公开(公告)号：US12261028B2

公开(公告)日：2025-03-25

申请号：US18210012

申请日：2023-06-14

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shuichi Takahashi ,  Takaharu Miyadate ,  Takaaki Kikuchi ,  Atsushi Ogata ,  Nobutaka Sasaki ,  Takashi Taira

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

Abstract: In a plasma processing apparatus, a table has a wafer support to hold a wafer and a peripheral segment surrounding the wafer support and having through-holes. The peripheral segment has an upper surface lower than that of the wafer support. An outer focus ring is disposed over the peripheral segment and has a recess or a cutout at an inner portion of the outer focus ring, and the recess or cutout has through-holes. An inner focus ring is disposed in the recess or cutout of the outer focus ring. Lift pins respectively extend through the through-holes of the peripheral segment and the through-holes of the recess or cutout of the outer focus ring. Shift mechanisms control shift of the respective lift pins.

公开(公告)号：US20210005477A1

公开(公告)日：2021-01-07

申请号：US16910575

申请日：2020-06-24

Applicant: Tokyo Electron Limited

Inventor： Ryou Son ,  Sinya Sasaki ,  Hiroyuki Kondo ,  Syuntaro Tamaraya ,  Takaaki Kikuchi

IPC: H01L21/67 ,  C23C16/48 ,  C23C16/44 ,  C23C16/458

Abstract: A substrate processing apparatus includes an inner wall formed of a heat conductive material, a quartz liner that covers the inner wall, and a cooling unit that cools the inner wall. A gap is formed between the inner wall and the quartz liner, and a sealing member is provided in the gap to seal the gap. The gap is filled with a heat conductive medium.

公开(公告)号：US11984301B2

公开(公告)日：2024-05-14

申请号：US16941976

申请日：2020-07-29

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi Taira ,  Takaaki Kikuchi

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01L21/68735 ,  H01J37/32082 ,  H01L21/67069

Abstract: An edge ring includes a first edge ring, and a second edge ring that has a side surface adjacent to a side surface of the first edge ring and is movable in a vertical direction along the side surface of the first edge ring. Further, the side surface of the first edge ring and the side surface of the second edge ring at least partially face each other in a movement range of the second edge ring.