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    PROCESS FOR GRADIENT NANOVOIDED ARTICLE
    5.
    发明申请
    PROCESS FOR GRADIENT NANOVOIDED ARTICLE 审中-公开
    梯度纳米制品的工艺

    公开(公告)号：US20120201977A1

    公开(公告)日：2012-08-09

    申请号：US13501304

    申请日：2010-10-22

    申请人： Adam D. Haag ,  William F. Edmonds ,  Jason S. Petaja ,  Eric W. Nelson ,  William Blake Kolb ,  Encai Hao ,  Fei Lu ,  Michael Benton Free

    发明人： Adam D. Haag ,  William F. Edmonds ,  Jason S. Petaja ,  Eric W. Nelson ,  William Blake Kolb ,  Encai Hao ,  Fei Lu ,  Michael Benton Free

    IPC分类号： C23C14/28 ,  C08J9/28 ,  B82Y40/00

    CPC分类号： B05D3/101 ,  B05D3/0209 ,  B05D3/0254 ,  B05D3/067 ,  B05D3/10 ,  B05D3/107 ,  B05D5/00 ,  B05D7/04 ,  B82Y20/00 ,  G02B2207/101 ,  G02B2207/107

    摘要： A process and apparatus for producing a gradient nanovoided article, a gradient nanovoided coating, and a gradient low refractive index coating is described. The process includes providing a first solution of a polymerizable material in a solvent, and providing a first environment proximate a first region of the coating and a different second environment proximate an adjacent region of the coating. The process further includes at least partially polymerizing the polymerizable material to form a composition that includes an insoluble polymer matrix and a second solution. The insoluble polymer matrix includes a plurality of nanovoids that are filled with the second solution, and a major portion of the solvent from the second solution is removed. A first volume fraction of the plurality of nanovoids proximate the first region of the coating is less than a second volume fraction of the plurality of nanovoids proximate an adjacent of the coating. An apparatus for the process is also described, and includes a web line, a coating section, a partial polymerization section, and a solvent removal section.

    摘要翻译： 描述了用于生产梯度纳米组分制品，梯度纳米复合涂层和梯度低折射率涂层的方法和设备。 该方法包括在溶剂中提供可聚合材料的第一溶液，以及在涂层的第一区域附近提供第一环境以及邻近涂层的相邻区域的不同的第二环境。 该方法还包括至少部分聚合可聚合材料以形成包含不溶性聚合物基质和第二溶液的组合物。 不溶性聚合物基质包括填充有第二溶液的多个纳米泡，并且除去来自第二溶液的大部分溶剂。 靠近涂层的第一区域的多个纳米空心的第一体积分数小于邻近涂层的多个纳米空间的第二体积分数。 还描述了一种用于该方法的装置，并且包括幅材线，涂布部分，部分聚合部分和溶剂去除部分。

    OPTICAL STACK AND LIGHTGUIDES
    10.
    发明申请
    OPTICAL STACK AND LIGHTGUIDES 有权
    光学堆叠和光源

    公开(公告)号：US20130022315A1

    公开(公告)日：2013-01-24

    申请号：US13634583

    申请日：2011-04-11

    申请人： William F. Edmonds ,  Tao Liu ,  John F. Van Deriofske III ,  John A. Wheatley

    发明人： William F. Edmonds ,  Tao Liu ,  John F. Van Deriofske III ,  John A. Wheatley

    IPC分类号： G02B5/30 ,  G02B6/26

    CPC分类号： G02B5/045 ,  F21V11/00 ,  G02B6/0053 ,  G02F1/133606 ,  G02F2001/133607 ,  Y10T428/24612

    摘要： Optical stack is disclosed. The optical stack includes a first optical stack that includes, a first optical adhesive layer, and a reflective polarizer layer that is disposed on the first optical adhesive layer. The reflective polarizer layer substantially reflects light of a first polarization state and substantially transmits light of a second polarization state orthogonal to the first polarization state. The optical stack also includes a second optical stack that includes a second optical adhesive layer, a low index layer that is disposed on the second optical adhesive layer and includes a plurality of voids dispersed in a binder, and a light directing film that is disposed on the low index layer and includes a plurality of unitary discrete structures. Portions of each unitary discrete structure penetrate into the first optical adhesive layer. Portions of each unitary discrete structure do not penetrate into the first optical adhesive layer. Each unitary discrete structure defines a penetration depth and a penetration base at the interface between the penetrating and non-penetrating portions of the unitary discrete structure. The penetration base has a minimum penetration base dimension. The plurality of unitary discrete structures has an average penetration depth and an average minimum penetration base dimension. The ratio of the average penetration depth to the average minimum penetration base dimension is at least 1.5. The peel strength between the first and second optical stacks is greater than about 30 grams/inch.

    摘要翻译： 公开了光堆叠。 光学堆叠包括第一光学堆叠，其包括第一光学粘合剂层和设置在第一光学粘合剂层上的反射偏振器层。 反射型偏振层基本上反射第一偏振态的光，并且基本上透射与第一偏振状态正交的第二偏振状态的光。 光学堆叠还包括第二光学堆叠，其包括第二光学粘合剂层，设置在第二光学粘合剂层上并包括分散在粘合剂中的多个空隙的低折射率层，以及设置在 低折射率层并且包括多个单一离散结构。 每个单一离散结构的部分渗入第一光学粘合剂层。 每个单一离散结构的部分不会渗透到第一光学粘合剂层中。 每个单一离散结构在整体离散结构的穿透部分和非穿透部分之间的界面处限定穿透深度和穿透基部。 穿透底座具有最小穿透基座尺寸。 多个单一离散结构具有平均穿透深度和平均最小穿透基础尺寸。 平均渗透深度与平均最小穿透基础尺寸之比至少为1.5。 第一和第二光学叠层之间的剥离强度大于约30克/英寸。