公开(公告)号：US08816033B2

公开(公告)日：2014-08-26

申请号：US14003317

申请日：2012-03-05

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： C08F20/10

CPC分类号： C08F122/14 ,  C07C57/42 ,  C07C69/54 ,  C08F20/20 ,  C08F222/1006

摘要： An object of the present invention is to provide a radically curable compound which produces cured products with excellent heat resistance, and in order to achieve the object, the present invention provides a radically curable compound represented by general formula (1) below. (In the formula, R1 and R2 are each independently an alkyl group having 1 to 8 carbon atoms, R3 and R4 are each independently a hydrogen atom or a methyl group, m and n are each independently an integer of 1 to 4, and X is an aromatic hydrocarbon group or an aromatic hydrocarbon group substituted by an alkyl group having 1 to 8 carbon atoms.)

摘要翻译： 本发明的目的是提供一种能够产生耐热性优异的固化物的自由基固化性化合物，为了达到上述目的，本发明提供由下述通式（1）表示的自由基固化性化合物。 （式中，R 1和R 2各自独立地为碳原子数1〜8的烷基，R 3和R 4各自独立地为氢原子或甲基，m和n各自独立地为1〜4的整数，X 是由碳原子数1〜8的烷基取代的芳香族烃基或芳香族烃基。）

公开(公告)号：US20140023969A1

公开(公告)日：2014-01-23

申请号：US14110311

申请日：2012-04-10

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  C08G8/08 ,  C08G8/12 ,  C08G8/20 ,  C08L61/06 ,  C08L2205/02 ,  C09D161/06 ,  G03F7/0233 ,  G03F7/0236

摘要： A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1) [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2)

摘要翻译： 相对于100质量份的甲酚酚醛清漆树脂（A），正型光致抗蚀剂组合物包含3〜80质量份酚醛清漆型酚醛树脂（B）。 酚醛清漆型酚醛树脂（B）具有式（1）所示的重复结构单元[式中，R表示氢原子或碳原子数1〜12的烃基，X表示由式（1）表示的结构（x1） 2）

公开(公告)号：US08623585B2

公开(公告)日：2014-01-07

申请号：US13884788

申请日：2011-10-25

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/004 ,  G03F7/032 ,  C08L61/06 ,  C08G8/28

CPC分类号： G03F7/004 ,  C08G8/04 ,  C08G8/20 ,  C08L61/12 ,  G03F7/0236

摘要： Provided is a positive photoresist composition containing, as an essential component, a novolac phenolic resin (C) prepared by condensing an aromatic compound (A) represented by general formula (1) or (2) with an aliphatic aldehyde (B). This positive photoresist composition has high sensitivity and high heat resistance at the same time, and is suitable for use as a positive photoresist in, for example, the manufacture of semiconductor devices such as ICs and LSIs, the manufacture of displays such as LCDs, and the manufacture of printing plates. (In the formulas, R1, R2, and R3 are each independently an alkyl group having 1 to 8 carbon atoms; m, n, and p are each independently an integer of 0 to 4; q is an integer of 1 to (5−p); and s is an integer of 1 to (9−p).)

摘要翻译： 提供一种正型光致抗蚀剂组合物，其含有通过将通式（1）或（2）表示的芳族化合物（A）与脂肪族醛（B）缩合制备的酚醛清漆型酚醛树脂（C）作为必要成分。 该正性光致抗蚀剂组合物同时具有高灵敏度和高耐热性，并且适合用作例如IC和LSI等半导体器件的制造中的正性光致抗蚀剂，LCD等显示器的制造和 印版的制造。 （式中，R 1，R 2，R 3各自独立地表示碳原子数1〜8的烷基，m，n，p分别为0〜4的整数，q为1〜 p）; s为1〜（9-p）的整数。）

公开(公告)号：US08846297B2

公开(公告)日：2014-09-30

申请号：US14110311

申请日：2012-04-10

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/039 ,  C08G8/08 ,  C08G8/12 ,  C08L61/06 ,  C08G8/20 ,  C09D161/06 ,  G03F7/021 ,  G03F7/023

CPC分类号： G03F7/039 ,  C08G8/08 ,  C08G8/12 ,  C08G8/20 ,  C08L61/06 ,  C08L2205/02 ,  C09D161/06 ,  G03F7/0233 ,  G03F7/0236

摘要： A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1) [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2)

摘要翻译： 相对于100质量份的甲酚酚醛清漆树脂（A），正型光致抗蚀剂组合物包含3〜80质量份酚醛清漆型酚醛树脂（B）。 酚醛清漆型酚醛树脂（B）具有式（1）所示的重复结构单元[式中，R表示氢原子或碳原子数1〜12的烃基，X表示由式（1）表示的结构（x1） 2）

公开(公告)号：US20130338329A1

公开(公告)日：2013-12-19

申请号：US14003317

申请日：2012-03-05

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： C08F122/14 ,  C07C57/42

CPC分类号： C08F122/14 ,  C07C57/42 ,  C07C69/54 ,  C08F20/20 ,  C08F222/1006

摘要： An object of the present invention is to provide a radically curable compound which produces cured products with excellent heat resistance, and in order to achieve the object, the present invention provides a radically curable compound represented by general formula (1) below. (In the formula, R1 and R2 are each independently an alkyl group having 1 to 8 carbon atoms, R3 and R4 are each independently a hydrogen atom or a methyl group, m and n are each independently an integer of 1 to 4, and X is an aromatic hydrocarbon group or an aromatic hydrocarbon group substituted by an alkyl group having 1 to 8 carbon atoms.)

摘要翻译： 本发明的目的是提供一种能够产生耐热性优异的固化物的自由基固化性化合物，为了达到上述目的，本发明提供由下述通式（1）表示的自由基固化性化合物。 （式中，R 1和R 2各自独立地为碳原子数1〜8的烷基，R 3和R 4各自独立地为氢原子或甲基，m和n各自独立地为1〜4的整数，X 是由碳原子数1〜8的烷基取代的芳香族烃基或芳香族烃基。）

公开(公告)号：US20130244174A1

公开(公告)日：2013-09-19

申请号：US13884788

申请日：2011-10-25

申请人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

发明人： Tomoyuki Imada ,  Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/004

CPC分类号： G03F7/004 ,  C08G8/04 ,  C08G8/20 ,  C08L61/12 ,  G03F7/0236

摘要： Provided is a positive photoresist composition containing, as an essential component, a novolac phenolic resin (C) prepared by condensing an aromatic compound (A) represented by general formula (1) or (2) with an aliphatic aldehyde (B). This positive photoresist composition has high sensitivity and high heat resistance at the same time, and is suitable for use as a positive photoresist in, for example, the manufacture of semiconductor devices such as ICs and LSIs, the manufacture of displays such as LCDs, and the manufacture of printing plates. (In the formulas, R1, R2, and R3 are each independently an alkyl group having 1 to 8 carbon atoms; m, n, and p are each independently an integer of 0 to 4; q is an integer of 1 to (5−p); and s is an integer of 1 to (9−p).)

摘要翻译： 本发明提供一种正型光致抗蚀剂组合物，其含有通过将通式（1）或（2）表示的芳族化合物（A）与脂肪族醛（B）缩合而制备的酚醛清漆型酚醛树脂（C）作为必要成分。 该正性光致抗蚀剂组合物同时具有高灵敏度和高耐热性，并且适合用作例如IC和LSI等半导体器件的制造中的正性光致抗蚀剂，LCD等显示器的制造和 印版的制造。 （式中，R 1，R 2，R 3各自独立地表示碳原子数1〜8的烷基，m，n，p分别为0〜4的整数，q为1〜 p）; s为1〜（9-p）的整数。）

公开(公告)号：US08632946B2

公开(公告)日：2014-01-21

申请号：US13884807

申请日：2011-10-25

申请人： Takakazu Kage ,  Norifumi Imaizumi

发明人： Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/039

CPC分类号： G03F7/004 ,  C08G8/12 ,  C08G8/24 ,  C08L61/06 ,  C08L61/12 ,  G03F7/0236

摘要： Provided is a positive photoresist composition containing a cresol novolac resin (A) manufactured using m-cresol, p-cresol, and formaldehyde as essential raw materials and a novolac phenolic resin (B) manufactured using o-cresol, resorcinol, and formaldehyde as essential raw materials. This positive photoresist composition has high sensitivity and high heat resistance at the same time, which have so far been difficult to achieve at the same time, at a higher level and is suitable for use as a resist in, for example, the manufacture of semiconductor devices such as ICs and LSIs, which have required formation of finer patterns with the increasing packing density in recent years, the manufacture of displays such as LCDs, and the manufacture of printing plates.

摘要翻译： 提供含有使用间甲酚，对甲酚和甲醛作为必须原料制造的甲酚酚醛清漆树脂（A）和使用邻甲酚，间苯二酚和甲醛制备的酚醛清漆酚醛树脂（B）的正性光致抗蚀剂组合物 原料。 该正性光致抗蚀剂组合物同时具有高灵敏度和高耐热性，这在目前为止难以同时达到较高水平，并且适合用作例如半导体制造中的抗蚀剂 诸如IC和LSI的装置，近年来需要形成更加细密的图案，包装密度增加，LCD等显示器的制造和印版的制造。

公开(公告)号：US20130224655A1

公开(公告)日：2013-08-29

申请号：US13884807

申请日：2011-10-25

申请人： Takakazu Kage ,  Norifumi Imaizumi

发明人： Takakazu Kage ,  Norifumi Imaizumi

IPC分类号： G03F7/004

CPC分类号： G03F7/004 ,  C08G8/12 ,  C08G8/24 ,  C08L61/06 ,  C08L61/12 ,  G03F7/0236

摘要： Provided is a positive photoresist composition containing a cresol novolac resin (A) manufactured using m-cresol, p-cresol, and formaldehyde as essential raw materials and a novolac phenolic resin (B) manufactured using o-cresol, resorcinol, and formaldehyde as essential raw materials. This positive photoresist composition has high sensitivity and high heat resistance at the same time, which have so far been difficult to achieve at the same time, at a higher level and is suitable for use as a resist in, for example, the manufacture of semiconductor devices such as ICs and LSIs, which have required formation of finer patterns with the increasing packing density in recent years, the manufacture of displays such as LCDs, and the manufacture of printing plates.

摘要翻译： 提供含有使用间甲酚，对甲酚和甲醛作为必须原料制造的甲酚酚醛清漆树脂（A）和使用邻甲酚，间苯二酚和甲醛制备的酚醛清漆酚醛树脂（B）的正性光致抗蚀剂组合物 原料。 该正性光致抗蚀剂组合物同时具有高灵敏度和高耐热性，这在目前为止难以同时达到较高水平，并且适合用作例如半导体制造中的抗蚀剂 诸如IC和LSI的装置，近年来需要形成更加细密的图案，包装密度增加，LCD等显示器的制造和印版的制造。