公开(公告)号：US10822699B2

公开(公告)日：2020-11-03

申请号：US15946483

申请日：2018-04-05

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Elaina Babayan ,  Sarah White ,  Vijay Venugopal ,  Jonathan Bakke

IPC分类号： C23C16/50 ,  C23C16/52 ,  C23C16/448 ,  H01L21/67 ,  C23C16/455

摘要： An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

公开(公告)号：US20190203358A1

公开(公告)日：2019-07-04

申请号：US15946483

申请日：2018-04-05

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Elaina Babayan ,  Sarah White ,  Vijay Venugopal ,  Jonathan Bakke

IPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/455 ,  H01L21/67

摘要： An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

公开(公告)号：US12104253B2

公开(公告)日：2024-10-01

申请号：US18208084

申请日：2023-06-09

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Elaina Babayan ,  Sarah White ,  Vijay Venugopal ,  Jonathan Bakke

IPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/455 ,  G01F1/00 ,  G05D11/00 ,  G05D11/13 ,  G05D16/00 ,  G05D16/04 ,  H01L21/00 ,  H01L21/66 ,  H01L21/67

CPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/45544 ,  C23C16/45553 ,  G01F1/00 ,  G05D11/00 ,  G05D11/132 ,  G05D16/00 ,  G05D16/04 ,  G05D16/0402 ,  H01L21/00 ,  H01L21/67253 ,  H01L22/00

摘要： An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

公开(公告)号：US11718914B2

公开(公告)日：2023-08-08

申请号：US17012980

申请日：2020-09-04

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Elaina Babayan ,  Sarah White ,  Vijay Venugopal ,  Jonathan Bakke

IPC分类号： C23C16/52 ,  C23C16/448 ,  H01L21/67 ,  C23C16/455 ,  G05D16/04 ,  G01F1/00 ,  G05D11/13 ,  G05D16/00 ,  H01L21/00 ,  H01L21/66 ,  G05D11/00

CPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/45544 ,  C23C16/45553 ,  G01F1/00 ,  G05D11/00 ,  G05D11/132 ,  G05D16/00 ,  G05D16/04 ,  G05D16/0402 ,  H01L21/00 ,  H01L21/67253 ,  H01L22/00

摘要： An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.