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    Lactone-containing compound, polymer, resist composition, and patterning process
    1.
    发明授权
    Lactone-containing compound, polymer, resist composition, and patterning process 有权
    含内酯的化合物，聚合物，抗蚀剂组合物和图案化工艺

    公开(公告)号：US07871752B2

    公开(公告)日：2011-01-18

    申请号：US11878759

    申请日：2007-07-26

    申请人： Koji Hasegawa ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Seiichiro Tachibana

    发明人： Koji Hasegawa ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Seiichiro Tachibana

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0046 ,  Y10S430/111

    摘要： Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, pattern edge roughness, pattern density dependency and exposure margin.

    摘要翻译： 具有式（1）的含内酯的化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是一价烃基，或者R 2和R 3可以一起形成脂族烃环，R 4是H或CO 2 R 5，R 5是 一价烃基，W是CH 2，O或S，k 1是0或1.它们可用作产生对辐射透明的聚合物的单体; 500nm。 包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，图案边缘粗糙度，图案密度依赖性和曝光余量。

    Resist composition and patterning process
    4.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号：US06667145B1

    公开(公告)日：2003-12-23

    申请号：US09694369

    申请日：2000-10-24

    申请人： Tsunehiro Nishi ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tomohiro Kobayashi ,  Jun Hatakeyama

    发明人： Tsunehiro Nishi ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tomohiro Kobayashi ,  Jun Hatakeyama

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is alkyl, R3 is H, methyl or CH2CO2R2, at least one of R4 to R7 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R8 to R11 is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a —CO2— partial structure, and the reminders are independently H or alkyl, R12 is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R13 is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, “a” to “d” are from 0 to less than 1, x+a+b+c+d=1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.

    摘要翻译： 抗蚀剂组合物包含作为基础树脂的由下式表示的聚合物，其Mw为1,000-500,000.R 1是H，甲基或CO 2 R 2，R 2是烷基，R 3是 H，甲基或CH 2 CO 2 R 2，R 4至R 7中的至少一个是含羧基或羟基的一价烃基，并且提醒独立地为H或烷基，R 8， R 11是含有-CO 2 - 部分结构的2至15个碳原子的一价烃基，并且提醒独立地是H或烷基，R 12是多环烃基或含有这种多环的烷基 烃基，R 13是酸不稳定基团，Z是构成其中含有羧酸酯，碳酸酯或酸酐的5-或6-元环的二价原子基团，k是0或1，x是 数字从0到1，“a”到“d”从0到小于1，x + a + b + c + d = 1。 抗蚀剂组合物具有显着提高的分辨率，基底粘附性和耐蚀刻性，并且在精确微细加工中非常有用。

    Resist composition and patterning process
    10.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号：US06399274B1

    公开(公告)日：2002-06-04

    申请号：US09694706

    申请日：2000-10-24

    申请人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

    发明人： Takeshi Kinsho ,  Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045

    摘要： A resist composition contains as a base resin a polymer comprising recurring units of the formula (1-1) or (1-2) and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is a straight, branched or cyclic C1-15 alkyl group, R3 is hydrogen, methyl or CH2CO2R2, R4 is an acid labile group, i is an integer of 1 to 4, and k is equal to 0 or 1. The resist composition has significantly improved sensitivity, resolution and etching resistance and is very useful in precise microfabrication.

    摘要翻译： 抗蚀剂组合物含有作为基础树脂的包含式（1-1）或（1-2）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CO 2 R 2，R 2是直链，支链的 或环状C 1-15烷基，R 3是氢，甲基或CH 2 CO 2 R 2，R 4是酸不稳定基团，i是1至4的整数，并且k等于0或1.抗蚀剂组合物具有显着提高的灵敏度，分辨率 和抗蚀刻性，并且在精密微细加工中非常有用。