公开(公告)号：US20150140694A1

公开(公告)日：2015-05-21

申请号：US14548654

申请日：2014-11-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Mitsuya INOUE ,  Makoto TAKADO

IPC: C23C16/52 ,  H01L21/66 ,  H01L21/02 ,  C23C16/448 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/4481 ,  C23C16/45561

Abstract: A gas supply device for intermittently supplying raw material gas into a film forming process unit that includes a raw material container for accommodating a raw material, a carrier gas supply unit for supplying carrier gas to evaporate the raw material, a raw material gas supply path for supplying the raw material gas and the carrier gas into the film forming process unit, a flow rate detector, a flow rate regulating valve, a raw material supply and block unit for supplying and blocking the raw material gas into the film forming process unit, and a control unit for outputting a control signal for intermittently supplying the raw material gas into the film forming process unit.

Abstract translation: 一种用于将原料气体间歇地供给到成膜处理单元中的气体供给装置，该成膜处理单元包括用于容纳原料的原料容器，用于供给载气以蒸发原料的载气供给单元，用于 将原料气体和载体气体供给到成膜处理单元中，流量检测器，流量调节阀，用于将原料气体供给和封闭到成膜处理单元中的原料供给和块单元，以及 输出用于将原料气体间歇地供给到成膜处理单元中的控制信号的控制单元。

公开(公告)号：US20140209021A1

公开(公告)日：2014-07-31

申请号：US14167613

申请日：2014-01-29

Applicant: TOKYO ELECTRON LIMITED

Inventor： Mitsuya INOUE ,  Makoto TAKADO ,  Atsushi ANDO

IPC: C23C16/448 ,  G01F1/00

CPC classification number: C23C16/4481 ,  C23C16/45561 ,  G01F1/68 ,  Y10T137/0368 ,  Y10T137/7759

Abstract: Provided is a raw material gas supply device which includes: a raw material container; a carrier gas supply unit configured to supply a carrier gas into the container via a carrier gas flow path; a first flow rate measurement unit configured to measure a flow rate of the carrier gas flowing therethrough and output the same as a first flow rate measurement value; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material into a film forming apparatus; a second flow rate measurement unit configured to measure a flow rate of the raw material gas flowing therethrough and output the same as a second flow rate measurement value; and a flow rate calculation unit configured to calculate a difference between the first and second flow rate measurement values and to convert the difference into a vaporization flow rate of the raw material.

Abstract translation: 提供一种原料气体供给装置，其包括：原料容器; 载气供给部，其经由载气流路向载体供给载气; 第一流量测量单元，被配置为测量流过其中的载气的流量，并将其输出为第一流量测量值; 原料气体供给路径，被配置为将含有蒸发原料的原料气体供给到成膜装置中; 第二流量测量单元，被配置为测量流过其中的原料气体的流量，并将其输出为第二流量测量值; 以及流量计算单元，被配置为计算第一和第二流量测量值之间的差，并将差值转换成原料的蒸发流量。

公开(公告)号：US20140209022A1

公开(公告)日：2014-07-31

申请号：US14168549

申请日：2014-01-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Mitsuya INOUE ,  Makoto TAKADO

IPC: C23C16/455 ,  G05D16/00

CPC classification number: G05D16/00 ,  C23C16/4481 ,  C23C16/45561 ,  G05D7/0676 ,  Y10T137/0379 ,  Y10T137/7758

Abstract: Provided is a raw material gas supply device for use in a film forming apparatus, which includes: a raw material container configured to accommodate a solid raw material; a carrier gas supply unit configured to supply a carrier gas to the container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material; a pressure control unit configured to control an internal pressure of the container; and a control unit configured to control the pressure control unit to increase the internal pressure of the container when the measured flow rate of the vaporized raw material is higher than a predetermined target value, and to decrease the internal pressure when the measured flow rate is lower than the target value.

Abstract translation: 本发明提供一种成膜装置中使用的原料气体供给装置，其特征在于，包括：容纳固体原料的原料容器， 载气供给单元，其构造成将载气供给到所述容器; 原料气体供给路径，被配置为将来自容器的含有蒸发原料的原料气体供给到成膜装置; 流量测量单元，被配置为测量蒸发的原料的流量; 被配置为控制所述容器的内部压力的压力控制单元; 以及控制单元，其被配置为当所测量的蒸发原料的流量高于预定目标值时控制所述压力控制单元增加所述容器的内部压力，并且当所述测量流量较低时降低所述内部压力 比目标值。

公开(公告)号：US20210234248A1

公开(公告)日：2021-07-29

申请号：US17155618

申请日：2021-01-22

Applicant: Tokyo Electron Limited

Inventor： Isao TAKAHASHI ,  Hiroyuki MIYASHITA ,  Yuki OSADA ,  Mitsuya INOUE ,  Mitsutoshi ASHIDA

IPC: H01P5/18 ,  H05H1/46

Abstract: A directional coupler includes: a hollow coaxial line including a central conductor forming a main line and an outer conductor surrounding the central conductor and having an opening formed therein; a dielectric substrate covering the opening and provided with film-shaped ground conductors, wherein a film-shaped ground conductor covers a rear surface of the dielectric substrate facing the central conductor via the opening and a film-shaped ground conductor covers a front surface of the dielectric substrate, respectively, and are grounded; and a coupling line provided on the rear surface of the dielectric substrate in a region surrounded by the ground conductor formed on the rear surface and serving as an auxiliary line, wherein the ground conductor formed on the front surface is provided with a conductor-removed portion in which a portion of a conductor film in a region facing the coupling line via the dielectric substrate is removed.

公开(公告)号：US20200313628A1

公开(公告)日：2020-10-01

申请号：US16821694

申请日：2020-03-17

Applicant: TOKYO ELECTRON LIMITED

Inventor： Mitsuya INOUE ,  Mitsutoshi ASHIDA

IPC: H03F1/30 ,  H03F3/189 ,  H01J37/32

Abstract: A device includes an amplifier for amplifying and supplying a high frequency power supplied to a load, a parameter detector for detecting a parameter of a current, a voltage, or a power from the amplifier to the load, a current supply unit for supplying a driving current for the amplifier, and an output unit for outputting a command signal for changing an amplification degree of the amplifier based on the detected parameter such that the parameter becomes a target value. The device further includes a first abnormality detector for detecting an abnormality by monitoring the command signal, and/or a current detector for detecting the driving current, a current data storage unit storing an upper and a lower limit value of the driving current, and a second abnormality detector for detecting the abnormality based on at least one of the upper limit value or the lower limit value.