公开(公告)号：US5338062A

公开(公告)日：1994-08-16

申请号：US942822

申请日：1992-09-10

申请人： Toru Kiuchi ,  Kenji Ogata ,  Masakazu Chiba ,  Toshiaki Matsuhashi ,  Masahiro Taguchi ,  Motonori Tominaga

发明人： Toru Kiuchi ,  Kenji Ogata ,  Masakazu Chiba ,  Toshiaki Matsuhashi ,  Masahiro Taguchi ,  Motonori Tominaga

IPC分类号： G01P15/00 ,  B60R21/00 ,  B60R21/01 ,  B60R21/0132 ,  B60R21/0136 ,  B60R21/16 ,  B60R21/20 ,  B60R21/32

CPC分类号： B60R21/0132 ,  B60R2021/0006

摘要： A side collision sensor system for a side airbag apparatus for inflating an airbag between a side door or inner side wall and a passenger of a vehicle, when a transverse collision is detected, to protect the passenger against a secondary collision. The side collision sensor system comprises: a side collision sensor arranged on the side of a vehicle body for outputting a collision detection signal, if it is compressed by a force of a predetermined or higher strength; and an acceleration sensor attached to an arbitrary portion of the vehicle body for outputting a collision detection signal if an acceleration applied sideways to the vehicle body has a predetermined or higher level. The side airbag is inflated if at least one of the side collision sensor and the acceleration sensor outputs its collision detection signal.

摘要翻译： 一种用于在检测到横向碰撞时在侧门或内侧壁与车辆的乘客之间使气囊膨胀的侧面碰撞传感器系统，以保护乘客免受二次碰撞。 侧面碰撞传感器系统包括：侧部碰撞传感器，其布置在车身侧面，用于输出碰撞检测信号，如果它被预定或更高强度的力压缩; 以及附加到车体的任意部分的加速度传感器，用于如果向车身侧向施加的加速度具有预定的或更高的水平，则输出碰撞检测信号。 如果侧面碰撞传感器和加速度传感器中的至少一个输出其碰撞检测信号，则侧面安全气囊被充气。

公开(公告)号：US5392024A

公开(公告)日：1995-02-21

申请号：US897750

申请日：1992-06-12

申请人： Toru Kiuchi ,  Kenji Ogata ,  Masakazu Chiba ,  Makoto Shiota

发明人： Toru Kiuchi ,  Kenji Ogata ,  Masakazu Chiba ,  Makoto Shiota

IPC分类号： B60R21/01 ,  B60Q1/00

CPC分类号： B60R21/0136

摘要： A collision detection system utilizing a set of primary sensors and a secondary sensor. When a sufficient collision load is applied to the sensors, the sensors output a signal. The primary sensors are constructed to be more sensitive than the secondary sensor. Based on the outputs of the primary and secondary sensors, a control unit detects the collision. Upon detecting the collision, the control unit outputs a collision detection signal which activates a protection device, such as an air bag.

摘要翻译： 利用一组主传感器和二次传感器的碰撞检测系统。 当传感器施加足够的碰撞载荷时，传感器输出信号。 主传感器被构造成比次传感器更敏感。 基于主传感器和次传感器的输出，控制单元检测到碰撞。 在检测到碰撞时，控制单元输出激活诸如安全气囊的保护装置的碰撞检测信号。

公开(公告)号：US06040096A

公开(公告)日：2000-03-21

申请号：US224061

申请日：1998-12-31

申请人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

发明人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

IPC分类号： G03F1/44 ,  G03F1/50 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G06F9/00 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7011

摘要： In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

摘要翻译： 为了在将电路图案转印到感光基板上时减少由于掩模基板的膨胀引起的掩模图案转移误差，掩模基板被松散地支撑在掩模台上的多个安装座上，使得掩模基板可以自由地响应地膨胀 其温度变化。 使用测量仪器（例如温度传感器或干涉仪）来测量表示掩模基板的膨胀量的值。 基于测量值，调整掩模基板和感光基板的对准和定位以响应于掩模版的扩展量。

公开(公告)号：US06414743B1

公开(公告)日：2002-07-02

申请号：US09420000

申请日：1999-10-18

申请人： Kenji Nishi ,  Toru Kiuchi

发明人： Kenji Nishi ,  Toru Kiuchi

IPC分类号： G03B2772

CPC分类号： G03F7/70058 ,  G03F7/70066 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/70941

摘要： An exposure method for irradiating a mask with an illumination light through an illumination optical system and exposing photosensitive substrate to the illumination light through a projection optical system including the steps of supplying gas having less absorption of the illumination light to a light path of the illumination light, at least a portion of the illumination optical system and the projection optical system; and changing an exposing condition for the photosensitive substrate in accordance with a variation in transmittance or in reflectance of at least one of the illumination optical system and the projection optical system, resulting from irradiation of the illumination light and attenuation of the illumination light in the light path.

摘要翻译： 一种用于通过照明光学系统照射具有照明光的掩模的曝光方法，并且通过投影光学系统将感光基板曝光到照明光，所述投影光学系统包括以下步骤：将具有较少的照明光吸收的气体供应到照明光的光路 ，所述照明光学系统和所述投影光学系统的至少一部分; 以及根据所述照明光的照射和所述照明光的衰减而导致的所述照明光学系统和所述投影光学系统中的至少一个的透射率的变化或反射率，改变所述感光性基板的曝光条件 路径。

公开(公告)号：US5894056A

公开(公告)日：1999-04-13

申请号：US734544

申请日：1996-10-21

申请人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

发明人： Yukio Kakizaki ,  Toru Kiuchi ,  Kesayoshi Amano ,  Toshikazu Umatate

IPC分类号： G03F1/44 ,  G03F1/50 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G06F9/00 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/707 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/70 ,  G03F9/7011

摘要： In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

公开(公告)号：US06864955B2

公开(公告)日：2005-03-08

申请号：US10361495

申请日：2003-02-11

申请人： Kenji Nishi ,  Toru Kiuchi

发明人： Kenji Nishi ,  Toru Kiuchi

IPC分类号： B23Q1/00 ,  B23Q1/26 ,  B23Q1/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  G03B27/42 ,  G03B27/60 ,  G03B27/64

CPC分类号： G03F7/70708 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70991 ,  H01L21/68

摘要： The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.

摘要翻译： 平台装置具有可移动的平台结构体，其保持待加工的基板并且能够在基体结构体上移动。 这种舞台装置包括设置在设置在所述舞台结构体的流体路径的至少一部分处的收据边缘孔口; 以及进给边缘孔口，其在所述接收边缘孔口处可拆卸地接合在基座结构体上的预定位置处，并且在所述进料边缘孔口与所述接收边缘孔口接合期间将预定流体提供或排出到接收边缘孔口。

公开(公告)号：US5289231A

公开(公告)日：1994-02-22

申请号：US992772

申请日：1992-12-18

申请人： Nobutaka Magome ,  Hiromitsu Iwata ,  Junichi Morino ,  Toru Kiuchi

发明人： Nobutaka Magome ,  Hiromitsu Iwata ,  Junichi Morino ,  Toru Kiuchi

IPC分类号： G03F7/20 ,  G11B7/26 ,  G03B27/42

CPC分类号： G11B7/261 ,  G03F7/201 ,  G03F7/70075 ,  G03F7/70358 ,  G03F7/70366

摘要： This specification discloses a method of and an apparatus for manufacturing a disc medium which utilize the projection exposure technique of a stopper for lithography, rotate a circular photosensitive substrate which provides the disc medium at the same speed as a circular reticle having a pattern of information tracks while rotating the reticle, and irradiate the reticle with illuminating light of a slit-like shape or a sectoral shape extending in the diametrical direction of the circular reticle to thereby effect rotation scan exposure.

摘要翻译： 本说明书公开了一种制造盘式介质的方法和装置，其利用用于光刻的止动器的投影曝光技术，旋转圆形感光基片，以与具有信息轨迹图案的圆形掩模版相同的速度提供光盘介质 同时旋转掩模版，并用沿着圆形掩模版的直径方向延伸的狭缝状或扇形的照明光照射光罩，从而进行旋转扫描曝光。

公开(公告)号：US06590633B1

公开(公告)日：2003-07-08

申请号：US09047222

申请日：1998-03-25

申请人： Kenji Nishi ,  Toru Kiuchi

发明人： Kenji Nishi ,  Toru Kiuchi

IPC分类号： G03B2742

CPC分类号： G03F7/70708 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70991 ,  H01L21/68

摘要： The stage apparatus can improve static and dynamic features by reducing the number of electrical wiring or tubes for air pressure disposed in a movable main stage member of a movable stage apparatus. The movable stage apparatus has a base structure body and a movable stage structure body. When the movable stage structure body is transferred on the base structure body to a position in which to exchange wafers, a receiving terminal part disposed on the movable stage structure body comes into contact with a feed terminal part disposed on the base structure body and a battery loaded on the movable stage structure body is charged with electric current supplied from the feed terminal part. When the stage structure body is apart from the position in which to exchange wafers, adsorption of the wafer loaded on the stage structure body is sustained electrically by utilizing the electricity of the battery. A control over the start of adsorption or the release thereof upon the action for exchanging wafers is effected in a wireless or wire coupler system.

摘要翻译： 舞台装置可以通过减少设置在可移动舞台装置的可移动主舞台构件中的空气压力的电线或管道的数量来改善静态和动态特征。 可动平台装置具有基座结构体和可动平台结构体。 当可移动平台结构体在基础结构体上转移到交换晶片的位置时，设置在可移动平台结构体上的接收端子部分与设置在基座结构体上的馈电端子部分接触，并且电池 装载在可动台结构体上的从馈电端子部分提供的电流充电。 当舞台结构体离开交换晶片的位置时，通过利用电池的电力，负载在舞台结构体上的晶片的吸附被电力维持。 在无线或线耦合系统中进行用于交换晶片的动作的控制开始吸附或其释放。