公开(公告)号：US11315770B2

公开(公告)日：2022-04-26

申请号：US16205558

申请日：2018-11-30

Applicant: Tokyo Electron Limited

Inventor： Kazuya Nagaseki ,  Kazuki Moyama ,  Toshiya Matsuda ,  Naokazu Furuya ,  Tatsuro Ohshita

IPC: C23C16/44 ,  C23C16/455 ,  H01J37/32 ,  C23C16/52 ,  H01L21/67 ,  H01L21/673

Abstract: An exhaust device including an exhaust mechanism and an exhaust unit is provided. The exhaust mechanism includes a first blade unit and a second blade unit provided in an exhaust space of a processing vessel including a processing space of a vacuum atmosphere for applying a process to a workpiece. The first blade unit and the second blade unit are arranged coaxially with a periphery of the workpiece, and at least one of the first blade unit and the second blade unit is rotatable. The exhaust unit is provided at a downstream side of the exhaust mechanism and communicates with the exhaust space. The exhaust unit is configured to exhaust gas in the processing vessel.

公开(公告)号：US20190256962A1

公开(公告)日：2019-08-22

申请号：US16348577

申请日：2017-10-27

Applicant: Tokyo Electron Limited

Inventor： Yoshiyuki Kobayashi ,  Shinji Himori ,  Naokazu Furuya

IPC: C23C4/134 ,  H05H1/40 ,  H05H1/42

Abstract: A plasma spraying apparatus includes a supplier configured to carry powder of a spray material by a plasma generation gas and jet the powder of the spray material and the plasma generation gas from an opening at a leading end thereof; a plasma generator configured to form, by using the jetted plasma generation gas, a plasma having an axis center shared by the supplier; a magnetic field generator configured to generate a magnetic field in a space where the plasma is formed; and a controller configured to control the magnetic field generator to control a deflection of the plasma.

公开(公告)号：US20180374679A1

公开(公告)日：2018-12-27

申请号：US16016990

申请日：2018-06-25

Applicant: Tokyo Electron Limited

Inventor： Shunichi Ito ,  Shinji Himori ,  Etsuji Ito ,  Naokazu Furuya ,  Gen Tamamushi

IPC: H01J37/32 ,  H01L21/683

Abstract: A power feed member having high heat insulation and capable of transmitting a power at a low loss is provided. The power feed member configured to supply a power includes a first conductive member; a second conductive member; and a connecting member configured to electrically connect the first conductive member and the second conductive member. At least a part of the connecting member is formed of a porous metal or multiple bulk metals.

公开(公告)号：US11756769B2

公开(公告)日：2023-09-12

申请号：US17220982

申请日：2021-04-02

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi Tohara ,  Naokazu Furuya ,  Yosuke Tamuro ,  Yuzuru Sakai

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32633 ,  H01J37/32651 ,  H01J37/32715

Abstract: A plasma processing apparatus includes: a chamber accommodating a plurality of substrates; a plurality of substrate supports provided inside the chamber and configured to support a substrate; a plurality of radio-frequency power sources provided corresponding to the plurality of substrate supports, and configured to supply radio-frequency power to the plurality of substrate supports, respectively; and a plurality of shields configured to compart the inside of the chamber and provided corresponding to the plurality of substrate supports to define a processing space where plasma is generated. A radio-frequency current path is formed between the plurality of shields so as not to interfere with one another.

公开(公告)号：US10943766B2

公开(公告)日：2021-03-09

申请号：US16016990

申请日：2018-06-25

Applicant: Tokyo Electron Limited

Inventor： Shunichi Ito ,  Shinji Himori ,  Etsuji Ito ,  Naokazu Furuya ,  Gen Tamamushi

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: A power feed member having high heat insulation and capable of transmitting a power at a low loss is provided. The power feed member configured to supply a power includes a first conductive member; a second conductive member; and a connecting member configured to electrically connect the first conductive member and the second conductive member. At least a part of the connecting member is formed of a porous metal or multiple bulk metals.