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21 条记录 (耗时 0.019 秒)

    Porous film of vinylidene fluoride resin and method for producing same
    1.
    发明申请
    Porous film of vinylidene fluoride resin and method for producing same 有权
    偏氟乙烯树脂的多孔膜及其制造方法

    公开(公告)号：US20060148912A1

    公开(公告)日：2006-07-06

    申请号：US10553442

    申请日：2004-04-09

    申请人： Takumi Katsurao ,  Tomoaki Kawakami ,  Toshio Hosokawa

    发明人： Takumi Katsurao ,  Tomoaki Kawakami ,  Toshio Hosokawa

    IPC分类号： C08J5/20

    CPC分类号： B01D67/002 ,  B01D69/02 ,  B01D71/34 ,  B01D71/76 ,  B01D71/82 ,  B01D2323/06 ,  B01D2323/20 ,  B01D2325/36

    摘要： A porous membrane of vinylidene fluoride resin excellent in hydrophilicity and having a good balance among strength, elongation and water permeation rate, which is thus useful as a microfiltration membrane or a separator of battery. The porous membrane is formed from a copolymer of 100 mols of a vinylidene fluoride monomer and 0.01-10.0 mols of a hydrophilic monomer having at least one species of hydrophilic group selected from epoxy group, hydroxy group, carboxy group, ester group, amide group and acid anhydride group.

    摘要翻译： 亲水性优异，强度，伸长率和透水率均衡好的偏氟乙烯树脂的多孔膜，因此可用作微滤膜或电池隔膜。 多孔膜由100摩尔偏二氟乙烯单体和0.01-10.0摩尔具有至少一种选自环氧基，羟基，羧基，酯基，酰胺基的亲水基团的亲水性单体的共聚物形成， 酸酐基。

    Hydrophilic Vinylidene Fluoride Resin Composition and Method for Production Thereof
    3.
    发明申请
    Hydrophilic Vinylidene Fluoride Resin Composition and Method for Production Thereof 有权
    亲水性亚乙烯基氟树脂组合物及其制备方法

    公开(公告)号：US20080249201A1

    公开(公告)日：2008-10-09

    申请号：US11883317

    申请日：2006-01-30

    申请人： Tomoaki Kawakami ,  Toshio Hosokawa

    发明人： Tomoaki Kawakami ,  Toshio Hosokawa

    IPC分类号： C08F110/00 ,  C04B28/00

    CPC分类号： C08F14/22 ,  C08F259/08 ,  C08L27/16 ,  C08L31/04 ,  C08L33/12 ,  C08L33/14 ,  C08L51/003 ,  Y10S525/934 ,  C08F2/18 ,  C08L2666/04 ,  C08L2666/02

    摘要： A hydrophilic vinylidene fluoride resin composition, comprising: porous vinylidene fluoride polymer particles and a hydrophilic polymer having a weight-average molecular weight of at least 2×105 contained in the pores of the porous vinylidene fluoride polymer particles. The composition is preferably obtained by subjecting a slurry containing porous vinylidene fluoride polymer particles after suspension polymerization to an appropriate degree of heat treatment for adjusting the amount of residual polymerization initiator, then impregnating the Polymer particles with a hydrophilic monomer and polymerizing the monomer. The thus-obtained vinylidene fluoride resin composition exhibits persistent hydrophilicity and good processability.

    摘要翻译： 一种亲水性偏氟乙烯树脂组合物，其包含：多孔偏二氟乙烯聚合物颗粒和包含在所述多孔偏二氟乙烯聚合物颗粒的孔中的重均分子量为至少2×10 5的亲水性聚合物。 该组合物优选通过使悬浮聚合后含有多孔偏二氟乙烯聚合物颗粒的浆料进行适当程度的热处理以调节残留聚合引发剂的量，然后用亲水性单体浸渍聚合物颗粒并聚合单体而获得。 由此得到的偏二氟乙烯树脂组合物表现出持久的亲水性和良好的加工性能。

    Hydrophilic vinylidene fluoride resin composition and method for production thereof
    4.
    发明授权
    Hydrophilic vinylidene fluoride resin composition and method for production thereof 有权
    亲水性偏氟乙烯树脂组合物及其制备方法

    公开(公告)号：US08236865B2

    公开(公告)日：2012-08-07

    申请号：US11883317

    申请日：2006-01-30

    申请人： Tomoaki Kawakami ,  Toshio Hosokawa

    发明人： Tomoaki Kawakami ,  Toshio Hosokawa

    IPC分类号： C08J9/36 ,  C04B28/02 ,  C08F110/00 ,  C08L27/12

    CPC分类号： C08F14/22 ,  C08F259/08 ,  C08L27/16 ,  C08L31/04 ,  C08L33/12 ,  C08L33/14 ,  C08L51/003 ,  Y10S525/934 ,  C08F2/18 ,  C08L2666/04 ,  C08L2666/02

    摘要： A hydrophilic vinylidene fluoride resin composition, comprising: porous vinylidene fluoride polymer particles and a hydrophilic polymer having a weight-average molecular weight of at least 2×105 contained in the pores of the porous vinylidene fluoride polymer particles. The composition is preferably obtained by subjecting a slurry containing porous vinylidene fluoride polymer particles after suspension polymerization to an appropriate degree of heat treatment for adjusting the amount of residual polymerization initiator, then impregnating the Polymer particles with a hydrophilic monomer and polymerizing the monomer. The thus-obtained vinylidene fluoride resin composition exhibits persistent hydrophilicity and good processability.

    摘要翻译： 一种亲水性偏氟乙烯树脂组合物，其包含：多孔偏二氟乙烯聚合物颗粒和多孔偏二氟乙烯聚合物颗粒的孔中包含的重均分子量为至少2×10 5的亲水性聚合物。 该组合物优选通过使悬浮聚合后含有多孔偏二氟乙烯聚合物颗粒的浆料进行适当程度的热处理以调节残留聚合引发剂的量，然后用亲水性单体浸渍聚合物颗粒并聚合单体而获得。 由此得到的偏二氟乙烯树脂组合物表现出持久的亲水性和良好的加工性能。

    Vinylidene fluoride polymer and process for producing the same
    7.
    发明授权
    Vinylidene fluoride polymer and process for producing the same 有权
    偏二氟乙烯聚合物及其制备方法

    公开(公告)号：US07943707B2

    公开(公告)日：2011-05-17

    申请号：US11791324

    申请日：2005-11-21

    申请人： Tomoaki Kawakami ,  Takumi Katsurao

    发明人： Tomoaki Kawakami ,  Takumi Katsurao

    IPC分类号： C08F2/00 ,  C08F14/18

    CPC分类号： C08F114/22 ,  C08F14/22 ,  C08F214/22 ,  C08F2/18

    摘要： A monomer comprising vinylidene fluoride as a principal component is suspension-polymerized by supplying the monomer in division to a polymerization system containing a polymerization initiator at a pressure below a critical pressure Pcr (=4.38 MPa) of vinylidene fluoride and at a pressure above Pcr. As a result, a vinylidene fluoride polymer having excellent high-temperature coloring resistance and with remarkably less elution of organic matter and ionic components is produced, without using a specific halogenated hydrocarbon and without incurring troublesome labor and cost for recovery thereof.

    摘要翻译： 以偏二氟乙烯为主要成分的单体通过在低于偏二氟乙烯的临界压力Pcr（= 4.38MPa）的压力和高于Pcr的压力下将含有聚合引发剂的聚合体系分开供给而进行悬浮聚合。 结果，制备了具有优异的耐高温着色性和显着更少的有机物和离子组分的洗脱的偏二氟乙烯聚合物，而不使用特定的卤代烃，并且不会产生麻烦的劳动和回收的成本。

    STORAGE MEDIUM STORING EXPOSURE CONDITION DETERMINATION PROGRAM, EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
    8.
    发明申请
    STORAGE MEDIUM STORING EXPOSURE CONDITION DETERMINATION PROGRAM, EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
    存储介质存储条件测定程序，接触条件测定方法，曝光方法和设备制造方法

    公开(公告)号：US20090075216A1

    公开(公告)日：2009-03-19

    申请号：US12209040

    申请日：2008-09-11

    申请人： Tomoaki Kawakami

    发明人： Tomoaki Kawakami

    IPC分类号： G03F7/22 ,  G03B27/54

    CPC分类号： G03F7/70091 ,  G03F7/705 ,  G03F7/70566

    摘要： A computer-readable storage medium storing a program for causing a computer to execute determination of an exposure condition for use in illuminating an original plate with an illumination optical system and projecting an image of a pattern of the original plate onto a substrate through a projection optical system. The program causes the computer to perform operations including setting a light intensity distribution on a pupil plane in the illumination optical system based on a constraint condition concerning an optical element constituting the illumination optical system, calculating the image of the pattern of the original plate to be projected onto the substrate using the light intensity distribution, and determining the exposure condition for exposing the substrate with the image of the pattern of the original plate based on a calculation result of the image of the pattern of the original plate and the constraint condition.

    摘要翻译： 一种计算机可读存储介质，其存储用于使计算机执行用于照明光学系统照亮原版的曝光条件的确定的程序，并且通过投影光学将原版的图案的图像投影到基板上 系统。 该程序使计算机执行包括在照明光学系统中基于关于构成照明光学系统的光学元件的约束条件来设置照明光学系统中的光瞳平面上的光强度分布的操作，将原始板的图案的图像计算为 使用光强度分布投影到基板上，并且基于原版的图案的图像的计算结果和约束条件来确定用于使原版的图案的图像曝光的基板的曝光条件。

    IMAGING APPARATUS
    9.
    发明申请
    IMAGING APPARATUS 有权
    成像设备

    公开(公告)号：US20130169859A1

    公开(公告)日：2013-07-04

    申请号：US13821490

    申请日：2011-09-06

    申请人： Tomoaki Kawakami ,  Toshihiko Tsuji

    发明人： Tomoaki Kawakami ,  Toshihiko Tsuji

    IPC分类号： H04N5/225

    CPC分类号： H04N5/2256 ,  G02B27/0994

    摘要： An imaging apparatus (1) includes an illumination optical system (100) that includes a light source (110) and is configured to guide light from the light source to a target (B), an imaging optical system configured to capture an image of the target, and a plurality of image sensors (430) arranged on an image plane of the imaging optical system. The illumination optical system includes a plurality of integrators (121,122). Light flux exits from one of the plurality of integrators illuminates at least one of the plurality of image sensors, and light exits from the other integrators illuminates at least one of the plurality of image sensors other than the image sensor illuminated by the light exits from the one of the plurality of integrators.

    摘要翻译： 一种成像装置（1）包括照明光学系统（100），其包括光源（110）并且被配置为将来自所述光源的光引导到目标（B）;成像光学系统，被配置为捕获所述光源 目标和布置在成像光学系统的图像平面上的多个图像传感器（430）。 照明光学系统包括多个积分器（121,122）。 从多个积分器中的一个出射的光束照射多个图像传感器中的至少一个，并且来自其他积分器的光离开照亮多个图像传感器中的至少一个图像传感器，而不是由光照射的图像传感器从 多个集成商之一。

    EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE USING THE EXPOSURE APPARATUS
    10.
    发明申请
    EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE USING THE EXPOSURE APPARATUS 有权
    曝光装置和使用曝光装置制造装置的方法

    公开(公告)号：US20070024839A1

    公开(公告)日：2007-02-01

    申请号：US11460354

    申请日：2006-07-27

    申请人： Tomoaki Kawakami ,  Ken-ichiro Shinoda

    发明人： Tomoaki Kawakami ,  Ken-ichiro Shinoda

    IPC分类号： G03B27/72

    CPC分类号： G03B27/72 ,  G03F7/70091

    摘要： At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.

    摘要翻译： 至少一个示例性实施例涉及一种曝光装置，其包括被配置为用来从光源照射光的照明光学系统，以及被配置为将掩模的图案图像投影到基板上的投影光学系统。 照明光学系统提供可以由形成第二光强度的光学单元改变的第一光强度。 可以通过改变形成第三光强度的第二光强度的尺寸的光学单元进一步改变第二光强度，其中可以在用于形成器件的光刻工艺中使用第三光强度。