公开(公告)号：US5289231A

公开(公告)日：1994-02-22

申请号：US992772

申请日：1992-12-18

申请人： Nobutaka Magome ,  Hiromitsu Iwata ,  Junichi Morino ,  Toru Kiuchi

发明人： Nobutaka Magome ,  Hiromitsu Iwata ,  Junichi Morino ,  Toru Kiuchi

IPC分类号： G03F7/20 ,  G11B7/26 ,  G03B27/42

CPC分类号： G11B7/261 ,  G03F7/201 ,  G03F7/70075 ,  G03F7/70358 ,  G03F7/70366

摘要： This specification discloses a method of and an apparatus for manufacturing a disc medium which utilize the projection exposure technique of a stopper for lithography, rotate a circular photosensitive substrate which provides the disc medium at the same speed as a circular reticle having a pattern of information tracks while rotating the reticle, and irradiate the reticle with illuminating light of a slit-like shape or a sectoral shape extending in the diametrical direction of the circular reticle to thereby effect rotation scan exposure.

摘要翻译： 本说明书公开了一种制造盘式介质的方法和装置，其利用用于光刻的止动器的投影曝光技术，旋转圆形感光基片，以与具有信息轨迹图案的圆形掩模版相同的速度提供光盘介质 同时旋转掩模版，并用沿着圆形掩模版的直径方向延伸的狭缝状或扇形的照明光照射光罩，从而进行旋转扫描曝光。

公开(公告)号：US07911582B2

公开(公告)日：2011-03-22

申请号：US12010824

申请日：2008-01-30

申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.

摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。 回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

公开(公告)号：US20090015816A1

公开(公告)日：2009-01-15

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US07460207B2

公开(公告)日：2008-12-02

申请号：US11147288

申请日：2005-06-08

申请人： Hideo Mizutani ,  Nobutaka Magome

发明人： Hideo Mizutani ,  Nobutaka Magome

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.

摘要翻译： 一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。 因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

公开(公告)号：US20070263196A1

公开(公告)日：2007-11-15

申请号：US11878076

申请日：2007-07-20

申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.

摘要翻译： 光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。 该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

公开(公告)号：US20070035710A1

公开(公告)日：2007-02-15

申请号：US11583946

申请日：2006-10-20

申请人： Hiroyuki Nagasaka ,  Nobutaka Magome

发明人： Hiroyuki Nagasaka ,  Nobutaka Magome

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/709

摘要： A device manufacturing method includes the steps of providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by the substrate, the non-radiation sensitive material being at least partially transparent to radiation and being of a different material than the immersion liquid, the non-radiation sensitive material being provided over at least a part of a radiation sensitive layer of the substrate; and projecting a patterned beam of radiation, through the immersion liquid, onto a target portion of the substrate using the projection system.

摘要翻译： 一种器件制造方法，包括以下步骤：在衬底与光刻投影设备的投影系统的至少一部分之间提供浸没液体，其中非辐射敏感材料由衬底承载，非辐射敏感材料为 对辐射至少部分透明并且是与浸没液体不同的材料，所述非辐射敏感材料设置在所述基底的辐射敏感层的至少一部分上; 以及使用所述投影系统将图案化的辐射束通过所述浸没液投射到所述基板的目标部分上。

公开(公告)号：US06650421B2

公开(公告)日：2003-11-18

申请号：US09842226

申请日：2001-04-26

申请人： Nobutaka Magome

发明人： Nobutaka Magome

IPC分类号： G01B902

CPC分类号： G03F7/706 ,  G01M11/0264 ,  G01M11/0271

摘要： In an interferometer for detecting interference light between light flux passed through an object to be inspected and reference light to be generated from a portion of the light flux passed therethrough, a phase of the interference light is detected with high precision. The light flux passed through the optical system to be inspected forms a spot image on a pinhole formed in a plate. Measuring light from the spot image and the reference-light diffracted out of the light flux from the spot image at the pinhole create interference light which in turn is received by an observation system. An image of interference fringes formed by the interference light is taken with an image pickup element. Further, heterodyne interference light is created by vibrating the plate in the direction intersecting the light flux or in the direction along the light path of the light flux, thereby detecting a phase of each portion of the interference fringes with high precision.

摘要翻译： 在用于检测通过待检测物体的光通量和从通过的光束的一部分产生的参考光之间的干涉光的干涉仪中，以高精度检测干涉光的相位。 通过要检查的光学系统的光通量在形成在板上的针孔上形成斑点图像。 从斑点图像测量光和从针孔处的斑点图像衍射出的光通量的参考光产生干涉​​光，而干涉光又由观察系统接收。 由摄像元件拍摄由干涉光形成的干涉条纹的图像。 此外，通过在与光束相交的方向或沿着光束的光路的方向振动板来产生外差干涉光，从而以高精度检测干涉条纹的每个部分的相位。

公开(公告)号：US06583853B1

公开(公告)日：2003-06-24

申请号：US09435367

申请日：1999-11-08

申请人： Nobutaka Magome ,  Osamu Furukawa

发明人： Nobutaka Magome ,  Osamu Furukawa

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558

摘要： A method of obtaining an optimum exposure condition of a step-and-scan exposure apparatus, the step-and-scan exposure apparatus synchronously moving a mask and a substrate relative to an illumination light to transfer a pattern of the mask onto a plurality of shot areas on the substrate, the method comprising the steps of determining an unevenness of an illuminance of the illumination light, adjusting the illumination light to change the illuminance within a predetermined range, inputting a plurality of first exposure conditions into the step-and-scan exposure apparatus, testing the plurality of first exposure condition in a step-and-repeat mode.

摘要翻译： 一种获得逐步扫描曝光装置的最佳曝光条件的方法，所述步进扫描曝光装置相对于照明光同步移动掩模和基板，以将掩模的图案转印到多个拍摄 所述方法包括以下步骤：确定所述照明光的照度的不均匀性，调整照明光以将照度改变在预定范围内，将多个第一曝光条件输入到所述逐步扫描曝光中 装置，以逐步重复模式测试多个第一曝光条件。

公开(公告)号：US06356343B1

公开(公告)日：2002-03-12

申请号：US09366565

申请日：1999-08-04

申请人： Naomasa Shiraishi ,  Nobutaka Magome

发明人： Naomasa Shiraishi ,  Nobutaka Magome

IPC分类号： G03B2742

CPC分类号： G03F9/70 ,  G03F9/00

摘要： A mark for position detection formed on a substrate has a first pattern disposed near the center of the mark and having periodicity in a Y-axis direction, and second patterns respectively disposed near both sides of the first pattern in an X-axis direction and each having periodicity in the X-axis direction. The position of the first pattern is detected by aligning the detection center of a detecting optical system, that is, the minimal aberration point of the detecting optical system, with the center of the first pattern. The positions of the second patterns are detected at respective points symmetric with respect to the minimal aberration point, and the detected values for the positions of the second patterns are averaged. An apparatus for detecting the mark for position detection detects the first and second patterns by image processing when the mark is in a stationary state.

摘要翻译： 在基板上形成的用于位置检测的标记具有设置在标记中心附近并具有Y轴方向的周期性的第一图案，以及分别设置在X轴方向上的第一图案的两侧附近的第二图案， 具有X轴方向的周期性。 通过将检测光学系统的检测中心即检测光学系统的最小像差点与第一图案的中心对准来检测第一图案的位置。 在相对于最小像差点对称的各个点处检测第二图案的位置，并且对第二图案的位置的检测值进行平均。 用于检测位置检测标记的装置在标记处于静止状态时通过图像处理检测第一和第二图案。

公开(公告)号：US06319641B2

公开(公告)日：2001-11-20

申请号：US09730590

申请日：2000-12-07

申请人： Nobutaka Magome

发明人： Nobutaka Magome

IPC分类号： G03F900

CPC分类号： G03F7/70358 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/70733 ,  G03F9/70

摘要： A mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously. In global alignment of the mask and the wafer, the scanning direction in the present (second layer) scanning exposure is made coincident with the scanning direction in the preceding (first layer) scanning exposure. When alignment is made by calculating shot array coordinates in advance, shot array coordinates are calculated for each scanning direction.

摘要翻译： 掩模图案通过用掩模台曝光并且晶片台同步移动而转印到晶片上。 在掩模和晶片的全局对准中，使得当前（第二层）扫描曝光中的扫描方向与先前（第一层）扫描曝光中的扫描方向一致。 通过预先计算射击阵列坐标进行对准时，针对每个扫描方向计算射击阵列坐标。