公开(公告)号：US09728416B2

公开(公告)日：2017-08-08

申请号：US13842532

申请日：2013-03-15

Applicant: Tokyo Electron Limited

Inventor： Jianping Zhao ,  Lee Chen ,  Merritt Funk ,  Iwao Toshihiko ,  Peter L. G. Ventzek

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/67 ,  H01J37/32

CPC classification number: H01L21/3065 ,  H01J37/32192 ,  H01J37/32256 ,  H01J37/32311 ,  H01L21/67069

Abstract: A resonator system is provided with one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator system can be coupled to a process chamber using one or more interface and isolation assemblies, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. The plasma tuning rods can be configured to couple the EM-energy from the resonant cavities to the process space within the process chamber.

公开(公告)号：US20140262040A1

公开(公告)日：2014-09-18

申请号：US13842965

申请日：2013-03-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Jianping Zhao ,  Peter L. G. Ventzek ,  Lee Chen ,  Barton Lane ,  Merritt Funk ,  Radha Sundararajan ,  Iwao Toshihiko ,  Zhiying Chen

IPC: H01J37/32

CPC classification number: H01J37/32256

Abstract: A plasma-tuning rod configured for use with a microwave processing system. The waveguide includes a first dielectric portion having a first outer diameter. A second dielectric portion, with a second outer diameter greater than the first outer diameter surrounds the first dielectric portion, and may be coaxial therewith. In some embodiments of the present invention, a dielectric constant of the first dielectric portion may be equal to or greater than a dielectric constant of the second dielectric portion.

Abstract translation: 一种配置成与微波处理系统一起使用的等离子体调节杆。 波导包括具有第一外径的第一电介质部分。 具有大于第一外径的第二外径的第二电介质部分围绕第一电介质部分，并且可以与其同轴。 在本发明的一些实施例中，第一电介质部分的介电常数可以等于或大于第二电介质部分的介电常数。

公开(公告)号：US09396955B2

公开(公告)日：2016-07-19

申请号：US13834690

申请日：2013-03-15

Applicant: Tokyo Electron Limited

Inventor： Jianping Zhao ,  Lee Chen ,  Merritt Funk ,  Iwao Toshihiko ,  Peter L. G. Ventzek

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01L21/3065 ,  C23C16/511 ,  H01J37/32

CPC classification number: H01L21/3065 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32256

Abstract: A plasma tuning rod system is provided with one or more microwave cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to a plasma by generating resonant microwave energy in one or more plasma tuning rods within and/or adjacent to the plasma. One or more microwave cavity assemblies can be coupled to a process chamber, and can comprise one or more tuning spaces/cavities. Each tuning space/cavity can have one or more plasma tuning rods coupled thereto. The plasma tuning rods can be configured to couple the EM energy from the resonant cavities to the process space within the process chamber and thereby create uniform plasma within the process space.

Abstract translation: 等离子调谐杆系统设置有一个或多个微波空腔，其被配置为通过在等离子体内和/或邻近等离子体内的一个或多个等离子体调谐杆中产生共振微波能量将所期望的EM波模式中的电磁（EM）能量耦合到等离子体 。 一个或多个微波空腔组件可以耦合到处理室，并且可以包括一个或多个调谐空间/空腔。 每个调谐空间/空腔可以具有耦合到其上的一个或多个等离子体调谐杆。 等离子体调谐杆可以被配置为将EM能量从谐振腔耦合到处理室内的处理空间，从而在处理空间内产生均匀的等离子体。

公开(公告)号：US20130224961A1

公开(公告)日：2013-08-29

申请号：US13842532

申请日：2013-03-15

Applicant: Tokyo Electron Limited

Inventor： Jianping Zhao ,  Lee Chen ,  Merritt Funk ,  Iwao Toshihiko ,  Peter L. G. Ventzek

IPC: H01L21/3065 ,  H01L21/67

CPC classification number: H01L21/3065 ,  H01J37/32192 ,  H01J37/32256 ,  H01J37/32311 ,  H01L21/67069

Abstract: A resonator system is provided with one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator system can be coupled to a process chamber using one or more interface and isolation assemblies, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. The plasma tuning rods can be configured to couple the EM-energy from the resonant cavities to the process space within the process chamber.

Abstract translation: 谐振器系统设置有一个或多个谐振腔，其被配置为通过在与等离子体相邻的谐振腔中产生谐振微波能量将所期望的EM波模式中的电磁（EM）能量耦合到等离子体。 谐振器系统可以使用一个或多个接口和隔离组件耦合到处理室，并且每个谐振腔可以具有耦合到其上的多个等离子体调谐杆。 等离子体调谐杆可以被配置为将EM能量从谐振腔耦合到处理室内的处理空间。

公开(公告)号：US20130203261A1

公开(公告)日：2013-08-08

申请号：US13834690

申请日：2013-03-15

Applicant: Tokyo Electron Limited

Inventor： Jianping Zhao ,  Lee Chen ,  Merritt Funk ,  Iwao Toshihiko ,  Peter L. G. Ventzek

IPC: H01L21/3065

CPC classification number: H01L21/3065 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32256

Abstract: A plasma tuning rod system is provided with one or more microwave cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to a plasma by generating resonant microwave energy in one or more plasma tuning rods within and/or adjacent to the plasma. One or more microwave cavity assemblies can be coupled to a process chamber, and can comprise one or more tuning spaces/cavities. Each tuning space/cavity can have one or more plasma tuning rods coupled thereto. The plasma tuning rods can be configured to couple the EM energy from the resonant cavities to the process space within the process chamber and thereby create uniform plasma within the process space.

Abstract translation: 等离子调谐杆系统设置有一个或多个微波空腔，其被配置为通过在等离子体内和/或邻近等离子体内的一个或多个等离子体调谐杆中产生共振微波能量将所期望的EM波模式中的电磁（EM）能量耦合到等离子体 。 一个或多个微波空腔组件可以耦合到处理室，并且可以包括一个或多个调谐空间/空腔。 每个调谐空间/空腔可以具有耦合到其上的一个或多个等离子体调谐杆。 等离子体调谐杆可以被配置为将EM能量从谐振腔耦合到处理室内的处理空间，从而在处理空间内产生均匀的等离子体。