Abstract:
A radiation detector which operates in the infrared 1 to 14 micron region of the electromagnetic spectrum. The detector consists of an infrared charge coupled device which depends on capacitive coupling across the interface of silicon of the photoconductive response of a narrow gap semiconductor so as to dispense with carrier injection across that interface.
Abstract:
Flat, uniform planar diodes of PbS are prepared by either (1) epitaxially growing an n-type layer onto a p-type layer by depositing one layer epitaxially onto the other in a vacuum of at least 5 X 10 5 Torr wherein the substrate is at a temperature between 200-350* C and the material to be deposited is at a temperature not lower than its sublimation point or (2) epitaxially growing a p-type layer on an n-type layer using the procedure described in (1) with the addition of vapors of a doping agent such as S, Se or Te, in the system. This method may also be applied to the closely related compounds PbxSn1 xSe and PbxSn1 xTe where x varies from 0 to 1 inclusive, hereinafter referred to as the lead-tin salt alloys.
Abstract:
A method of varying the carrier concentration of epitaxial films of Pbx Sn1 xS, wherein X varies from 0.8 to 1 inclusive, which are deposited in vacuum from a source of material in a sublimation furnace which is at a temperature above the sublimation temperature of the material comprising varying the sublimation furnace opening size and temperature. The products can be used as infrared detectors.
Abstract translation:改变Pb x Sn 1-x S的外延膜的载流子浓度的方法,其中X从0.8变化到1,其中真空从升华炉中的材料源沉积,该升华炉的温度高于 包括改变升华炉开口尺寸和温度的材料。 该产品可用作红外探测器。