SPIN-POLARIZED ELECTRON SOURCE AND SPIN-POLARIZED SCANNING TUNNELING MICROSCOPE
    1.
    发明申请
    SPIN-POLARIZED ELECTRON SOURCE AND SPIN-POLARIZED SCANNING TUNNELING MICROSCOPE 有权
    旋转极化电子源和旋转极化扫描隧道显微镜

    公开(公告)号:US20080073554A1

    公开(公告)日:2008-03-27

    申请号:US11559842

    申请日:2006-11-14

    IPC分类号: H01T23/00

    摘要: An exemplary spin-polarized electron source includes a cathode, and a one-dimensional nanostructure made of a compound (e.g., group III-V) semiconductor with local polarized gap states. The one-dimensional nanostructure includes a first end portion electrically connected with the cathode and a second end portion located/directed away from the cathode. The second end portion of the one-dimensional nanostructure functions as a polarized electron emission tip and is configured (i.e., structured and arranged) for emitting a spin-polarized electron current/beam under an effect of selectably one of a magnetic field induction and a circularly polarized light beam excitation when a predetermined negative bias voltage is applied to the cathode. Furthermore, a spin-polarized scanning tunneling microscope incorporating such a spin-polarized electron source is also provided.

    摘要翻译: 示例性的自旋极化电子源包括阴极和由具有局部极化间隙状态的化合物(例如III-V族)半导体制成的一维纳米结构。 一维纳米结构包括与阴极电连接的第一端部和位于/远离阴极的第二端部。 一维纳米结构的第二端部用作极化电子发射尖端,并且被配置(即,构造和布置),用于在可选择地对磁场感应和 当向阴极施加预定的负偏压时,圆偏振光束激发。 此外,还提供了包含这种自旋极化电子源的自旋极化扫描隧道显微镜。

    SEMICONDUCTOR NANOSTRUCTURE
    3.
    发明申请
    SEMICONDUCTOR NANOSTRUCTURE 有权
    半导体纳米结构

    公开(公告)号:US20110127639A1

    公开(公告)日:2011-06-02

    申请号:US12842195

    申请日:2010-07-23

    IPC分类号: H01L29/04 H01L29/12 H01L29/06

    摘要: The present disclosure relates to a semiconductor nanostructure. The semiconductor nanostructure includes a substrate and at least one ridge. The substrate includes a first crystal plane and a second crystal plane perpendicular to the first crystal plane. The at least one ridge extends from the first crystal plane along a crystallographic orientation of the second crystal plane. A width of cross section at a position of half the height of the at least one ridge is less than 17 nm. The semiconductor nanostructure is a patterned structure which can lead to generate a quantum confinement effect, such that the impurity scattering phenomenon is reduced.

    摘要翻译: 本发明涉及半导体纳米结构。 半导体纳米结构包括基底和至少一个脊。 衬底包括垂直于第一晶体平面的第一晶体平面和第二晶体面。 所述至少一个脊从所述第一晶体平面沿着所述第二晶体平面的晶体取向延伸。 在至少一个脊的高度的一半位置处的横截面宽度小于17nm。 半导体纳米结构是可以导致产生量子限制效应的图案化结构,使得杂质散射现象减少。