-
公开(公告)号：US11548827B2
公开(公告)日：2023-01-10
申请号：US16830205
申请日：2020-03-25
Applicant: NIPPON TUNGSTEN CO., LTD. , TOKYO ELECTRON LIMITED
Inventor： Takashi Ikeda , Hajime Ishii , Kenji Fujimoto , Naoyuki Satoh , Nobuyuki Nagayama , Koichi Murakami , Takahiro Murakami
Abstract: Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.
-
Patent Agency Ranking
公开(公告)号：US11434174B2
公开(公告)日：2022-09-06
申请号：US16830025
申请日：2020-03-25
Applicant: NIPPON TUNGSTEN CO., LTD. , TOKYO ELECTRON LIMITED
Inventor： Takashi Ikeda , Hajime Ishii , Kenji Fujimoto , Naoyuki Satoh , Nobuyuki Nagayama , Koichi Murakami , Takahiro Murakami
Abstract: A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula WxMyCz.
-
公开(公告)号：US20190103294A1
公开(公告)日：2019-04-04
申请号：US16150513
申请日：2018-10-03
Applicant: Tokyo Electron Limited
Inventor： Hiroyuki Masutomi , Takashi Ikeda
IPC: H01L21/67 , H01L21/02 , H01L21/4757
Abstract: A substrate liquid processing apparatus includes an inner tub 34A having a top opening and storing a processing liquid therein; an outer tub 34B provided outside the inner tub; a first cover body 71 configured to move between a closing position where a first region of the top opening is closed and an opening position where the first region is opened; and a second cover body 72 configured to move between a closing position where a second region of the top opening is closed and an opening position where the second region is opened. The first cover body has a bottom wall 711R and a sidewall 712R extended upwards therefrom, and the second cover body has a bottom wall 721R and a sidewall 722R extended upwards therefrom. Further, when being placed at the closing positions, the sidewalls closely face each other with a gap G having a height H.
-
公开(公告)号：US11637026B2
公开(公告)日：2023-04-25
申请号：US16150513
申请日：2018-10-03
Applicant: Tokyo Electron Limited
Inventor： Hiroyuki Masutomi , Takashi Ikeda
IPC: H01L21/67 , H01L21/677
Abstract: A substrate liquid processing apparatus includes an inner tub 34A having a top opening and storing a processing liquid therein; an outer tub 34B provided outside the inner tub; a first cover body 71 configured to move between a closing position where a first region of the top opening is closed and an opening position where the first region is opened; and a second cover body 72 configured to move between a closing position where a second region of the top opening is closed and an opening position where the second region is opened. The first cover body has a bottom wall 711R and a sidewall 712R extended upwards therefrom, and the second cover body has a bottom wall 721R and a sidewall 722R extended upwards therefrom. Further, when being placed at the closing positions, the sidewalls closely face each other with a gap G having a height H.
-
公开(公告)号：US11309194B2
公开(公告)日：2022-04-19
申请号：US15883481
申请日：2018-01-30
Applicant: Tokyo Electron Limited
Inventor： Koji Tanaka , Toshiyuki Shiokawa , Koji Yamashita , Hiroyuki Masutomi , Hitoshi Kosugi , Takao Inada , Takashi Ikeda , Tsukasa Hirayama
IPC: H01L21/67 , H01L21/673 , H01L21/677
Abstract: A substrate liquid treatment apparatus includes an inner tank configured to store a treatment liquid and having an upper opening, an outer tank disposed outside the inner tank, and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank. The lid includes a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position, and a splash shielding portion connected to the main portion. When the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.
-
公开(公告)号：US20190148176A1
公开(公告)日：2019-05-16
申请号：US16167863
申请日：2018-10-23
Applicant: Tokyo Electron Limited
Inventor： Koji Tanaka , Takashi Ikeda , Hiroyuki Masutomi
IPC: H01L21/67 , H01L21/673
Abstract: A substrate processing apparatus according to an embodiment includes a substrate processing tank, a processing liquid supply nozzle, and a pressure regulating plate. The processing liquid supply nozzle is provided in a lower portion within the substrate processing tank, and ejects the processing liquid from a plurality of ejection ports. The pressure regulating plate is provided between the processing liquid supply nozzle and the substrate in the substrate processing tank and has a plurality of holes through which the processing liquid flows. The pressure regulating plate is configured to adjust the inflow pressure of the processing liquid ejected from the processing liquid supply nozzle. In addition, the pressure regulating plate includes ribs that protrude from a processing liquid supply nozzle side surface thereof so as to partition the processing liquid supply nozzle side surface into a plurality of partitioned regions.
-
-
-
-
-
Search Results
6
records
(took 0.014 seconds)
