摘要:
A battery pack including a battery cell including an electrode assembly arranged within a can and an electrode terminal electrically connected to the electrode assembly, the can having an opening sealed by a cap plate, a top case attached to the battery cell at a top portion of the battery cell, the top case having an inner space and a protective circuit module including a protection circuit board arranged within said inner space of said top case and electrically connected to the electrode assembly, wherein the top case includes a top portion opposite from the electrode assembly and first and second pairs of opposed sides, the first pair of opposed sides having an edge, a portion of the edge has a recessed interference preventing portion, the recessed interference preventing portion corresponds to a location of a weld connecting an electrode tap to the electrode terminal.
摘要:
This invention relates to caprine arthritis encephalitis virus-based vectors and vector systems that are useful in the delivery of nucleic acids to both non-dividing and dividing cells. Methods for delivering nucleic acids to both non-dividing and dividing cells using the vector systems are also disclosed.
摘要:
The present invention relates to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same, and more particularly, to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same in which the specific surface area of the powder is increased by preparing a cerium precursor, and then decomposing and calcinating the prepared cerium precursor. The pore distribution is controlled to increase the chemical contact area between a polished film and a polishing material, thereby reducing polishing time while the physical strength of powder is decreased, which remarkably reduces scratches on a polished film.
摘要:
A disc recognizing method prevents a leaf spring of a pickup from being deformed in an optical disc playback apparatus including a pickup transfer for moving a pickup and a plurality of starting point detecting switches for recognizing a type of a seated disc. The method includes a disc recognizing step of recognizing the seated disc by virtue of an on state of a first starting point detecting switch which corresponds to the starting point of a laser disc when a playback mode is selected, a disc recognizing step of recognizing the seated disc by virtue of an on state of a second starting point detecting switch which corresponds to a compact disc, and a disc recognizing step of recognizing the seated disc by inwardly transferring the pickup for a predetermined period of time when a focusing operation fails after the first starting point detecting switch has been turned on.
摘要:
Disclosed is cerium oxide powder for a CMP abrasive, which can improve polishing selectivity of a silicon oxide layer to a silicon nitride layer and/or within-wafer non-uniformity (WIWNU) during chemical mechanical polishing in a semiconductor fabricating process. More particularly, the cerium oxide powder is obtained by using cerium carbonate having a hexagonal crystal structure as a precursor. Also, CMP slurry comprising the cerium oxide powder as an abrasive, and a shallow trench isolation method for a semiconductor device using the CMP slurry as polishing slurry are disclosed.
摘要:
The present invention relates to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same, and more particularly, to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same in which the specific surface area of the powder is increased by preparing a cerium precursor, and then decomposing and calcinating the prepared cerium precursor. The pore distribution is controlled to increase the chemical contact area between a polished film and a polishing material, thereby reducing polishing time while the physical strength of powder is decreased, which remarkably reduces scratches on a polished film.
摘要:
Disclosed is cerium oxide powder for a CMP abrasive, which can improve polishing selectivity of a silicon oxide layer to a silicon nitride layer and/or within-wafer non-uniformity (WIWNU) during chemical mechanical polishing in a semiconductor fabricating process. More particularly, the cerium oxide powder is obtained by using cerium carbonate having a hexagonal crystal structure as a precursor. Also, CMP slurry comprising the cerium oxide powder as an abrasive, and a shallow trench isolation method for a semiconductor device using the CMP slurry as polishing slurry are disclosed.
摘要:
The present invention relates to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same, and more particularly, to a method of preparing a cerium oxide powder for a CMP slurry and a method of preparing a CMP slurry using the same in which the specific surface area of the powder is increased by preparing a cerium precursor, and then decomposing and calcinating the prepared cerium precursor. The pore distribution is controlled to increase the chemical contact area between a polished film and a polishing material, thereby reducing polishing time while the physical strength of powder is decreased, which remarkably reduces scratches on a polished film.
摘要:
Disclosed are a cerium oxide abrasive for selectively polishing various SiO2 films and SiO2—Si3N4 films; and a slurry containing the same. The cerium oxide abrasive and the polishing slurry of the present invention have a high polishing rate and are also free from microscratches in a polished surface upon polishing since polycrystalline cerium oxide having a mean crystalline particle size of 5 nm or less is synthesized by using hexagonal cerium carbonate having a hexagonal crystal structure as a raw material of cerium.
摘要翻译:公开了一种氧化铈研磨剂,用于选择性地研磨各种SiO 2膜和SiO 2 -Si 3 N 4 N 4膜 ; 和含有该浆料的浆料。 本发明的氧化铈研磨剂和研磨浆料具有高的研磨速度,并且在研磨时也不会在抛光表面上产生微细凹凸,因为通过使用六方晶系铈合成了平均结晶粒径为5nm以下的多晶氧化铈 具有六方晶系结构的碳酸铈作为铈原料。
摘要:
The present invention relates to cerium oxide powder and a process for producing the same. The cerium oxide powder of the invention, which is produced by mixing a cerium source such as cerium oxide, cerium hydroxide and cerium carbonate with an alkali metal compound, as flux, and performing high temperature treatment, may have a variety particle size while having spherical shape.