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公开(公告)号：US20160222516A1
公开(公告)日：2016-08-04
申请号：US14917414
申请日：2014-09-04
发明人： Taro IKEDA , Shigeru KASAI , Emiko HARA , Yutaka FUJINO , Yuki OSADA , Jun NAKAGOMI , Tomohito KOMATSU
IPC分类号： C23C16/511 , C23C16/455 , H01J37/32
摘要： A plasma processing device processes a substrate by generating plasma using a surface wave formed on a surface of a shower plate by a supplied microwave, which includes a plasma generating antenna equipped with the shower plate for supplying first and second gases into a processing vessel, and a drooping member installed to protrude downward from a lower end surface of the shower plate. An outer surface of the drooping member spreads outward as it goes from a top end to a bottom end thereof. The shower plate includes first and second gas supply holes through which the first and second gases are supplied into the processing vessel, respectively. The first gas supply holes are disposed inward of the outer surface of the drooping member. The second gas supply holes are disposed outward of the outer surface of the drooping member.
摘要翻译： 等离子体处理装置通过利用供给的微波在表面波形成的喷淋板的表面波上产生等离子体来进行处理，该等离子体处理装置包括配备有用于将第一和第二气体供给到处理容器中的喷淋板的等离子体发生天线， 安装成从淋浴板的下端面向下方突出的下垂部件。 下垂构件的外表面从顶端到底端向外扩散。 淋浴板包括第一和第二气体供应孔，第一和第二气体分别通过第一和第二气体供应孔被供应到处理容器中。 第一气体供给孔设置在下垂构件的外表面的内侧。 第二气体供给孔设置在下垂构件的外表面的外侧。
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2.发明申请MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS 有权微波辐射天线，微波等离子体源和等离子体处理装置公开(公告)号：US20140158302A1
公开(公告)日：2014-06-12
申请号：US14095563
申请日：2013-12-03
发明人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI , Hiroyuki MIYASHITA , Yuki OSADA , Akira TANIHARA , Yutaka FUJINO
IPC分类号： H01J37/32
CPC分类号： H01J37/3222 , H01J37/32201
摘要： A microwave radiation antenna includes an antenna body having a microwave radiation surface; a processing gas inlet configured to introduce a processing gas into the antenna body; a gas diffusion space configured to diffuse the processing gas in the antenna body; a plurality of gas outlets provided in the antenna body and configured to discharge the processing gas into the chamber; a plurality of slots provided in the antenna body under a state where the slots are separated from the gas diffusion space and the gas outlets; and an annular dielectric member provided in the microwave radiation surface side of the antenna body to cover a slot formation region where the slots are formed. A metal surface wave is formed in the microwave radiation surface by the microwave radiated through the slots and the annular dielectric member and a surface wave plasma is generated by the metal surface wave.
摘要翻译： 微波辐射天线包括具有微波辐射表面的天线体; 处理气体入口，被配置为将处理气体引入到天线体中; 气体扩散空间，其构造成将所述处理气体扩散到所述天线体中; 多个气体出口，其设置在所述天线体中并且被配置为将所述处理气体排出到所述室中; 在槽与气体扩散空间和气体出口分离的状态下设置在天线体中的多个槽; 以及设置在天线体的微波辐射面侧的环状电介质部件，以覆盖形成槽的槽形成区域。 通过微波辐射通过狭缝和环形电介质构成的微波辐射表面形成金属表面波，并通过金属表面波产生表面波等离子体。
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公开(公告)号：US20210234248A1
公开(公告)日：2021-07-29
申请号：US17155618
申请日：2021-01-22
摘要： A directional coupler includes: a hollow coaxial line including a central conductor forming a main line and an outer conductor surrounding the central conductor and having an opening formed therein; a dielectric substrate covering the opening and provided with film-shaped ground conductors, wherein a film-shaped ground conductor covers a rear surface of the dielectric substrate facing the central conductor via the opening and a film-shaped ground conductor covers a front surface of the dielectric substrate, respectively, and are grounded; and a coupling line provided on the rear surface of the dielectric substrate in a region surrounded by the ground conductor formed on the rear surface and serving as an auxiliary line, wherein the ground conductor formed on the front surface is provided with a conductor-removed portion in which a portion of a conductor film in a region facing the coupling line via the dielectric substrate is removed.
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4.发明申请IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC WAVE TRANSMISSION DEVICE, ELECTROMAGNETIC WAVE RADIATION DEVICE, AND PLASMA PROCESSING APPARATUS 审中-公开阻抗匹配滑块，阻抗匹配装置，电磁波传输装置，电磁波辐射装置和等离子体处理装置公开(公告)号：US20150348758A1
公开(公告)日：2015-12-03
申请号：US14716175
申请日：2015-05-19
发明人： Hiroyuki MIYASHITA , Taro IKEDA , Yuki OSADA , Tomohito KOMATSU
CPC分类号： H01J37/32229 , H01J37/32311 , H01J37/3244 , H01P5/04
摘要： An impedance matching slug that performs an impedance matching process in a waveguide is axially movably interposed between an outer conductor and an inner conductor of the waveguide. The impedance matching slug includes: a cylindrical first part and a cylindrical second part which are coupled to each other, wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor, wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part, wherein one of the first part and the second part is constituted by a conductor, and wherein the other of the first part and the second part is constituted by a dielectric.
摘要翻译： 在波导中的外导体和内导体之间轴向可动地插入执行波导中的阻抗匹配处理的阻抗匹配块。 阻抗匹配块包括：彼此耦合的圆柱形第一部分和圆柱形第二部分，其中第一部分和第二部分中的每一个具有面向内部导体的内周面和面向外部导体的外周面 其中，所述第二部分以所述第二部分的内周面与所述第一部分的外周面接触的方式设置在所述第一部分的外侧，其中，所述第一部分和所述第二部分中的一个 由导体构成，并且其中第一部分和第二部分中的另一个由电介质构成。
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公开(公告)号：US20240297020A1
公开(公告)日：2024-09-05
申请号：US18583943
申请日：2024-02-22
发明人： Taro IKEDA , Yuki OSADA , Hiroyuki MIYASHITA
IPC分类号： H01J37/32
CPC分类号： H01J37/32256 , H01J37/3222 , H01J37/32238 , H01J37/32293
摘要： A plasma processing apparatus includes: a processing container; a resonator configured to resonate electromagnetic waves to be supplied; a slot antenna connected to the resonator; and a transmission window configured to transmit the electromagnetic waves radiated from the slot antenna and supply the electromagnetic waves into the processing container, wherein the resonator includes: an input port including an inner shaft and an outer cylinder; an output port including an inner shaft and an outer cylinder; a power supply fin connecting the inner shaft of the input port and the inner shaft of the output port and provided in the resonator; and a ground fin connected to the outer cylinder of the input port and the outer cylinder of the output port at a same potential and provided to protrude within the resonator so as to be inserted between fins of the power supply fin.
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公开(公告)号：US20240297018A1
公开(公告)日：2024-09-05
申请号：US18589744
申请日：2024-02-28
发明人： Taro IKEDA , Yuki OSADA , Hiroyuki MIYASHITA
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/3211 , H01J2237/327
摘要： A distributor for distributing electromagnetic waves to a plurality of output terminals, the distributor includes: a power supply terminal configured to be electrically connected to a radio-frequency power source configured to be capable of varying frequency; and a plurality of filters provided respectively at the plurality of output terminals to which the electromagnetic waves input to the power supply terminal are distributed. The plurality of filters is configured to have different frequency characteristics.
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公开(公告)号：US20230033323A1
公开(公告)日：2023-02-02
申请号：US17869362
申请日：2022-07-20
发明人： Taro IKEDA , Yuki OSADA , Hiroyuki MIYASHITA , Hiroyuki ONODA , Satoru KAWAKAMI
IPC分类号： H01J37/32
摘要： There is provided a plasma source comprising a first chamber configured to form a flat first plasma generation space, and having a first wall and a second wall, a gas supply configured to supply gas into the first chamber, an electromagnetic wave supply having a dielectric window that is provided in an opening provided in the first wall to face the first plasma generation space, and configured to supply an electromagnetic wave through the dielectric window into the first chamber. The plasma source comprises a plasma supply configured to supply radicals contained in plasma that is generated from the gas supplied into the first chamber by the electromagnetic wave to an outside of the first chamber, and a plasma ignition source provided in the first chamber to protrude from an inner wall of the second wall facing the dielectric window and to be separated from the dielectric window.
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公开(公告)号：US20190074166A1
公开(公告)日：2019-03-07
申请号：US16122226
申请日：2018-09-05
发明人： Taro IKEDA , Tomohito KOMATSU , Yuki OSADA , Hiroyuki MIYASHITA , Susumu SAITO , Kazuhiro FURUKI , Mikio SATO , Eiki KAMATA
IPC分类号： H01J37/32
摘要： A plasma probe device includes an antenna unit installed at an opening formed in a wall of a processing chamber or a mounting table through a sealing member configured to seal between a vacuum space and an atmospheric space, an electrode connected to the antenna unit, and a dielectric support portion made of a dielectric material and configured to support the antenna unit from an outer peripheral side. A surface of the antenna unit which is exposed through the opening and separated from a facing surface of the wall or the mounting table facing the antenna unit by a width is depressed from a surface of the wall or the mounting table where the opening is formed, which faces a plasma generation space.
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