公开(公告)号：US20150114291A1

公开(公告)日：2015-04-30

申请号：US14584226

申请日：2014-12-29

申请人： ULVAC, Inc.

发明人： Kazuhiko SAITOU ,  Masayuki IIJIMA ,  Takayoshi HIRONO ,  Kenji NAKAMORI

IPC分类号： C23C16/48 ,  C23C16/455 ,  C23C16/52

CPC分类号： C23C16/48 ,  B05D1/60 ,  B05D3/06 ,  B05D2252/02 ,  C23C14/12 ,  C23C14/228 ,  C23C14/24 ,  C23C14/246 ,  C23C14/562 ,  C23C16/4401 ,  C23C16/4409 ,  C23C16/455 ,  C23C16/52 ,  C23C16/545

摘要： The present invention is to provide a technology for forming an organic compound film having a uniform thickness on a film at a high film formation speed while transporting the film in a vacuum chamber. In a vacuum chamber, a film reeled out from a mother roll is transported in contact with a center roller and an organic compound film is formed on the film. A vapor emission device disposed in a film deposition chamber provided in the vacuum chamber and having a vapor emission unit which emits and blows a vapor of an organic compound monomer to a film on the center roller, and an energy ray-emitting device for irradiating an organic compound monomer layer formed on the center roller with an energy ray so as to cure the organic compound layer are provided. The vapor emission device and the film deposition chamber are respectively connected to fifth and third vacuum evacuation devices which are independently controllable; and the pressure in the vapor emission device is set to be larger than the pressure in the film deposition chamber. The difference between the pressure in the vapor emission device and the pressure in the film deposition chamber is set to be constant.

摘要翻译： 本发明提供一种在真空室中输送薄膜的同时以高成膜速度在膜上形成具有均匀厚度的有机化合物膜的技术。 在真空室中，从母辊卷出的膜与中心辊接触地输送，并且在膜上形成有机化合物膜。 一种蒸气发射装置，其设置在设置在所述真空室中的成膜室中，并具有将有机化合物单体的蒸气发射并吹送到所述中心辊上的膜的蒸气发射单元，以及用于照射 提供了形成在中心辊上的能量射线以固化有机化合物层的有机化合物单体层。 蒸汽发射装置和成膜室分别连接到可独立控制的第五和第三抽真空装置; 并且蒸气发射装置中的压力被设定为大于成膜室中的压力。 蒸汽发射装置中的压力与成膜室中的压力之间的差设定为恒定。

公开(公告)号：US20150114290A1

公开(公告)日：2015-04-30

申请号：US14584200

申请日：2014-12-29

申请人： ULVAC, Inc.

发明人： Kazuhiko SAITOU ,  Masayuki IIJIMA ,  Takayoshi HIRONO ,  Kenji NAKAMORI

IPC分类号： C23C14/12 ,  C23C14/58

CPC分类号： C23C14/12 ,  B05D1/60 ,  B05D3/06 ,  B05D2252/02 ,  C23C14/228 ,  C23C14/562 ,  C23C14/58 ,  H01J37/32761 ,  H01J37/3277

摘要： The present invention forms an organic thin film at a high film formation rate by vapor of an organic compound generated by heating. A film formation chamber is disposed in the interior of a buffer chamber; a part of the side surface of a center roller is inserted in the film formation chamber from a film formation chamber opening; and a base material film is run in close contact with the side surface in the part. The vapor is carried by a carrier gas from a vapor generation device connected to the film formation chamber; the center roller is cooled by a cooling device; the base material film is cooled to temperatures lower than the condensation temperature of the vapor; and an organic raw material layer is formed on the surface of the base material film by the vapor discharged into the film formation chamber, which is cured by the irradiation with an energy ray in the curing chamber while rotating the center roller. The buffer chamber is evacuated to a low pressure so that the carrier gas and the vapor that flowed out of the film formation chamber opening do not flow into the curing chamber and the roll chamber.

摘要翻译： 本发明通过加热产生的有机化合物的蒸汽以高成膜速度形成有机薄膜。 成膜室设置在缓冲室的内部; 中心辊的侧面的一部分从成膜室开口插入成膜室中; 并且基材膜与部件中的侧表面紧密接触。 蒸汽由来自连接到成膜室的蒸汽发生装置的载气承载; 中心辊由冷却装置冷却; 将基材膜冷却至低于蒸气冷凝温度的温度; 并且通过排出到成膜室中的蒸气在基材膜的表面上形成有机原料层，该成膜室在旋转中心辊的同时通过在固化室中的能量射线照射而固化。 缓冲室被抽空到低压，使得从成膜室开口流出的载气和蒸气不流入固化室和辊室。

公开(公告)号：US20140311410A1

公开(公告)日：2014-10-23

申请号：US14323583

申请日：2014-07-03

申请人： ULVAC, Inc.

发明人： Yixin YANG ,  Yoshiyuki MITSUHASHI ,  Masayuki IIJIMA ,  Sadatsugu WAKAMATSU ,  Kazuhiko SAITO ,  Tomoharu FUJII ,  Tsuyoshi YOSHIMOTO ,  Togo HOSOYA ,  Takayoshi HIRONO ,  Nobuhiro HAYASHI ,  Nobuaki KAKUTANI ,  Naoki SUNAGAWA ,  Isao TADA ,  Hiroyuki HIRANO

IPC分类号： C23C16/44 ,  C23C16/52

CPC分类号： C23C16/52 ,  B05D1/34 ,  B05D1/62 ,  C23C14/12 ,  C23C14/562 ,  C23C16/4405

摘要： Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape. The film-forming apparatus includes a cleaning chamber configured to be connected to a film-forming space when a shutter is opened, and to be separated from the film-forming space and cause a cleaning gas to be discharged into an internal space when the shutter is closed; means for moving a discharge apparatus between a cleaning position inside the cleaning chamber and a film-forming position closer to a cylindrical member than the cleaning position; and a control apparatus that controls the discharge apparatus to discharge the raw material gas when the discharge apparatus is moved to the film-forming position, and controls the shutter to be closed so as to fill the cleaning chamber with the cleaning gas when the discharge apparatus is moved to the cleaning position.

摘要翻译： 提供一种成膜装置，其能够在成膜空间和清洁气体环境彼此分离的状态下清洁排出装置，同时在具有膜的成膜物体上继续形成膜 形状。 该成膜设备包括清洁室，该清洁室构造成当快门打开时连接到成膜空间，并且与成膜空间分离，并且当快门时将清洁气体排出到内部空间 关闭了; 用于在清洁室内的清洁位置和比清洁位置更靠近圆筒形构件的成膜位置之间移动排放装置的装置; 以及控制装置，当排出装置移动到成膜位置时，控制排出装置排出原料气体，并且当排放装置移动到成膜位置时控制活门关闭，以便在清洁室中填充清洁气体 被移动到清洁位置。