摘要:
A spin transport device is provided, which includes a channel comprised of a semiconductor material, a magnetization fixed layer arranged on the channel via a first insulating layer, a magnetization free layer arranged on the channel via a second insulating layer, and first and second electrodes arranged on the channel, wherein carrier densities of a first region of the channel including a contact surface with the first insulating layer, a second region of the channel including a contact surface with the second insulating layer, a third region of the channel including an opposite surface to the first electrode, and a fourth region of the channel including an opposite surface to the second electrode are higher than an average carrier density of the whole channel. Accordingly, a spin transport device that can realize good spin transportation and electric resistance characteristics while suppressing the scattering of spin can be provided.
摘要:
A spin transport device which comprises a channel, first and second insulating layers, a magnetization fixed layer, a magnetization free layer, first and second wirings, and satisfies at least one of following conditions A and B, Condition A: The first wiring includes a vertical portion which extends in a thickness direction of the magnetization fixed layer on the magnetization fixed layer, and a horizontal portion which extends from the vertical portion that is apart from the magnetization fixed layer side in a direction crossing the thickness direction of the magnetization fixed layer, and Condition B: The second wiring includes a vertical portion which extends in a thickness direction of the magnetization free layer on the magnetization free layer, and a horizontal portion which extends from the vertical portion that is apart from the magnetization free layer side in a direction crossing the thickness direction of the magnetization free layer.
摘要:
A spin transport device is provided, which includes a channel comprised of a semiconductor material, a magnetization fixed layer arranged on the channel via a first insulating layer, a magnetization free layer arranged on the channel via a second insulating layer, and first and second electrodes arranged on the channel, wherein carrier densities of a first region of the channel including a contact surface with the first insulating layer, a second region of the channel including a contact surface with the second insulating layer, a third region of the channel including an opposite surface to the first electrode, and a fourth region of the channel including an opposite surface to the second electrode are higher than an average carrier density of the whole channel. Accordingly, a spin transport device that can realize good spin transportation and electric resistance characteristics while suppressing the scattering of spin can be provided.
摘要:
A spin transport device which comprises a channel, first and second insulating layers, a magnetization fixed layer, a magnetization free layer, first and second wirings, and satisfies at least one of following conditions A and B, Condition A: The first wiring includes a vertical portion which extends in a thickness direction of the magnetization fixed layer on the magnetization fixed layer, and a horizontal portion which extends from the vertical portion that is apart from the magnetization fixed layer side in a direction crossing the thickness direction of the magnetization fixed layer, and Condition B: The second wiring includes a vertical portion which extends in a thickness direction of the magnetization free layer on the magnetization free layer, and a horizontal portion which extends from the vertical portion that is apart from the magnetization free layer side in a direction crossing the thickness direction of the magnetization free layer.
摘要:
An object of the present invention is to provide a silicon spin transport device manufacturing method and silicon spin transport device whereby improved voltage output characteristics can be obtained. The silicon spin transport device manufacturing method comprises: a first step of patterning a silicon film by wet etching and forming a silicon channel layer; and a second step of forming a magnetization free layer and a magnetization fixed layer, which are apart from each other, on the silicon channel layer.
摘要:
A magnetic storage device is provided which has significantly reduced power consumption. The magnetic storage device includes: a yoke which is arranged so as to cover part of a line extending in an arbitrary direction; and a magneto-resistive element which is arranged near the line and is capable of writing information using a field occurring from the line. The magnetic storage device is set to satisfy the equation Iw≦a·R+b, where Iw is the write current necessary for the line, R is the magnetoresistance of the yoke, a (mA·H)=7.5E−11, and b (mA)=0.1.
摘要:
A magnetic storage device with a significant reduction in power consumption. The magnetic storage device includes: a yoke which is arranged to cover part of a line extending in an arbitrary direction; and a magneto-resistive element which is arranged in contact with the yoke, thereby forming a closed magnetic circuit. The magneto-resistive element is capable of writing information with a field emanating from the yoke. The magnetic storage device satisfies Iw≦a·R, where R is the magnetoresistance of the yoke, Iw is the write current necessary for the line, and a (mA·H)=6E−11.
摘要:
A magnetic storage device is provided which has significantly reduced power consumption. The magnetic storage device includes: a yoke which is arranged so as to cover part of a line extending in an arbitrary direction; and a magneto-resistive element which is arranged near the line and is capable of writing information using a field occurring from the line. The magnetic storage device is set to satisfy the equation Iw≦a·R+b, where Iw is the write current necessary for the line, R is the magnetoresistance of the yoke, a (mA·H)=7.5E−11, and b (mA)=0.1.
摘要:
A magnetic storage device with a significant reduction in power consumption. The magnetic storage device includes: a yoke which is arranged to cover part of a line extending in an arbitrary direction; and a magneto-resistive element which is arranged in contact with the yoke, thereby forming a closed magnetic circuit. The magneto-resistive element is capable of writing information with a field emanating from the yoke. The magnetic storage device satisfies Iw≦a·R, where R is the magnetoresistance of the yoke, Iw is the write current necessary for the line, and a (mA·H)=6E−11.
摘要:
A spin transport device includes a semiconductor layer 3, a first ferromagnetic layer 1 provided on the semiconductor layer 3 via a first tunnel barrier layer 5A, and a second ferromagnetic layer 2 provided on the semiconductor layer 3 via a second tunnel barrier layer 5B to be spaced from the first ferromagnetic layer 1, and the semiconductor layer 3 includes a first region RI broadening in a direction away from the first ferromagnetic layer 1 along a direction orthogonal to a thickness direction from the first ferromagnetic layer 1, and a second region R12 extending in a direction toward the second ferromagnetic layer 2 along the direction orthogonal to the thickness direction from the first ferromagnetic layer 1. The second region R12 has a relatively higher impurity concentration than the first region R1.