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1.发明申请公开(公告)号：US20190087481A1
公开(公告)日：2019-03-21
申请号：US15820662
申请日：2017-11-22
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Li-Chin Wang , Ya-Ching Cheng , Chien-Hung Chen , Chun-Liang Hou , Da-Ching Liao
IPC: G06F17/30 , G05B19/418
CPC classification number: G06F16/285 , G05B19/4183 , G05B2219/31318
Abstract: A manufacture parameters grouping and analyzing method, and a manufacture parameters grouping and analyzing system are provided. The manufacture parameters grouping and analyzing method includes the following steps: A plurality of process factors are classified into a plurality of groups. In each of the groups, an intervening relationship between any two of the process factors is larger than a predetermined correlation value. In each of the groups, at least one representative factor is selected from each of the groups according to a plurality of outputting relationships of the process factors related to an output factor or a plurality of sample amounts of the process factors. Finally, the representative factor is used for various applications.
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公开(公告)号：US20200057966A1
公开(公告)日：2020-02-20
申请号：US16105182
申请日：2018-08-20
Applicant: United Microelectronics Corp.
Inventor： Yao-Sheng Chang , Ya-Ching Cheng , Chien-Hung Chen , Chih-Yueh Li , Da-Ching Liao
Abstract: A training apparatus and a training method for providing a sample size expanding model are provided. A normalizing unit receives a training data set with at least one numeric predictor factor and a numeric response factor. An encoding unit trains the training data set in an initial encoding layer and at least one deep encoding layer. A modeling unit extracts a mean vector and a variance vector and inputting the mean vector and the variance vector together into a latent hidden layer for obtaining the sample size expanding model. A decoding unit trains the training data set in at least one deep decoding layer and a last encoding layer. A verifying unit performs a verification of the sample size expanding model according to the outputting data set. A data generating unit generates a plurality of samples via the sample size expanding model.
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3.发明申请公开(公告)号：US20160334456A1
公开(公告)日：2016-11-17
申请号：US14708300
申请日：2015-05-11
Applicant: United Microelectronics Corp.
Inventor： Ya-Ching Cheng , Chun-Liang Hou , Hsiao-Kwang Yang , Chien-Jung Su , Guan-Lin Chen
CPC classification number: G01R31/2831 , G11C29/006 , G11C29/08 , G11C29/44 , G11C29/50 , G11C29/56008
Abstract: The fail bit count data, shmoo data, static noise margins and write margins corresponding to a wafer are measured. Using the above mentioned measurements, variables used to generate the curve are calculated. The variables used to generate the curve include the standard deviation of the fail bit count data, the static noise margins and the write margins. The curve is used to determine optimal operating condition of a fabrication process.
Abstract translation: 测量对应于晶片的故障位计数数据，shmoo数据，静态噪声余量和写入裕度。 使用上述测量，计算用于生成曲线的变量。 用于生成曲线的变量包括故障位计数数据的标准偏差，静态噪声容限和写入余量。 该曲线用于确定制造过程的最佳操作条件。
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公开(公告)号：US11461693B2
公开(公告)日：2022-10-04
申请号：US16105182
申请日：2018-08-20
Applicant: United Microelectronics Corp.
Inventor： Yao-Sheng Chang , Ya-Ching Cheng , Chien-Hung Chen , Chih-Yueh Li , Da-Ching Liao
Abstract: A training apparatus and a training method for providing a sample size expanding model are provided. A normalizing unit receives a training data set with at least one numeric predictor factor and a numeric response factor. An encoding unit trains the training data set in an initial encoding layer and at least one deep encoding layer. A modeling unit extracts a mean vector and a variance vector and inputting the mean vector and the variance vector together into a latent hidden layer for obtaining the sample size expanding model. A decoding unit trains the training data set in at least one deep decoding layer and a last encoding layer. A verifying unit performs a verification of the sample size expanding model according to the outputting data set. A data generating unit generates a plurality of samples via the sample size expanding model.
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公开(公告)号：US11074376B2
公开(公告)日：2021-07-27
申请号：US15497489
申请日：2017-04-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Ya-Ching Cheng , Chun-Liang Hou , Chien-Hung Chen , Wen-Jung Liao , Min-Chin Hsieh , Da-Ching Liao , Li-Chin Wang
IPC: G06F30/20
Abstract: A method for analyzing a process output and a method for creating an equipment parameter model are provided. The method for analyzing the process output includes the following steps: A plurality of process steps are obtained. A processor obtains a step model set including a plurality of first step regression models, each of which represents a relationship between N of the process steps and a process output. The processor calculates a correlation of each of the first step regression models. The processor picks up at least two of the first step regression models to be a plurality of second step regression models whose correlations are ranked at top among the correlations of the first step regression models. The processor updates the step model set by a plurality of third step regression models, each of which represents a relationship between M of the process steps and the process output.
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Patent Agency Ranking
公开(公告)号：US20190266214A1
公开(公告)日：2019-08-29
申请号：US15905263
申请日：2018-02-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Da-Ching LIAO , Li-Chin Wang , Ya-Ching Cheng , Chien-Hung Chen , Chun-Liang Hou
IPC: G06F17/15
Abstract: An analyzing method and an analyzing system for manufacturing data are provided. The analyzing method includes the following steps. A plurality of models each of which has a correlation value representing a relationship between at least one of a plurality of factors and a target parameter are provided. The models are screened according to the correlation values. A rank information and a frequency information of the factors are listed up according to the models. The factors are screened according to the rank information and the frequency information. The models are ranked and at least one of the models is selected.
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公开(公告)号：US20250053721A1
公开(公告)日：2025-02-13
申请号：US18378633
申请日：2023-10-10
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Zih-Wun Peng , Chih-Yueh Li , Ya-Ching Cheng , Yu-Ying Hu , Da-Ching Liao , Po-Jen Hsiao
IPC: G06F30/398
Abstract: A method to derive the location and size of oxide spacing area is provided in the present invention, including steps of dividing a tested region into a plurality of grid units, each grid unit consists of a plurality of sub-grid units, calculating a pattern density difference, a minimum row/column pattern density and a row/column pattern density difference of every grid unit based on layout data, and determining a grid unit as where an oxide spacing area locates at when its pattern density difference is greater than a first predetermined value, its minimum row/column pattern density is less than a second predetermined value and its row/column pattern density difference is greater than a third predetermined value.
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公开(公告)号：US10776402B2
公开(公告)日：2020-09-15
申请号：US15820662
申请日：2017-11-22
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Li-Chin Wang , Ya-Ching Cheng , Chien-Hung Chen , Chun-Liang Hou , Da-Ching Liao
IPC: G06F17/00 , G06F16/28 , G05B19/418
Abstract: A manufacture parameters grouping and analyzing method, and a manufacture parameters grouping and analyzing system are provided. The manufacture parameters grouping and analyzing method includes the following steps: A plurality of process factors are classified into a plurality of groups. In each of the groups, an intervening relationship between any two of the process factors is larger than a predetermined correlation value. In each of the groups, at least one representative factor is selected from each of the groups according to a plurality of outputting relationships of the process factors related to an output factor or a plurality of sample amounts of the process factors. Finally, the representative factor is used for various applications.
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公开(公告)号：US10482153B2
公开(公告)日：2019-11-19
申请号：US15905263
申请日：2018-02-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Da-Ching Liao , Li-Chin Wang , Ya-Ching Cheng , Chien-Hung Chen , Chun-Liang Hou
Abstract: An analyzing method and an analyzing system for manufacturing data are provided. The analyzing method includes the following steps. A plurality of models each of which has a correlation value representing a relationship between at least one of a plurality of factors and a target parameter are provided. The models are screened according to the correlation values. A rank information and a frequency information of the factors are listed up according to the models. The factors are screened according to the rank information and the frequency information. The models are ranked and at least one of the models is selected.
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10.发明申请公开(公告)号：US20180314773A1
公开(公告)日：2018-11-01
申请号：US15497489
申请日：2017-04-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor： Ya-Ching Cheng , Chun-Liang Hou , Chien-Hung Chen , Wen-Jung Liao , Min-Chin Hsieh , Da-Ching Liao , Li-Chin Wang
IPC: G06F17/50
Abstract: A method for analyzing a process output and a method for creating an equipment parameter model are provided. The method for analyzing the process output includes the following steps: A plurality of process steps are obtained. A processor obtains a step model set including a plurality of first step regression models, each of which represents a relationship between N of the process steps and a process output. The processor calculates a correlation of each of the first step regression models. The processor picks up at least two of the first step regression models to be a plurality of second step regression models whose correlations are ranked at top among the correlations of the first step regression models. The processor updates the step model set by a plurality of third step regression models, each of which represents a relationship between M of the process steps and the process output.
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