Lateral power device having low specific on-resistance and using high-dielectric constant socket structure and manufacturing method therefor
    1.
    发明授权
    Lateral power device having low specific on-resistance and using high-dielectric constant socket structure and manufacturing method therefor 有权
    具有低比导通电阻和使用高介电常数插座结构的侧向功率器件及其制造方法

    公开(公告)号:US09324855B2

    公开(公告)日:2016-04-26

    申请号:US14650176

    申请日:2013-12-19

    Inventor: Junhong Li Ping Li

    Abstract: Provided is a lateral power device having low specific ON-resistance and using a high-dielectric constant socket structure and a manufacturing method therefor, which relate to semiconductor power devices. A source electrode (8) of the device is of a first conduction type, and a channel region (6), a silicon substrate (4) and an ohmic contact heavily-doped region are of a second conduction type; at least two isolation regions are arranged in an embedded manner in a drift region (1); between the isolation regions are the drift region (1) and the channel region (6); each isolation region extends from the source electrode (8) to a drain electrode (11); high-dielectric constant material strips (3) and first insulation dielectric layers (10) form boundaries of the bottoms and sidewalls of the isolation regions; the isolation regions are filled with a first filling material (2), a second insulation dielectric layer (9) is arranged on the upper surface of the drift region (1) and the upper surfaces of the isolation regions, and a gate electrode (5) directly contacts the first filling material (2) via holes on the second insulation dielectric layer (9); and a source electrode lead-out wire (16) and a drain electrode lead-out wire (12) directly contact the source electrode (8) and the drain electrode (11) respectively via the holes on the second insulation dielectric layer (9). The area of a power device can be greatly reduced on the premise of not reducing the withstand voltage and not increasing the specific ON-resistance.

    Abstract translation: 本发明提供一种具有低比导通电阻和使用涉及半导体功率器件的高介电常数插座结构及其制造方法的侧向功率器件。 器件的源极(8)是第一导电类型,沟道区(6),硅衬底(4)和欧姆接触重掺杂区是第二导电类型; 至少两个隔离区域以嵌入的方式布置在漂移区域(1)中; 在隔离区之间是漂移区(1)和沟道区(6); 每个隔离区域从源电极(8)延伸到漏电极(11); 高介电常数材料条(3)和第一绝缘电介质层(10)形成隔离区的底部和侧壁的边界; 隔离区域填充有第一填充材料(2),在漂移区域(1)的上表面和隔离区域的上表面上设置第二绝缘电介质层(9)和栅电极(5) )通过第二绝缘介电层(9)上的孔直接接触第一填充材料(2); 并且源电极引出线(16)和漏电极引出线(12)分别经由第二绝缘介电层(9)上的孔直接接触源电极(8)和漏电极(11) 。 在不降低耐压且不增加特定导通电阻的前提下,功率器件的面积可以大大降低。

    LATERAL POWER DEVICE HAVING LOW SPECIFIC ON-RESISTANCE AND USING HIGH-DIELECTRIC CONSTANT SOCKET STRUCTURE AND MANUFACTURING METHOD THEREFOR
    2.
    发明申请
    LATERAL POWER DEVICE HAVING LOW SPECIFIC ON-RESISTANCE AND USING HIGH-DIELECTRIC CONSTANT SOCKET STRUCTURE AND MANUFACTURING METHOD THEREFOR 有权
    具有低特定导通能力和使用高介电常数插座结构的横向电源装置及其制造方法

    公开(公告)号:US20150333170A1

    公开(公告)日:2015-11-19

    申请号:US14650176

    申请日:2013-12-19

    Inventor: Junhong Li Ping Li

    Abstract: Provided is a lateral power device having low specific ON-resistance and using a high-dielectric constant socket structure and a manufacturing method therefor, which relate to semiconductor power devices. A source electrode (8) of the device is of a first conduction type, and a channel region (6), a silicon substrate (4) and an ohmic contact heavily-doped region are of a second conduction type; at least two isolation regions are arranged in an embedded manner in a drift region (1); between the isolation regions are the drift region (1) and the channel region (6); each isolation region extends from the source electrode (8) to a drain electrode (11); high-dielectric constant material strips (3) and first insulation dielectric layers (10) form boundaries of the bottoms and sidewalls of the isolation regions; the isolation regions are filled with a first filling material (2), a second insulation dielectric layer (9) is arranged on the upper surface of the drift region (1) and the upper surfaces of the isolation regions, and a gate electrode (5) directly contacts the first filling material (2) via holes on the second insulation dielectric layer (9); and a source electrode lead-out wire (16) and a drain electrode lead-out wire (12) directly contact the source electrode (8) and the drain electrode (11) respectively via the holes on the second insulation dielectric layer (9). The area of a power device can be greatly reduced on the premise of not reducing the withstand voltage and not increasing the specific ON-resistance.

    Abstract translation: 本发明提供一种具有低比导通电阻和使用涉及半导体功率器件的高介电常数插座结构及其制造方法的侧向功率器件。 器件的源极(8)是第一导电类型,沟道区(6),硅衬底(4)和欧姆接触重掺杂区是第二导电类型; 至少两个隔离区域以嵌入的方式布置在漂移区域(1)中; 在隔离区之间是漂移区(1)和沟道区(6); 每个隔离区域从源电极(8)延伸到漏电极(11); 高介电常数材料条(3)和第一绝缘电介质层(10)形成隔离区的底部和侧壁的边界; 隔离区域填充有第一填充材料(2),在漂移区域(1)的上表面和隔离区域的上表面上设置第二绝缘电介质层(9)和栅电极(5) )通过第二绝缘介电层(9)上的孔直接接触第一填充材料(2); 并且源电极引出线(16)和漏电极引出线(12)分别经由第二绝缘介电层(9)上的孔直接接触源电极(8)和漏电极(11) 。 在不降低耐压且不增加特定导通电阻的前提下,功率器件的面积可以大大降低。

    Lateral insulated gate bipolar transistor and method of eliminating the transistor tail current

    公开(公告)号:US10446673B2

    公开(公告)日:2019-10-15

    申请号:US16021046

    申请日:2018-06-28

    Inventor: Junhong Li

    Abstract: A lateral insulated gate bipolar transistor (LIGBT) and method for eliminating the transistor tail current. The lateral insulated gate bipolar transistor comprises the silicon substrate, the buried oxide, and the drift region, the channel region, ohm-contact-high-doping region, the cathode, the gate dielectric, the anode contact, the gate, the cathode contact, the anode, which are placed above the silicon substrate, the electric field intensifier is placed at the upper surface of the drift region between the anode and the channel region to generate an electric field that starts from anode and points to the bottom surface of the electric field intensifier. The electric field intensifier is isolated from the drift region by the dielectric. The invention realizes performance improvements for both the conduction and the switching behaviors of the LIGBT device.

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