公开(公告)号：US20180130681A1

公开(公告)日：2018-05-10

申请号：US15574514

申请日：2016-05-11

Applicant: Tokyo Electron Limited

Inventor： Tamotsu Tanifuji ,  Tamaki Yuasa ,  Satoru Kawakami

IPC: H01L21/67 ,  H01L21/687 ,  C23C16/44 ,  C23C16/52 ,  C23C16/50 ,  H01J37/32

CPC classification number: H01L21/67173 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32009 ,  H01J37/3244 ,  H01J2237/3321 ,  H01J2237/334 ,  H01L21/67017 ,  H01L21/67063 ,  H01L21/67167 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/68707

Abstract: A processing system includes: at least one processing unit. Each processing unit includes a plurality of processing chambers, and a utility module. Each of the processing chambers processes a processing target object using a supplied processing gas. The utility module includes a flow rate controller configured to control a flow rate of the processing gas supplied to each of the plurality of processing chambers. The plurality of processing chambers are disposed to overlap each other in a vertical direction. The utility module is disposed between two processing chambers adjacent in the vertical direction, among the plurality of processing chambers.