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公开(公告)号：US20180256391A1
公开(公告)日：2018-09-13
申请号：US15911903
申请日：2018-03-05
申请人： Wavelight GmbH
发明人： Klaus Vogler , Olaf Kittelmann , Edlef Buettner , Jan Popien
摘要： In certain embodiments, a laser device for laser processing of an eye comprises a source of a pulsed laser beam, a detector system that photodetects partial beams generated from the laser beam, and a control unit that evaluates the detection signals. A first detection element of the detector system provides a first detection signal based on single-photon absorption. A second detection element provides a second detection signal based on two-photon absorption. The control unit puts the measured signal strengths of the two detection signals into a ratio to one another. Variations in the resulting ratio value may be traced back to variations in the pulse duration and/or wave front of the laser beam. The control unit may initiate countermeasures to maintain the beam quality of the laser beam.
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公开(公告)号：US09755393B2
公开(公告)日：2017-09-05
申请号：US14369824
申请日：2012-11-14
申请人： WAVELIGHT GMBH
CPC分类号： H01S3/0057 , A61F9/008 , A61F9/0084 , G01J11/00 , H01S3/106
摘要： In certain embodiments, a system (10) comprises a laser source (20), one or more optical elements (24), a monitoring device (28), and a control computer (30). The laser source (20) emits one or more laser pulses. The optical elements (24) change a pulse length of the laser pulses, and the monitoring device (28) measures the pulse length of the laser pulses to detect the change in the pulse length. The control computer (30) receives the measured pulse length from the monitoring device (28), determines one or more laser parameters that compensate for the change in the pulse length, and controls the laser source (20) according to the laser parameters.
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公开(公告)号：US20160158061A1
公开(公告)日：2016-06-09
申请号：US14787240
申请日：2014-05-22
申请人： WAVELIGHT GMBH
IPC分类号： A61F9/008
CPC分类号： A61F9/0084
摘要： A method for energy setting of pulsed, focused laser radiation is provided. In the method, a relationship between a threshold pulse energy required for causing irreversible damage in a material and a pulse duration is established. The relationship allows for obtaining a threshold pulse energy for each of a plurality of pulse durations, including one or more pulse durations in a range between 200 fs and smaller. The relationship defines a decreasing threshold pulse energy for a decreasing pulse duration in the range between 200 fs and smaller. For a given pulse duration in the range between 200 fs and smaller, an associated threshold pulse energy is determined based on the established relationship. The pulse energy of the laser radiation is set based on the determined associated threshold pulse energy.
摘要翻译： 提供了脉冲聚焦激光辐射的能量设定方法。 在该方法中，建立了在材料中引起不可逆损伤所需的阈值脉冲能量与脉冲持续时间之间的关系。 该关系允许获得多个脉冲持续时间中的每一个的阈值脉冲能量，包括在200fs和更小的范围内的一个或多个脉冲持续时间。 该关系定义了在200fs和更小之间的范围内减小的脉冲持续时间的下降阈值脉冲能量。 对于在200fs和更小的范围内的给定脉冲持续时间，相关联的阈值脉冲能量基于建立的关系来确定。 基于确定的相关阈值脉冲能量来设置激光辐射的脉冲能量。
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公开(公告)号：US20150230978A1
公开(公告)日：2015-08-20
申请号：US14370686
申请日：2013-02-27
申请人： WAVELIGHT GMBH
发明人： Klaus Vogler , Olaf Kittelmann
CPC分类号： A61F9/008 , A61F9/0084 , H01S3/06758 , H01S3/2375 , H01S5/0064 , H01S5/0085 , H01S5/04 , H01S5/0657 , H01S5/146 , H01S5/183
摘要： In an embodiment, a laser apparatus comprises a semiconductor laser, e.g., of the VECSEL type, for generating pulsed laser radiation having a pulse duration in the femtosecond range or shorter and having a pulse repetition rate of at least 100 MHz; a selector for selecting groups of pulses from the laser radiation, each pulse group comprising a plurality of pulses at the pulse repetition rate, wherein the pulse groups are time-displaced by at least 500 ns; a scanner device for scanning a focal point of the laser radiation; a controller for controlling the scanner device based on a control program including instructions that, when executed by the controller, bring about the creation of a LIOB-based photodisruption for each pulse group in a target material, e.g. human eye tissue.
摘要翻译： 在一个实施例中，激光装置包括例如VECSEL型的半导体激光器，用于产生具有飞秒范围或更短的脉冲持续时间并具有至少100MHz的脉冲重复率的脉冲激光辐射; 选择器，用于从所述激光辐射中选择脉冲组，每个脉冲组包括脉冲重复频率的多个脉冲，其中所述脉冲组被时间位移至少500ns; 用于扫描激光辐射的焦点的扫描器装置; 控制器，用于基于包括指令的控制程序来控制扫描仪装置，所述指令在被控制器执行时导致针对目标材料中的每个脉冲组的基于LIOB的光破坏的产生，例如， 人眼组织。
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5.发明授权公开(公告)号：US09013685B2
公开(公告)日：2015-04-21
申请号：US14076023
申请日：2013-11-08
申请人： Wavelight GmbH
发明人： Claudia Gorschboth , Jing Li , Klaus Vogler , Olaf Kittelmann , Thomas Deisinger , Gerhard Robl
CPC分类号： B23K26/02 , A61F9/009 , Y10T29/49826 , Y10T156/10
摘要： A process for producing an interface unit and also a group of such interface units are specified. The interface unit exhibits a first reference surface for beaming in radiation, a second reference surface for emitting the radiation, and an axis extending in the direction from the first to the second reference surface. The production process comprises the steps of setting an optical path length of the interface unit between the first and second reference surfaces along the axis and the fixing of the set optical path length of the interface unit. The optical path length of the interface unit is set in such a way that radiation of a defined numerical aperture beamed in at the first reference surface exhibits a focus location that is predetermined with respect to the second reference surface in the direction of the axis. A precise and uniform focus location with respect to the second reference surface is obtained.
摘要翻译： 指定了用于生成接口单元以及一组这样的接口单元的处理。 接口单元呈现用于辐射辐射的第一参考表面，用于发射辐射的第二参考表面和沿从第一参考表面到第二参考表面的方向延伸的轴线。 生产过程包括以下步骤：沿着轴线设置第一和第二参考表面之间的界面单元的光路长度以及固定接口单元的设定的光程长度。 接口单元的光路长度被设定为使得在第一基准表面上射出的限定数值孔径的辐射表现出相对于第二参考表面在轴线方向上预定的聚焦位置。 获得相对于第二参考表面的精确且均匀的焦点位置。
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公开(公告)号：US20140361145A1
公开(公告)日：2014-12-11
申请号：US14369824
申请日：2012-11-14
申请人： WAVELIGHT GMBH
IPC分类号： H01S3/00
CPC分类号： H01S3/0057 , A61F9/008 , A61F9/0084 , G01J11/00 , H01S3/106
摘要： In certain embodiments, a system (10) comprises a laser source (20), one or more optical elements (24), a monitoring device (28), and a control computer (30). The laser source (20) emits one or more laser pulses. The optical elements (24) change a pulse length of the laser pulses, and the monitoring device (28) measures the pulse length of the laser pulses to detect the change in the pulse length. The control computer (30) receives the measured pulse length from the monitoring device (28), determines one or more laser parameters that compensate for the change in the pulse length, and controls the laser source (20) according to the laser parameters.
摘要翻译： 在某些实施例中，系统（10）包括激光源（20），一个或多个光学元件（24），监视设备（28）和控制计算机（30）。 激光源（20）发射一个或多个激光脉冲。 光学元件（24）改变激光脉冲的脉冲长度，并且监视装置（28）测量激光脉冲的脉冲长度以检测脉冲长度的变化。 控制计算机（30）从监视装置（28）接收测量的脉冲长度，确定补偿脉冲长度变化的一个或多个激光参数，并根据激光参数控制激光源（20）。
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公开(公告)号：US10463538B2
公开(公告)日：2019-11-05
申请号：US15911903
申请日：2018-03-05
申请人： Wavelight GmbH
发明人： Klaus Vogler , Olaf Kittelmann , Edlef Buettner , Jan Popien
IPC分类号： A61F9/008 , H01S3/00 , B23K26/70 , A61N5/067 , B23K103/00
摘要： In certain embodiments, a laser device for laser processing of an eye comprises a source of a pulsed laser beam, a detector system that photodetects partial beams generated from the laser beam, and a control unit that evaluates the detection signals. A first detection element of the detector system provides a first detection signal based on single-photon absorption. A second detection element provides a second detection signal based on two-photon absorption. The control unit puts the measured signal strengths of the two detection signals into a ratio to one another. Variations in the resulting ratio value may be traced back to variations in the pulse duration and/or wave front of the laser beam. The control unit may initiate countermeasures to maintain the beam quality of the laser beam.
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