公开(公告)号：US20070029200A1

公开(公告)日：2007-02-08

申请号：US11498727

申请日：2006-08-04

申请人： Toshiaki Sakamoto ,  Masaru Sakamoto ,  Yoshinori Hirahara ,  Tsutomu Shigenaga

发明人： Toshiaki Sakamoto ,  Masaru Sakamoto ,  Yoshinori Hirahara ,  Tsutomu Shigenaga

IPC分类号： C25B7/00 ,  C25D13/00

CPC分类号： C25D13/02 ,  C25D13/10 ,  C25D13/12

摘要： The present invention relates to a cationic electrodeposition coating composition comprising silica particles having pore volume of 0.44 to 1.8 ml/g and average particle size of no more than 10 μm, the composition showing square root of diffusion coefficient (√Tc) of no less than 2.5 upon diffusing a solution onto a coating film therewith; a cationic electrodeposition coating composition comprising silica particles having pore volume of 0.44 to 1.8 ml/g and average particle size of no more than 10 μm, wherein the composition shows minimum deposition pH of 11.90 to 12.00 during electrodeposition coating, and film resistance of 1,000 to 1,500 kΩ·cm2 at film thickness of 15 μm and applied voltage of 240 V; and an article coated with such cationic electrodeposition coating composition. Therefore, the present invention can also provide a coating film formed with the cationic electrodeposition coating composition which can ensure higher corrosion resistance and higher throwing power in addition to other excellent coating properties, even if the resulting coating has extremely thin film thickness (e.g., about 7 μm).

摘要翻译： 本发明涉及一种阳离子电沉积涂料组合物，其包含孔体积为0.44〜1.8ml / g，平均粒径为10μm以下的二氧化硅粒子，扩散系数平方根（√Tc）的组成不小于 将溶液扩散到其上的涂膜上; 包含孔体积为0.44〜1.8ml / g，平均粒径为10μm以下的二氧化硅粒子的阳离子电沉积涂料组合物，其中组合物在电沉积涂布期间显示最小沉积pH为11.90至12.00，膜电阻为1000〜 薄膜厚度为15μm，施加电压为240V时为1500kOgg·cm 2·2; 和涂有这种阳离子电沉积涂料组合物的制品。 因此，本发明还可以提供一种形成有阳离子电沉积涂料组合物的涂膜，除了其它优异的涂料性能外，还可以确保更高的耐腐蚀性和更高的抛光力，即使所得到的涂层具有非常薄的膜厚度（例如约 7个妈妈）。

公开(公告)号：US20140090244A1

公开(公告)日：2014-04-03

申请号：US14116256

申请日：2012-03-08

申请人： Masaru Sakamoto

发明人： Masaru Sakamoto

IPC分类号： H05K3/30 ,  H05K3/00

CPC分类号： H05K3/301 ,  H05K3/0008 ,  H05K13/0452 ,  H05K13/08 ,  H05K13/085 ,  Y10T29/4913 ,  Y10T29/49778

摘要： The present invention relates to a setup method for deciding component feeding apparatuses to be attached to each of mounting machines in a component mounting system. The setup method includes a first step of deciding component feeding apparatuses to be attached to each of the mounting machines based on substrate data defining components to be mounted by each of the mounting machines; a second step of determining whether or not there is within the components included in the substrate data a sole mounted component to be mounted by only one mounting machine among the multiple mounting machines; and a third step of deciding, when the determination is made that the sole mounted component exists, to attach component feeding apparatuses feeding the sole mounted component or an alternative component capable of replacing the sole mounted component onto at least one mounting machine other than the only one mounting machine.

摘要翻译： 本发明涉及一种用于在部件安装系统中确定要安装到每个安装机上的部件供给装置的设置方法。 该设置方法包括：第一步骤，基于基于定义要由每个安装机器安装的部件的基板数据来确定要附接到每个安装机器的部件供给装置; 确定在所述多个安装机中仅由一个安装机安装的唯一安装部件中是否存在包括在所述基板数据中的部件内的第二步骤; 以及第三步骤，当确定存在唯一安装的部件时，将馈送鞋底安装部件的部件进给装置或能够将唯一安装的部件替换到除了唯一安装部件之外的至少一个安装机器的替代部件 一台安装机。

公开(公告)号：US20140001039A1

公开(公告)日：2014-01-02

申请号：US14004289

申请日：2012-07-06

申请人： Tomoya Tamura ,  Masaru Sakamoto

发明人： Tomoya Tamura ,  Masaru Sakamoto

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  B22D11/004 ,  C22C9/00 ,  C22F1/00 ,  C22F1/08

摘要： The purpose of the invention is to provide a sputtering target formed from a Cu—Ga alloy having a Ga composition of 29 at % or more.[Problem] Since a Cu—Ga alloy becomes a brittle γ phase-single phase structure when the Ga composition becomes 29 at % or more, it cannot be subject to processes such as rolling and forging. Accordingly, the crystal grain size of the cast structure must be small and uniform so that the cast structure can be used as is.[Solution] It is possible to produce a melted and cast Cu—Ga alloy sputtering target containing 29 to 42.6 at % of Ga, and remainder being Cu and unavoidable impurities by continuously solidifying the Cu—Ga alloy sputtering target under solidifying conditions of a constant cooling rate or higher, wherein an average crystal grain size of a sputter front face is 3 mm or less, and a cross section structure of the target is a columnar structure that has grown in a direction from the sputter front face toward a center plane which is parallel to a sputter face.

摘要翻译： 本发明的目的是提供一种由Ga组成为29原子％以上的Cu-Ga合金形成的溅射靶。 [问题]由于当Ga成分为29原子％以上时，Cu-Ga合金成为脆性γ相 - 单相结构，因此不能进行轧制和锻造等工序。 因此，铸造结构的晶粒尺寸必须小且均匀，从而可以直接使用铸造结构。 [解决方案]通过在恒定的固化条件下连续固化Cu-Ga合金溅射靶，可以制造含有29〜42.6at％的Ga的熔融铸造的Cu-Ga合金溅射靶，余量为Cu和不可避免的杂质 冷却速度或更高，其中溅射前面的平均晶粒尺寸为3mm以下，靶的截面结构是在从溅射前面朝向中心面的方向上生长的柱状结构， 平行于溅射面。

公开(公告)号：US20130037408A1

公开(公告)日：2013-02-14

申请号：US13504329

申请日：2011-07-07

申请人： Yousuke Endo ,  Masaru Sakamoto

发明人： Yousuke Endo ,  Masaru Sakamoto

IPC分类号： C23C14/06 ,  B23P17/00 ,  C23C14/34

CPC分类号： C23C14/3414 ,  H01J37/3414 ,  H01J37/3426 ,  Y10T29/49991

摘要： The present invention provides an indium target and manufacturing method thereof, where deposition rate is high, initial discharge voltage is low, and deposition rate and discharge voltage, from the start of sputtering to the end of sputtering, are stable. In the indium target, an aspect ratio (length of longer direction/length of shorter direction) of crystal particle, observed from cross-section direction of the target, is 2.0 or less.

摘要翻译： 本发明提供了一种铟靶及其制备方法，其沉积速率高，初始放电电压低，并且从溅射开始到溅射结束时的沉积速率和放电电压都是稳定的。 在铟靶中，从靶的截面方向观察到的结晶粒子的长径比（长度方向/长度方向的长度）为2.0以下。

公开(公告)号：US20120224269A1

公开(公告)日：2012-09-06

申请号：US13407297

申请日：2012-02-28

申请人： Masaru Sakamoto

发明人： Masaru Sakamoto

IPC分类号： G02B15/10

CPC分类号： G02B15/17 ,  G02B13/22 ,  G02B15/10

摘要： A zoom lens includes, in order from an object side to an image side, a first lens unit having a positive refractive power, which does not move for zooming, a second lens unit having a negative refractive power, which moves during zooming, a third lens unit having a negative refractive power, which moves during zooming, an aperture stop, and a fourth lens unit having a positive refractive power, which does not move for zooming. The fourth lens unit includes a first lens sub-unit, a focal length conversion optical system configured to be inserted into or removed from an optical path, and a second lens sub-unit. A focal length of the second lens sub-unit, a distance from the aperture stop to a lens surface at the most object side of the second lens sub-unit, and an F-number of the entire zoom lens at a wide-angle end are appropriately set.

摘要翻译： 变焦透镜从物体侧到像侧依次包括具有正折射力的第一透镜单元，其不具有用于变焦的移动功能，具有在变焦期间移动的具有负折光力的第二透镜单元， 具有负折射力的透镜单元，其在变焦期间移动，孔径光阑和具有正折射力的第四透镜单元，其不能移动用于变焦。 第四透镜单元包括第一透镜子单元，被配置为插入到光路中或从光路移除的焦距转换光学系统和第二透镜子单元。 第二透镜子单元的焦距，从孔径光阑到第二透镜子单元的最物体侧的透镜表面的距离，以及广角端的变焦透镜整体的F数 适当设定。

公开(公告)号：US08021837B2

公开(公告)日：2011-09-20

申请号：US11361316

申请日：2006-02-24

申请人： Daniel Pinkel ,  Joe W Gray ,  Anne Kallioniemi ,  Ollie-Pekka Kallioniemi ,  Frederic Waldman ,  Masaru Sakamoto

发明人： Daniel Pinkel ,  Joe W Gray ,  Anne Kallioniemi ,  Ollie-Pekka Kallioniemi ,  Frederic Waldman ,  Masaru Sakamoto

IPC分类号： C12Q1/68 ,  G01N33/566 ,  G01N33/53 ,  C07H21/02 ,  C07H21/04

CPC分类号： C12Q1/6809 ,  C12Q1/6841 ,  C12Q1/6886 ,  C12Q2600/156 ,  G06F15/025 ,  Y10S436/813 ,  C12Q2545/114 ,  C12Q2537/157

摘要： Disclosed are new methods comprising the use of in situ hybridization to detect abnormal nucleic acid sequence copy numbers in one or more genomes wherein repetitive sequences that bind to multiple loci in a reference chromosome spread are either substantially removed and/or their hybridization signals suppressed. The invention termed Comparative Genomic Hybridization (CGH) provides for methods of determining the relative number of copies of nucleic acid sequences in one or more subject genomes or portions thereof (for example, a tumor cell) as a function of the location of those sequences in a reference genome (for example, a normal human genome). The intensity(ies) of the signals from each labeled subject nucleic acid and/or the differences in the ratios between different signals from the labeled subject nucleic acid sequences are compared to determine the relative copy numbers of the nucleic acid sequences in the one or more subject genomes as a function of position along the reference chromosome spread. Amplifications, duplications and/or deletions in the subject genome(s) can be detected. Also provided is a method of determining the absolute copy numbers of substantially all RNA or DNA sequences in subject cell(s) or cell population(s).

摘要翻译： 公开了包括使用原位杂交来检测一个或多个基因组中的异常核酸序列拷贝数的新方法，其中结合参考染色体扩增的多个基因座的重复序列基本上被去除和/或其杂交信号被抑制。 称为比较基因组杂交（CGH）的发明提供了确定一个或多个受试者基因组或其部分（例如肿瘤细胞）中核酸序列的相对拷贝数的方法，作为这些序列的位置的函数 参考基因组（例如，正常人类基因组）。 比较来自每个标记的对象核酸的信号的强度和/或来自标记的目标核酸序列的不同信号之间的比率差异，以确定一个或多个核酸序列中核酸序列的相对拷贝数 主题基因组作为沿着参考染色体扩散的位置的函数。 可以检测主题基因组中的扩增，重复和/或缺失。 还提供了确定受试细胞或细胞群体中基本上所有RNA或DNA序列的绝对拷贝数的方法。

公开(公告)号：US20110080652A1

公开(公告)日：2011-04-07

申请号：US12895575

申请日：2010-09-30

申请人： Hiroki Nakayama ,  Chiaki Inoue ,  Masaru Sakamoto

发明人： Hiroki Nakayama ,  Chiaki Inoue ,  Masaru Sakamoto

IPC分类号： G02B15/167

CPC分类号： G02B15/173 ,  G02B13/009

摘要： A zoom lens includes, in order from an object side to an image side and arranged along an optical axis, first to fifth lens units having positive, negative, positive, positive or negative, and positive refractive power, respectively. When zooming, the second lens unit moves monotonically to the image side, the third lens unit moves to the object side in a convex locus, the fifth lens unit moves nonlinearly, and the first and fourth lens units do not move. The fourth lens unit includes a first sub lens unit and a second sub lens unit; the first sub lens unit is an image-stabilizing lens unit that includes a first lens having negative refractive power and a second lens having positive or negative refractive power. The focal length of the fourth lens unit, the focal length of the entire system at the wide-angle end, the Abbe numbers of the materials of the first and second lenses are set appropriately based on predetermined conditions.

摘要翻译： 变焦透镜从物体侧到像侧依次沿光轴布置，分别具有正，负，正，正或负和正屈光力的第一至第五透镜单元。 当变焦时，第二透镜单元单调地移动到图像侧，第三透镜​​单元以凸形轨迹移动到物体侧，第五透镜单元非线性移动，第一和第四透镜单元不移动。 第四透镜单元包括第一子透镜单元和第二子透镜单元; 第一子透镜单元是包括具有负折光力的第一透镜和具有正或负折射光焦度的第二透镜的图像稳定透镜单元。 基于预定条件适当地设置第四透镜单元的焦距，广角端处的整个系统的焦距，第一和第二透镜的材料的阿贝数。

公开(公告)号：US20090290230A1

公开(公告)日：2009-11-26

申请号：US12467956

申请日：2009-05-18

申请人： Tsuyoshi Wakazono ,  Ryuji Nurishi ,  Masaru Sakamoto ,  Masakazu Kodaira

发明人： Tsuyoshi Wakazono ,  Ryuji Nurishi ,  Masaru Sakamoto ,  Masakazu Kodaira

IPC分类号： G02B15/16

CPC分类号： G02B15/173 ,  G02B27/646

摘要： A zoom lens system includes four lens units each having positive, negative, negative and positive refractive powers in the stated order from an object side to an image side. A first lens unit includes a variable apex angle prism on the image side of at least one lens element. In this zoom lens system, a focal length of the first lens unit and imaging magnifications of a second lens unit and a fourth lens unit are set appropriately so as to suppress occurrence of decentering aberration accompanying a variation of a prism apex angle.

摘要翻译： 变焦透镜系统包括四个透镜单元，每个透镜单元具有从物体侧到像侧的所述顺序的正，负，负和正折射力。 第一透镜单元包括至少一个透镜元件的像侧上的可变顶角棱镜。 在该变焦透镜系统中，适当地设定第一透镜单元的焦距和第二透镜单元和第四透镜单元的成像倍率，以抑制伴随棱镜顶角的变化的偏心像差的发生。

公开(公告)号：US06387815B2

公开(公告)日：2002-05-14

申请号：US08914226

申请日：1997-08-19

申请人： Masaru Sakamoto

发明人： Masaru Sakamoto

IPC分类号： H01L21302

CPC分类号： H01L21/76251

摘要： A method of manufacturing a semiconductor substrate includes the steps of laminating a first substrate having a single-crystal semiconductor region with a second substrate having an insulator region, and selectively removing the portion of the first substrate of the laminated substrates where lamination strength is weak.

摘要翻译： 一种制造半导体衬底的方法包括以下步骤：将具有单晶半导体区域的第一衬底与具有绝缘体区域的第二衬底层压，并且选择性地去除叠层衬底的第一衬底的部分，其中层压强度较弱。

公开(公告)号：US06344315B1

公开(公告)日：2002-02-05

申请号：US08477316

申请日：1995-06-07

申请人： Joe W. Gray ,  Daniel Pinkel ,  Olli-Pekka Kallioniemi ,  Anne Kallioniemi ,  Masaru Sakamoto

发明人： Joe W. Gray ,  Daniel Pinkel ,  Olli-Pekka Kallioniemi ,  Anne Kallioniemi ,  Masaru Sakamoto

IPC分类号： C12Q168

CPC分类号： C12Q1/6841 ,  C12Q1/6886 ,  C12Q2563/107 ,  C12Q2563/131 ,  C12Q2525/151

摘要： Methods and compositions for staining based upon nucleic acid sequence that employ nucleic acid probes are provided. Said methods produce staining patterns that can be tailored for specific cytogenetic analyses. Said probes are appropriate for in situ hybridization and stain both interphase and metaphase chromosomal material with reliable signals. The nucleic acid probes are typically of a complexity greater than 50 kb, the complexity depending upon the cytogenetic application. Methods and reagents are provided for the detection of genetic rearrangements. Probes and test kits are provided for use in detecting genetic rearrangements, particularly for use in tumor cytogenetics, in the detection of disease related loci, specifically cancer, such as chronic myelogenous leukemia (CML), retinoblastoma, ovarian and uterine cancers, and for biological dosimetry. Methods and reagents are described for cytogenetic research, for the differentiation of cytogenetically similar but genetically different diseases, and for many prognostic and diagnostic applications.

摘要翻译： 提供了基于使用核酸探针的核酸序列进行染色的方法和组合物。 所述方法产生可针对特定细胞遗传学分析进行定制的染色模式。 所述探针适用于原位杂交并染色具有可靠信号的相间和中期染色体材料。 核酸探针通常具有大于50kb的复杂度，其复杂性取决于细胞遗传学应用。 提供方法和试剂用于检测遗传重排。 探针和测试试剂盒用于检测遗传重排，特别是用于肿瘤细胞遗传学，用于检测疾病相关的基因座，特别是癌症，如慢性骨髓性白血病（CML），视网膜母细胞瘤，卵巢和子宫癌，以及生物学 剂量测定 描述了细胞遗传学研究的方法和试剂，用于细胞遗传学上相似但遗传上不同的疾病的分化，以及许多预后和诊断应用。