmit the LED light radiated from the LED light sources; and a plurality of gas distribution parts provided inside the chamber to distribute and supply a cooling gas to the substrates held on the substrate holders.