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    Heat-resistant stretched film and production process thereof
    1.
    发明授权
    Heat-resistant stretched film and production process thereof 失效
    耐热拉伸膜及其制造方法

    公开(公告)号：US5286814A

    公开(公告)日：1994-02-15

    申请号：US690318

    申请日：1991-04-26

    申请人： Toshiya Mizuno ,  Yoshikichi Teramoto ,  Takeshi Saito ,  Juichi Wakabayashi ,  Yoshikatsu Satake ,  Ken Kashiwadate ,  Takayuki Katto

    发明人： Toshiya Mizuno ,  Yoshikichi Teramoto ,  Takeshi Saito ,  Juichi Wakabayashi ,  Yoshikatsu Satake ,  Ken Kashiwadate ,  Takayuki Katto

    IPC分类号： C08G75/02 ,  C08L81/02 ,  H05K1/03 ,  C08G75/14 ,  C08F283/00

    CPC分类号： C08G75/0245 ,  C08G75/024 ,  C08L81/02 ,  H05K1/0333

    摘要： A heat-resistant stretched film is obtained by stretching a resin composition comprising 100 parts by weight of a poly(arylene sulfide) of a substantially linear structure and 5 to less than 100 parts by weight of a melt-stable poly(arylene thioether-ketone). The poly(arylene sulfide) has a melt viscosity of at least 1,000 poises as measured at 310.degree. C. and a shear rate of 200 sec.sup.-1. The poly(arylene thioether-ketone) has predominant recurring units of the formula ##STR1## wherein the --CO-- and --S-- groups are bonded in the para position to each other through the benzene ring, and has the following physical properties (a)-(c):(a) a melting point, Tm being 310.degree.-380.degree. C.;(b) a melt crystallization temperature, Tmc (420.degree. C./10 min) being at least 210.degree. C. and a residual melt crystallization enthalpy, .DELTA.Hmc (420.degree. C./10 min) being at least 10 J/g; and(c) a reduced viscosity being 0.3-2 dl/g at 25.degree. C. and a polymer concentration of 0.5 g/dl in 98% sulfuric acid.

    摘要翻译： 通过拉伸含有100重量份基本上线性结构的聚（亚芳基硫醚）和5至小于100重量份熔体稳定的聚（亚芳基硫醚 - 酮）的树脂组合物来获得耐热拉伸膜 ）。 聚（亚芳基硫醚）在310℃下测得的熔体粘度至少为1,000泊，剪切速率为200秒-1。 聚（亚芳基硫醚酮）具有主要的式（*化学结构*）的重复单元，其中-CO-和-S-基通过苯环彼此键合在对位，并且具有以下物理 性质（a） - （c）：（a）熔点，Tm为310-380℃。 （b）熔融结晶温度Tmc（420℃/分钟）至少为210℃，残余熔融结晶焓（ΔH）为420℃至10℃ /G; 和（c）在25℃下的比浓粘度为0.3-2dl / g，在98％硫酸中的浓度为0.5g / dl。