摘要:
There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.
摘要:
There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.
摘要:
An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要:
An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要:
The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要:
An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
摘要:
An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
摘要:
The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要:
A device or the operation of a device for the holding, especially sealing support of an optical element, especially an optical lens with at least one holding element for mounting the optical element and preferably at least one sealing element for sealing contact at at least a part of the optical element and/or the holding element, wherein the sealing element or at least a part thereof is displaceable between a first position, in which the sealing element rests against the optical element and a second position, in which the sealing element is spaced apart from the optical element, or wherein the sealing element is switchable such that it rests against the optical element under different contact pressure or adjustable contact force. The holding element can either take on the holding function alone and independently of the sealing element or work together with the sealing element in this regard. The sealing element can also be provided separately and independently of the holding element, such that the holding element is optimizable to the holding function. Especially, the present invention concerns an immersion objective for microlithography in which at least one actuatable sealing element is provided.
摘要:
A device or the operation of a device for the holding, especially sealing support of an optical element, especially an optical lens with at least one holding element for mounting the optical element and preferably at least one sealing element for sealing contact at at least a part of the optical element and/or the holding element, wherein the sealing element or at least a part thereof is displaceable between a first position, in which the sealing element rests against the optical element and a second position, in which the sealing element is spaced apart from the optical element, or wherein the sealing element is switchable such that it rests against the optical element under different contact pressure or adjustable contact force. The holding element can either take on the holding function alone and independently of the sealing element or work together with the sealing element in this regard. The sealing element can also be provided separately and independently of the holding element, such that the holding element is optimizable to the holding function. Especially, the present invention concerns an immersion objective for microlithography in which at least one actuatable sealing element is provided.